studied physics at the Technical University Dresden with specialization to semiconductor physics. In 2015, he graduated to PhD in the topic of deposition and crystallization of silicon thin films by using e-beam technology. Since 2010 he is a research fellow at the Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP in Dresden. Since 2023 he leads the group Coating Metal & Energy Applications. His research interests include the development and the optimization of new vacuum-based deposition methods such as electron beam physical vapor deposition (EB-PVD) as well as the simulation of related thermal processes.