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Thread: Sputter Film Densification

Created on: 05/13/09 12:00 AM

Replies: 1

esiegal





Joined: 05/13/09

Posts: 1

Sputter Film Densification
05/13/09 11:11 AM

I am trying to find plasma assist sources to help densify sputtered thin films. I found that Jeol manufactures one but it is manufactured and supported in Japan only! Any help would be appreciated.

Thanks,

Ed


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red2erni





Joined: 06/05/09

Posts: 1

RE: Sputter Film Densification
06/05/09 11:26 AM

Hi Ed,

Kind of lonely trying to make a dense sputtered film. Please clarify your requirements. FIrst, are you trying to add some capability to an existing source/substrate set up or are you looking for a different source/substrate set up that will make a dense film.

Since you already have in mind that you want more density, do you know how much density you currently have or what density are you attempting to achieve. In order of difficulty, you can decrease the open porosity, eliminate open porosity, decrease closed porosity, eliminate closed porosity - up to the point of some specification such as dielectric strength or optical transmission or moisture transmission.

There is quite allot of literature in each of various fields which relate the density to some derived film performance criteria such as hardness, modulus, optical transparency or optical intensity damage threshold, dielectric strength, film resistivity, etc. But there has never been much published work which correlates more than a couple of those with film density. There is the further thorny issues around polycrystalline and amorphous or glassy as well which uncouple some of the extream attributes of film density.

There are many different ways to increase film density. There are also many ways to characterize film density and density uniformity. It turns out that density and stress are related. Optical birefringence and stress are are also quite closely coupled. But it would be good to know what your requirements are viz. substrate size and shape, film type and film requirements from simple changes such as unbalancing the magnetron to diffuse to line of sight ion source treatment to full on duel power techniques which provide a separate plasma across the substrate via capacitive or other coupling methods. All of these have been made production worthy up to Gen V glass size, as an example.

I'd be glad to provide another round of information if you have more clarity wrt your requirements and cost goals.

Cheers,

Erni
red2erni


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