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Complex systems for coatings, deposition and etch often require precise temperature measurement and control for improved product yields. Other critical parameters may include process pressures, gas line temperatures and chamber wall temperature or strain as a safety concern. Cost-effective, field-proven fiber optic sensing solutions provide significant advantages over other sensor technologies in these demanding environments.
Fiber optic sensors are inherently immune to electromagnetic interference from RF, induction, and microwave sources. They can also be shielded from plasma light interferences to provide stable and accurate measurements. No sensor calibration is required over the design lifetime with minimum fatigue, resulting in lower cost of ownership. Multiple sensors and mixed sensing parameters, such as temperature and strain/pressure can be used on a single fiber optic cable thus reducing the complexity of installations and greatly increasing the density of measurement points. In addition, the fiber optic sensors are ideally suited for ALD and Etch applications, providing excellent accuracy from cryogenic temperatures to 450°C. In this presentation, Advanced Energy will review the status of fiber optic sensor technologies including phosphor decay, Fiber Bragg Gratings, Fabry Perot interferometry and infrared fiber pyrometry, followed by highlights of application solutions for ALD, PECVD and Plasma Etch systems including installation and performance advantages of these sensors.

https://doi.org/10.14332/svc24.proc.0002

Due to the potential of excellent film control, uniformity, and conformality, atomic layer deposition (ALD) is seen as very promising for quantum devices where interface and material quality and their uniformities are a big challenge. Furthermore, for superconducting circuits, the deposition rate of ALD can be an issue since sufficient film thickness (> 50 nm) is needed to minimize kinetic inductance effects on resonator frequency and the shielding effectiveness of superconducting vias for crosstalk mitigation depends on film thickness and film conformality in the 3D structures. The challenge here is to deliver a sufficiently fast processes while maintaining the desired film properties and benefits of ALD.
Here, we will share our recent development of a new remote plasma ALD system providing high-quality superconducting NbN and TiN for quantum applications at rates > 25 nm/hour, which is approximately 3x faster than previously reported. The RF-driven remote plasma source design and chamber of our ALD system are optimized to enable this high deposition rate.
The quality of the deposited films was demonstrated to be excellent, as measured by four-point probe electrical resistivity, conformality (100% on 8:1 trench for NbN, verified by SEM), and superconducting transition temperature (Tc). Good superconducting properties of the film were demonstrated by SQUID measurements. A thickness non-uniformity of < ±5% across a 150 mm Si wafer was achieved with good repeatability. Both NbN and TiN films show cubic crystalline structure as confirmed by XRD measurements. We will also show how stress can be tuned as a function of process parameters, such as the RF source power and discuss film composition, stoichiometry and purity levels such as carbon and oxygen. We will also touch upon how ALD is well-suited to combine processes and provided ternary films such as NbTiN.
Emerging quantum technologies based on superconducting nitride materials are showing great promise and will benefit not only from the uniformity of the deposition, conformality and film quality, but also from the speed and control provided by ALD processes on this system.

https://doi.org/10.14332/svc24.proc.0001

Metal oxide thin films with antibacterial properties can be deposited via atomic layer deposition (ALD) on the surface of neurostimulation and cardiac rhythm management electrodes to prevent risks of post implantation infections and bacteria colonization. In this work, we report on the development of antibacterial platinum-iridium electrodes using a two-step process. Electrodes are first hierarchically restructured using femtosecond-laser hierarchical surface restructuring technology and then ALD is used to deposit ultrathin metal oxides of ZnO on hierarchically restructured electrodes. Structural, chemical, and mechanical properties of ZnO films were studied using X-ray diffraction, X-ray photoelectron spectroscopy, energy dispersive X-ray spectroscopy, scanning electron microscopy and nanoindentation. The antibacterial properties of the ALD-coated electrodes were also studied, particularly, the killing effect on the two common types of bacteria (E. coli and S. aureus) responsible for implantation infections.

https://doi.org/10.14332/svc24.proc.0005

With a goal to assess the efficiency of physical vapor deposition (PVD) coating defect sealing by atomic layer deposition (ALD layers, we investigated the corrosion resistance of PVD TiN and TiN + ALD Ti-O (amorphous and anatase) layers in Hank’s solution. The corrosion experiments were conducted on circular areas with 2 mm radius, employing electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization (PD) measurements. To identify defect types, quantities, and their dimensions, confocal and tactile profilometry were performed before and after the corrosion tests. Results revealed that corrosion resistance of layers is influenced by the quantity of through-thickness “critical” defects. The above-coating height of these defects is approximately half of the coating thickness, and their diameter is proportional to the coating's thickness. With an increase in their quantity the corrosion resistance of a coated system decreases. Scanning electron microscopy (SEM) of the focused ion beam (FIB) milled cross-sections revealed a uniform surface coverage by both ALD layers and effective defect sealing. Therefore, application of ALD layer over the PVD coatings emerges as a highly effective strategy for enhancing their corrosion resistance. Additionally, SEM and atomic force microscopy (AFM) analysis of a hybrid layer with anatase TiO₂ revealed formation of protruding nano-features on the surfaces. Such features have promising effects on the bone-cells activity and increased implant osseointegration.

https://doi.org/10.14332/svc24.proc.0006

Tungsten trioxide (WO₃) thin films are very well known for their efficient electrochromic properties under the double insertion and extraction of various suitable ions and electrons. Although both the amorphous and polycrystalline WO₃ thin films exhibit an efficient coloration in the visible and nearinfrared spectral regions from an initial transparent state under the double insertion, the underlying phenomenon leading to this coloration is quite different. In the amorphous films it is the absorption modulation while it is reflectance modulation in the polycrystalline state. In the former case, the coloration takes place due to the intervalence transfer of electrons from one site to the other in the mixed valence WO₃ films through the absorption of light (polaron absorption). However, the coloration in the polycrystalline films is due to the reflectance arising from the free electrons injected into the host material (plasma frequency edge displacement). However, in most commonly used deposition conditions in which a polycrystalline film is expected to be formed, it can be surmised that the WO₃ film is composed of polycrystallites held in an amorphous host material. This leads to an electrochromic coloration arising from a combination of absorption and reflectance modulation. In the present work, we have undertaken a systematic study of the electrochromic evolution of WO₃ films deposited under different conditions and subjected to dry lithiation using lithium niobate (LiNbO₃) powder under controlled heat treatment. The structural, electrical and optical properties of the as-deposited and colored films have been measured using an Atomic Force Microscope (AFM), four-point probe and a UV-Vis-NIR double beam spectrophotometer. Hall effect measurements have been carried out to calculate the free electron density (ne) inserted into the WO₃ film and correlated with the effective lithium film thickness measured by quartz crystal method. Preliminary results of this work are presented here.

https://doi.org/10.14332/svc24.proc.0007

The competition in the global market increases the need for innovation. Companies must be faster due to shorter life cycles and facing the challenge of less financial and human resources. Open innovation has the chance to solve these challenges but has risks as well. The fundamentals of open innovation will be discussed in respect to the thin film vacuum coating industry. Europe has a great ecosystem for open innovation for thin film coating with industry, a lot of institutes, universities, and public funding. All these pieces of the puzzle must be setup in the right way to generate great results from open innovation. The European Union created 28 Open Innovation Test Beds (OTIB) to showcase how it can work. Several of these OITB cover vacuum coating technologies or relevant characterisation and modelling tools. KETMarket is the Single-Entry Point of two OTIBs FlexFuction2Sustain and Convert2Green. FlexFunction2Sustain utilizes vacuum coating technology to advance the properties of novel, emerging, ecofriendly plastic and paper web materials towards sustainable products such as organic solar cells on recycled plastic substrates. Convert2Green involves vacuum coating as a tool to enable the use of circular materials innovations for smart textiles, advanced medical packaging, automotive parts and more.
KETMarket will showcase how the European Open Innovation Ecosystem can support innovative companies in advancing with their materials and coatings development and in accessing new markets in Europe and worldwide.

https://doi.org/10.14332/svc24.proc.0010

Vacuum coating from roll to roll is an established technology in the web processing industry. The applications are manifold. Complex multilayer stacks can be applied with R2R coating systems equipped with a precisely defined set of e.g. magnetron sputter sources. Examples of applications include low emissivity layer stacks for energy control, anti-reflective and decorative coatings, or electronic applications such as solar and electro chromatic applications or flexible printed circuit boards. Architectural, transportation, consumer goods and other industries benefit from this wide range of applications and coating equipment.
A number of these processes require high productivity to produce a high volume of product at competitive costs. This presentation will highlight the automation and modularity of the FLC1600 R2R system to increase productivity. One, two or more main coating modules can be integrated. The modules can be arranged and configured to increase the versatility of the process or the productivity of the system. The applicability of the system platform for high product versatility and productivity will be demonstrated. Furthermore, productivity is gained by increasing the coating speed. With modern process automation, oxidic processes are set stable at a high deposition rate. The presentation introduces the use of the Plasmaster program for R2R coating automation of flexible products.

https://doi.org/10.14332/svc24.proc.0060

This presentation will discuss the importance of leveraging federal government resources to support the launch of new (start-up) technology, Specifically, National Science Foundation (NSF) Industry-University Cooperative Research Centers (IUCRC) for low-cost start-up development. It will highlight the advantages of collaborating with these centers, including access to state-of-the-art research facilities, expertise from leading researchers, and potential funding opportunities. The presentation will also present a case study of a successful start-up that has utilized NSF centers to drive innovation, growth, and funding. Additionally, it will provide practical tips and strategies for start-up founders on how to navigate and effectively leverage these valuable resources. By sharing insights and lessons learned, this presentation aims to inspire and empower entrepreneurs to take advantage of the vast opportunities offered by NSF Industry-University Cooperative Research Centers (IUCRC) and other forms of Federal Grant programs such as DOE/DOD funding for their start-up development.

https://doi.org/10.14332/svc24.proc.0009

High-performance, complex systems for coating and deposition need to deliver reliable operation over many years, during which time equipment is likely to be in use for up to 24 hours a day. System operators demand stable, repeatable processes that keep operational costs as low as possible without compromising quality. As with any high-power application, a key focus for cost reduction is the price of energy used. One way to minimize energy costs is to employ power architectures that improve power factor by reducing total harmonic distortion (THD). This leads to increased efficiency, lowering utility bills and eliminating the cost of hardware filtering. Better power factor also minimizes the risk of penalties to utility companies as they seek to cover the cost of wasted energy and the need for larger equipment. In this presentation, Advanced Energy will consider the power demands of high-power coating and deposition processes and explain how using digital silicon-controlled rectifiers (SCRs) with voltage sequence control (VSC) in electrical heating zones can minimize operating expenses (OPEX) by delivering THD reductions that improve power factor.

https://doi.org/10.14332/svc24.proc.0037

In fusion neutral gas analysis, such as with the Diagnostic Residual Gas Analyzer (DRGA) for ITER, the primary measurement range of interest comprises the low-amu species (1 to 6), especially deuterium and helium. The challenge in successfully obtaining accurate measurements is two-fold. First, the sensitivity of the method must be sufficient to resolve trace amounts accurately; typically, one percent or less. Second, the gas signal from the fusion processes must be free of bias caused by the latent presence (from system outgassing and/or vacuum backstreaming) of these gases to enable accurate interpretation of the measured signal. This latter criterion can be problematic for the lightest gases since there is a propensity for some fraction of the pumped gas load to undergo a phenomenon known as backstreaming. This behavior is manifested in pumping systems for gas properties related to relative atomic weight (lightest) and size (smallest). Backstreaming results in a significant amount of the pumped gas undertaking a reverse flow and re-entering the measurement region; thus, contaminating the forward, real-time measurement. To fully eliminate this adverse effect, a conductance-limiting device – or orifice – has been installed in the high-vacuum pumping system of the present ITER DRGA prototype. The system was already equipped with a secondary turbomolecular pump (TMP), but with limited effectiveness against backstreaming in the inter-pump volume (IPV). This orifice is placed within the suction inlet coupling of the secondary TMP, which is downstream of the IPV. Its objective is to eliminate the backstreaming phenomenon by increasing the back pressure in the IPV. However, the orifice sizing must take into consideration other factors, such as the diagnostic measurement objectives. For example, in the ITER DRGA, one of the measurement requirements is a dynamic response time of ~1s. Fortunately, an added benefit of the pumping restriction created by the orifice is that the upstream pressure increase is beneficial for the DRGA’s optical gas analysis (OGA) sensors. These sensors are attached to the IPV in the present design. The glow discharges, when used as an OGA light source, will typically have a brighter light emission with increasing plasma cell pressure. In addition to the fusion machine research sector, there are other potential applications of this pumping technique where the monitoring of lighter gas concentrations is essential, such as the photolithography process for the semiconductor fabrication of integrated circuits. This presentation will describe the vacuum system used to demonstrate a process to eliminate backstreaming as well as show test results to verify the accomplishment of this critical objective.

https://doi.org/10.14332/svc24.proc.0035