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Avaluxe, based in Fürth, Bavaria, Germany, is a global supplier of advanced materials and services revolving around PVD. The company's core business and expertise includes:

• Advanced Coating Materials - Avaluxe specializes in producing and supplying a diverse range of advanced materials, and specialty alloys. These materials are used mainly in thin film technology (PVD) for various industries such as aerospace, defense, electronics, energy, medical, automotive, and telecommunications.
• Thin Film Deposition Technologies - Avaluxe International and “Avaluxe Coating Technologies GmbH & Co. KG” are combining thin film materials and thin film technology to enhance thin film coatings for various high-tech applications.
• Partnership with Advanced Energy and Gencoa - Avaluxe is representing “Advanced Energy” one of the worldwide leading producers for power supplies for thin film technology. Avaluxe is representing “Gencoa Ltd.”, one of the worldwide leading producers for plasma deposition components and magnetrons in addition to process control and sensing products.
• Recycling - Avaluxe has expertise in recycling. The company offers services to reclaim these metals from high value scrap materials coming from the PVD industry, contributing to sustainability efforts and reducing environmental impact.

In combination with coating materials from Avaluxe International and thin film knowhow of Avaluxe Coating Tech, we are able to enhance the performance of the coatings of our customers. Overall, Avaluxe's core business is centered on providing innovative materials solutions to meet the evolving needs of its diverse customer base across multiple industries, with a focus on advanced materials.

https://doi.org/10.14332/svc24.proc.0059

The continuous advancements in power electronics components lead to faster event responses. In turn, the advantages are higher accuracy and lower defects in layer stack and process controls. These are all welcomed in our world as we continuously work toward stability and repeatability in our individual coating competencies. Higher-speed internal components have resulted in faster arc detection, faster arc response time, and lower, adjustable arc energies. Whether you are using DC, pulsed DC, bipolar pulsed DC or RF, we must wrestle with the reality of power supply generational discontinuation. High-power sinewave technologies such as Advanced Energy's Crystal^® have become obsolete, presenting the challenge to learn new process parameters for different materials. However, new AE technology advancements and application support can help you plan, test, qualify and integrate the latest power supply technologies in your systems. This presentation highlights our solutions.

https://doi.org/10.14332/svc24.proc.0053

Successful process control of deposition processes requires real-time data from a variety of sensors. Current process control systems cover typically only a single sensor technique resulting in the use of a variety of individual tools to establish a comprehensive process control. This is a drawback for the use in many applications since each control tool requires individual costs and footprint as well as individual resources for system integration and maintenance.
The EMICON system overcomes these issues by combing different sensor techniques for plasma and product in a single system in a modular architecture: multichannel spectroscopic plasma monitoring with unprecedented time resolution, broadband reflectometry for real-time in-situ layer thickness measurement, electrical pulse curve measurement od voltage and current in HIPIMS and pulsed plasma application, signal input from other sensors like plasma (V-I) probes, lambda probes, ion meter probes, etc. The acquired data from all sensors are processed simultaneously in the EMICON system and can be combined and evaluated for controlling the plasma and product parameters like density of reactive gas species, ion density, layer thickness or color in real-time and simultaneously. This results in a reliable and enhanced production stability and improved product quality at reasonable costs and resources.
This presentation gives an overview of applications where comprehensive process control has already been realized with the EMICON system. Examples of combining the sensor techniques plasma monitoring, electrical measurements and photometric measurements followed by real-time data processing in demanding application such as metallic and reactive sputtering, HIPIMS and PECVD coating processes are presented covering tribological, photovoltaic and architectural glass coating applications.

https://doi.org/10.14332/svc24.proc.0062

This talk will outline the principles of remote plasma optical emission spectroscopy and demonstrate its capabilities within various industry sectors.
Gencoa’s ‘Optix’ uses a remote plasma spectroscopy concept which generates a small plasma within the sensor head. A built-in spectrometer analyses the plasma, automatically interpreting the light spectrum to provide quantitative measurement of the presence and concentration of gas within the vacuum.
The Optix spectral information and sophisticated back-end software creates a range of uses for a wide range of applications, including contaminating processes involving hydrocarbons, solvents and long-chain polymers.
The Optix can be applied to many applications and processes including PVD, ALD, Leak detection, heat treatment, hot isostatic pressing and process gas analysis. These will be briefly discussed.
The sensor has several distinct advantages over conventional quadrupole mass spectrometers which will also be considered, including operation over a wide pressure range – no requirement for differential pumping; No filaments and low maintenance; Direct monitoring of the vacuum with msec response time; Significantly less expensive than RGA and differential pump combination.
Gencoa has utilised the technique to develop a dedicated leak detector which does not use helium. This is targeted at industry sectors where leak rates of 1 x 10^-7 mbar.l/s (equivalent helium leak rate) are sufficient as a pass/fail criterion.

https://doi.org/10.14332/svc24.proc.0054

As multi-pass, multilayer flexible coated devices grow in complexity, the need for modulatory and versatility in a vacuum R2R system is essential. The ability to incorporate a wide range for PVD source technologies and monitoring across multiple wavelengths while still maintaining precision controls and substrate handling, including particle management, substrate interleaves, thermal control in a single pass or throughout hundreds of passes is required. Delivering state of the art R2R Vacuum deposition systems for precision layers can also be enhanced by leveraging laser technology for annealing or surface modification for individual device performance.

https://doi.org/10.14332/svc24.proc.0052

Quartz crystal microbalance (QCM) technology has been used for decades to control deposition rate and thickness for the most complex processes seen in the ophthalmic, optical, display, and solar markets. INFICON has recently made a new advancement in QCM technology to address a problem seen across all of these industries related to QCM temperature effects. Thermal shock can cause QCM thickness errors which can decrease yield and increase manufacturing costs if temperature is not accounted for. A complete QCM system consists of a thin film deposition controller, oscillator, and sensor which houses the QCM and provides the electrical connection. Quartz is a piezoelectric material, meaning when a voltage potential is applied across the two electrodes of the quartz crystal, the quartz will physically deform. With the help of an oscillator, the QCM can resonate at its fundamental frequency and be measured using a thin film deposition controller. As material is deposited onto the surface of the QCM, the mass on the crystal increases and the frequency decreases proportionally.
Temperature also impacts the frequency measurement and can create false mass readings. Thin film deposition controllers currently on the market have no good way of distinguishing frequency shifts related to mass from frequency shifts related to temperature, resulting in thickness errors and poor PID control. This can be detrimental to today’s complex coating processes due to the low deposition rates and incredibly thin layers required. Thermal shocks can occur at any point in a deposition process and can cause unnecessary PID-loop correction, triggering non-uniform deposition in respect to time. This means that the quality throughout the bulk of the material is inadequate. For very thin films, the thickness termination may not be at the real intended thickness because the process time window is small compared to the time allowed for a QCM to recover from a thermal shock event.
INFICON has patented a new temperature compensation technique for SC-cut crystals to remove the effects of temperature variation on the QCM without the need for additional hardware or custom and expensive sensors. INFICON temperature compensation is also instantaneous unlike competing methods that use a thermocouple embedded inside the QCM sensor. By removin temperature from the thickness calculation, the thickness accuracy and deposition rate stability can significantly improve. Traditionally, AT-cut crystals have been used for most coating applications, however there are two additional advantages of SC-cut crystals compared to AT-cut. SC-cut crystals have 100 times reduced sensitivity to acceleration induced frequency changes compared to AT-cut. For tools that have QCM sensors mounted on robotic arms, acceleration jerks can induce a frequency change impacting the rate measurement. The second benefit to using SC-cut crystals is that SC-cut crystals have lower rate noise compared to AT-cut crystals when exposed to organic deposition material. Lower rate noise allows for better PID control with higher measurement accuracy to support technology transitions across several industries and meet the sensitivity and precision requirements of the latest product generations.

https://doi.org/10.14332/svc24.proc.0057

This work's main aim was to develop the technology of thin hafnium oxynitride layers employing the High-Impulse Power Magnetron Sputtering (HiPIMS) method with improved electrical parameters. The optimization procedure was implemented using the Taguchi orthogonal tables. During the optimization procedure, the parameters of examined dielectric films were monitored employing optical methods (spectroscopic ellipsometry and refractometry), electrical characterization (C-V and I-V measurements of MOS structures), and structural investigations (AFM, XRD, XPS). The thermal stability of fabricated HfO_xN_y layers up to 800 °C was also examined. The presented results have shown the correctness of the optimization methodology as HfO_xN_y layers formed using optimal HiPIMS process are characterized by improved electrical parameters, which is revealed in lower flat-band voltage (Vfb) values, the disappearance of frequency dispersion of C-V characteristics, reduced effective charge (Qeff/q), and interface traps (Ditmb) densities of examined MOS structures. It is worth underlying that the improved electrical properties can correlate with the lower nitrogen content in the layer bulk and at the semiconductor-dielectric interface. Moreover, the superior stability of HfO_xN_y layers up to 800 °C was proved, and no deterioration of electrical properties or surface morphology has been noticed. However, a slight increase of crystalline phase in the layer bulk was observed. The examinations of HfO_xN_y layers revealed comparable electrical properties and higher immunity to thermal treatment of dielectric films formed using HiPIMS compared to the standard Pulsed Magnetron Sputtering technique. Finally, we successfully applied HiPIMS HfO_xN_y films as gate dielectric films in MOSFET devices. The fabricated structures revealed improved electrical properties compared to FET structures based on silicon dioxide (SiO₂) gate dielectric layers.

https://doi.org/10.14332/svc24.proc.0015

Our engineering team, with over 40 years' experience, is offering custom made, deposition systems including but not only: Sputtering, EB gun, Thermal, Ion Beam, Plasma, ALD – PLD and Low Temperature organic materials. With reputation for excellence - hundreds of satisfied customers in the high vacuum and ultra-high vacuum industry, research labs and scientific community around the world.
VST developed cluster tools with robot sample transfer often integrated with Inert Gas Glove Box and encapsulation for OLED processes.

https://doi.org/10.14332/svc24.proc.0055

The critical path item in many vacuum coating systems is the vacuum chamber. Vacuum chambers seem complex because numerous details must be exactly right such as:

• Material stresses,
• Deflections,
• Surface finishes,
• Critical dimensions, and
• Helium leak-tight seals and welding.

We are introducing Magnum Steel Works—the new vacuum chamber manufacturer who is simplifying this process. With lower prices, shorter lead times, and the high-quality workmanship a vacuum chamber requires, our process is designed to help our customers get a cost-effective chamber on their floor in record time. Magnum Steel is here to keep it simple for you.

https://doi.org/10.14332/svc24.proc.0056

At TRUMPF Huettinger, Inc., we are excited to showcase our latest innovative product lineup at the SVC TechCon 2024. Our offerings encompass a wide range of cutting-edge solutions designed to meet the evolving needs of the vacuum coating industry. We strive to provide a comprehensive range of standard match boxes and generators for your sputtering applications. Last year’s breakout products, the LHF to VHF generators enabled us to offer a variety of frequencies and power levels to aid our customers in their most challenging processes. Along with our continual enhancements in Highpulse power products with versatile versions that combine DC, Monopulse, and Bipolar Pulse all into a single product, provides our customers with unparalleled flexibility and performance. In addition, our complete RF+DC combination products enables lower sputtering voltages and reduced substrate temperatures that deliver exceptional results for our customers. This year, our topics of discussion will be centered on the following:

 • Low Power DC and DC Pulsed generators
• RF Switch Topology (3D Coupler and 50 Ohm absorber)
• Innovative Matching Network Algorithm
• HPPMS with Superimposed DC
• 3rd Generation High Power 10kW RF Generators

We invite you to explore our innovative product lineup at the SVC TechCon 2024 and experience the TRUMPF Huettinger difference firsthand.

https://doi.org/10.14332/svc24.proc.0058