Tutorial Titles and Descriptions

The Short Tutorial Program Roster of tutorials has been developed by SVC instructors for SVC and the vacuum coating industry.

Tutorial Schedule
Most of these tutorials are presented at the SVC Annual Technical Conference

The majority of the tutorials are available for presentation as part of the SVC On Location Education Program - a program whereby the instructor and tutorial can be brought to your site or geographical location.

Tutorial Classification

The tutorial codes (V/VT, M, C and B) indicate whether the emphasis of the tutorial is primarily on:
V - VACUUM TECHNOLOGY
C - VACUUM COATING DEPOSITION PROCESSES AND TECHNOLOGY
M - MISCELLANEOUS TOPICS
B - BUSINESS TOPICS

Tutorial Titles

The group of tutorials on Vacuum Technology, Components and Systems (V-201, V-202, and V-203) is designed in modular form where each module can be taken as an individual stand-alone tutorial, or all three tutorials can be taken at a discounted fee.

VT-201 Vacuum Systems, Materials, and Operation

This full-day course is intended for those who wish to understand the operation of mechanical, diffusion, and cryo-pumped systems, how materials are chosen, and how water vapor is pumped efficiently during the roughing cycle. It will conclude with a brief discussion of diagnostic methods. This course will benefit operators, engineers, and maintenance personnel, because proper understanding of complex vacuum systems leads to higher production yields, shorter down times, and improved reliability.

Introduction to vacuum systems

• Rotary mechanical pumps
• Diffusion pumps and systems
• Cryogenic pumps and systems
• Turbomolecular pumps and systems

Attendees in this tutorial receive the text, A User’s Guide to Vacuum Technology, 3rd edition, John O’Hanlon (John Wiley & Sons, 2003).

For additional information on this course, view the Detailed Syllabus.

V-202 Vacuum System Gas Analysis

This tutorial is intended for those who wish to understand how to analyze the performance of a vacuum system. Basic vacuum gauges that measure pressure in the low vacuum and in the high vacuum region will be described. Residual gas analyzers provide a useful method of analyzing the performance of a system and how various components are operating by looking at the partial pressures of individual gases. The class concludes with a discussion of leak detection: when it should be attempted and how to detect leaks with a pressure gauge, an RGA, and a mass spectrometer leak detector.

Gas laws

• Gas flow
• Vacuum gauges
• Residual gas analyzers
• Leak detection

Attendees in this tutorial receive the text, A User’s Guide to Vacuum Technology, 3rd edition, John O’Hanlon (John Wiley & Sons, 2003).

For additional information on this course, view the Detailed Syllabus.

VT-203 Residual Gas Analyzers: Operation and Use

This daylong short course is intended for those who wish to understand the operation and many uses of the Residual Gas Analyzer, and its derivative, the Helium Leak Detector. We will describe how to operate the instruments, and how to interpret their results. Participants who complete this class will benefit on the job by using RGA’s and Leak Detectors to solve production problems and by understanding how gas analyzers are used as an integral part of process control systems. Students and researchers will also benefit from this in-depth discussion, as its information will replace learning by trial and error.

• Residual Gas Analyzers
• Analysis of Mass Spectra
• Effects of materials and head location
• Leak Detectors
• Sampling Techniques

Attendees in this tutorial receive the text, A User’s Guide to Vacuum Technology, 3rd edition, John O’Hanlon (John Wiley & Sons, 2003).

For additional information on this course, view the Detailed Syllabus.

V-204 Vacuum Systems Materials and Operations

This tutorial course is intended for those who wish to learn how diffusion and cryo pump systems operate, how to choose materials for vacuum use, and how to pump water vapor properly during the rough pumping cycle. At the end of this tutorial, a participant should be able to explain the operation of diffusion, and cryo pumped systems; understand how materials are chosen for use in vacuum, and how to rough pump water vapor without producing condensation.

• Introduction
• Rotary mechanical pumps
• Diffusion pumps and systems
• Cryogenic pumps and systems
• Materials suitable for vacuum use
• Methods for rough pumping water vapor.

Attendees in this tutorial receive the text, A User’s Guide to Vacuum Technology, 3rd edition, John O’Hanlon (John Wiley & Sons, 2003).

For additional information on this course, view the Detailed Syllabus.

V-207 Operation and Maintenance of Production Vacuum Systems

(The course is a revised and updated version of V-207)

This tutorial is designed to teach the basic fundamentals of vacuum technology to technicians, equipment operators, line process operators, and maintenance personnel. This tutorial will address how to use and maintain an existing vacuum effectively, not how to design a system. The introduction will consist of a very basic explanation of what a vacuum is and how it is attained and proceeds to an explanation of the three gas flow regimes (i.e., viscous, transition, and molecular flow). This is followed by a description of the types of pumps used in the viscous flow region (e.g., mechanical displacement pumps, venturi/suction pumps, and sorption pumps). Types of high vacuum pumps are next discussed; these include diffusion pumps, turbopumps, and cryopumps. Presented next is a guide for selecting a pressure gauge which includes a description of various types of gauges and details their useful pressure range and measurement precision.
Topical Outline:

• Introduction to vacuum
• Explanation of the three gas flow regimes
• Viscous flow pumps
• High vacuum pumps
• Guide for selecting a pressure gauge
• Care and maintenance of pumps and vacuum systems, including both compressible “rubber” gasket and metal gasket systems
• Evaluating system performance: pumpdown rate and leak-up rate
• Leak detection and correction
• Cleaning and conditioning of vacuum components and system
• Operation of vacuum systems: crossover pressure, interlocks, and safety
• Applications of vacuum systems for vacuum coating
• Pumpdown and outgassing
• Descriptions of other vacuum related tutorials presented by SVC

For additional information on this course, view the Detailed Syllabus.

V-208 Basic Ananlysis of Mass Spectrometer Spectra

Developed mainly for technicians and process engineers, the main objectives of this course are to impart enough knowledge to the student to analyze spectra, use that analysis to determine what problems may exist in their process chamber, and thereby help in trying to solve these problems.

This course deals with analysis of Mass Spectrometer (RGA) data. It begins at an elementary level, first describing atoms, then atomic electronic structure, followed by a description of the filling of electronic shells and sub shells. Using information about how atoms are formed, we move to molecule formation and discuss the different types of molecular bonds. Understanding molecular formation is essential to understanding and interpreting mass spectra. The operation of a mass spectrometer is next described, especially phenomena that occur in the ion source. Using all this information we begin discussion regarding the interpretation of the spectra from a mass spectrometer. Typical mass spectrometer spectra are shown and analysis of the spectra is demonstrated.

The course begins with elementary nuclear physics, followed by atomic and molecular physics and continues with the study of the chemistry of molecules. A few pertinent examples, e.g. water and methane, are presented and used to demonstrate how one analyzes more complicated molecules.

We briefly discuss mass spectrometer operation because one needs to understand how the operation affects spectral analysis. Probably the most important effect is the interactions of molecular ions in the ion source to form new/different molecular ions. Other areas addressed are molecular breakup in the ion source and nuclear isotope effects.

Various data presentation types are described along with suggestions for their preferred order for different types of analyses. Additionally many relevant tables, graphs, and references are presented.

• Basic nuclear physics knowledge presentation
• Basic atomic electronic structure presentation
  - Atomic physics
  - Filling order of electronic shells and sub shells
  - Use of the periodic table in mastering molecular formation

• Discussion of the formation and chemistry of molecules which is essential to understanding and interpreting mass spectra

• Discussion of the operation of a mass spectrometer especially phenomena which occur in the ion source, i.e. molecular formation and breakup

• Typical mass spectrometer spectra are shown for representative molecules and analysis of the spectra are demonstrated

• Vacuum chamber leak checking and correction using a mass spectrometer

V-209 Fundamentals of Vacuum Technology and Vacuum Gauging

This one-day course is designed to provide a foundation necessary to understand general scientific concepts of vacuum technology, and expands into a discussion of the design of use of vacuum gauges. A time for lunch generally separates these two content areas. The course can be customized somewhat to focus on content that may be of particular importance to a group of students.

The morning content begins with a brief history of vacuum technology, starting at about the time of Galileo. The course proceeds with a description of the differences between the development of the physical properties of pressure, volume, temperature, and amount of gas - as described in the historic “Gas Laws,” and continues with a description of the difference and importance of what is now known as the “Kinetic Theory” of gases. The discussion continues describing how gas molecules move from one place to another in a vacuum system, the parameters of molecular vs. viscous flow, finally describing the parameters of conductance and pumping speed. With these parameters established, the foundations of an equation to calculate the pump-down time are presented and examples given. The limitations of this simple equation are presented, which leads into a discussion of the critical importance that outgassing – from within the chamber - has on the ability of a chamber to attain a desired vacuum pressure within a desired time.

The afternoon content describes typical gauges used in vacuum technology. This content begins with a discussion of the importance of understanding the concept of precision of pressure measurements, and the importance of knowing when high-precision vs. low-precision measurements are required. This is compared to other situations when when a simple, yet accurate, trend analysis may be appropriate and/or preferred. Discussion continues with review of the difference between measuring an actual pressure (in force per unit area) and measuring some other parameter - and relating it back to a force per unit area. The first category of vacuum gauges discussed are manometers (Hg-type, diaphragm, Bourdon, capacitive, and piezoresistive manometers). The second category of gauges includes thermal gauges (thermocouple- and Pirani-type gauges). The final gauge category is ionization gauges (hot-filament and cold-cathode types). The course concludes with a discussion of partial-pressure gauges, with the majority of the discussion being an introduction to the instrumentation and use of residual-gas analyzers, primarily of the quadrupole type.

V-210 Pumps Used in Vacuum Technology

This one-day course is designed to overview pumps typically used in the main stream of vacuum technology. Although the content of the course is most optimally presented when preceded by the one-day course on Fundamentals of Vacuum Technology and Vacuum Gauges, it can often be customized to provide necessary framework and/or background for the concepts and discussion presented.

Course presents an overview of the 3 basic types of physical pumping mechanisms (Positive Displacement, Momentum Transfer, and Capture). Vacuum pumps used in typical vacuum applications are discussed as examples of each pumping mechanism. Discussion also provides a baseline description of the types of maintenance activities that can be expected when using each specific type of vacuum pump. The section on positive-displacement pumps begins with a detailed discussion of the historic oil-sealed, rotary-vane pump. This pump is often familiar to most of the students, it remains widely used in may industry applications, and therefore its description provides a useful baseline for many of the terms that will be used to describe the other types of pumps. The discussion on oil-sealed pumps also describes development and use of modern vacuum-pump fluids and greases, and their proper selection and use. Discussion then moves to positive-displacement dry pumps (blower pumps, claw compressors, screw pumps, piston pumps, diaphragm pumps), with particular emphasis placed on the development, applications, and maintenance of the design, use, and maintenance of modern scroll pumps. The next category of pump discussed are momentum transfer pumps, including the historic diffusion pump, as well as the modern turbomolecular, drag, and regenerative pumps. The final category of pumps is capture pumps. This discussion includes a quick review of the historic bulk-getter pumps (e.g., Titanium sublimation) as well as modern non-evaporating getter (NEG) pumps. Sputter-ion pumps are next discussed, but the detail level of this discussion is gauged to the student’s needs. The final pump discussion relates to cryogenic-type pumps, with a brief review of cryosorption and cryocondensation pumps, and a much more detail detailed discussion of cryogenic pumps. The section on cryogenic pumps also includes detailed discussion of the development, operation, and typical maintenance issues related to cryogenic closed-cycle helium refrigeration systems.

V-211 Vacuum Hardware and Vacuum Leak Detection

This one-day course is designed to overview materials and processes typically used in vacuum technology, including equipment and processes used for basic vacuum Leak Detection. Although the content of the course is most optimally presented if the course is preceded by appropriate content from other courses, such as Fundamentals of Vacuum Technology, Vacuum Gauges, and Vacuum Pumps, it can often be customized to provide necessary framework/background for the concepts and discussion presented. The course is typically divided into Vacuum Hardware in the morning, and Vacuum Leak Detection in the afternoon, separated by a time for lunch.

The course begins with a general discussion of the many types of material or process parameters that need to be considered with regard to the design of specific vacuum hardware. These parameters include not only well-established physical parameters, (e.g., structural, electrical, optical, thermal, vapor pressure) but also less-well-defined, yet very important practical parameters (e.g., machinability, formability, vapor pressure, absorption/outgassing rate, etc.). With these foundation in place, the course proceeds into three main areas of examples and discussions: (1) Materials used in vacuum systems and components - including detailed discussions of particular metals, elastomers, glasses, and ceramics; (2) Procedures used in joining and forming vacuum materials - including both non-demountable (e.g., welding) and demountable (e.g., flanges) designs and procedures; (3) Components used in vacuum systems - including various types of valves (e.g., butterfly, poppet, gate, throttle, etc.), gas-flow components, feedthroughs, viewports, and filtration equipment. In all cases, the influence that important operational concerns, such as desired vacuum pressure and operational temperature, will have on component selection are discussed.

Content on Vacuum Leak Detection includes: (1) A foundation of various types of products that require low or very-low leakage; (2) An explanation of various units of leak rate, and; (3) Discussion of situations that lead to real vs. perceived leaks. Different types of leak-detection options are presented including dye-penetrant, radioisotope exposure, and high- or low-pressure methods. The remainder of the course focuses on the most typical leak detection techniques in vacuum technology - “low-pressure methods.” This discussion begins with examples of why an understanding “standard system performance” is essential to effective leak detection procedures. While most discussion focuses on the theory and operation of the Helium Mass Spectrometer (HMSLD), other “low-pressure” techniques are also presented (e.g., methanol penetration). The discussion of the HMSLD begins with its historical development, maintenance issues, and typical methods of using any HMSLD (e.g., Bagging, Probing, Sniffing, and Bombing). With an understanding of HMSLD use established, guidance on various hook-up configurations are presented, followed by key mathematical parameters (i.e., Rate of Pressure Rise, Ultimate Pressure Increase, and Time Constant of the Response Time). The course concludes with guidance of various typical options available to fix a leak when one is found.

V-212 Vacuum System Design

This one-day course is designed to expose the student to design procedures and tools needed for undertake effective planning for procurement of either standard or advanced vacuum systems. Although the content of the course is most optimally presented if the course is preceded by appropriate content from other courses, such as Fundamentals of Vacuum Technology, Vacuum Gauges, and Vacuum Pumps, it can often be customized to provide necessary framework/background for the concepts and discussion presented. The course is typically divided into discussion of Design Considerations and Ramifications in the morning, discussion related to Chamber Design and System Performance in the afternoon, separated by a time for lunch.

The course begins with a brief overview of the physical environment within a vacuum system, and the related mathematical formulations that need to be appreciated when designing a vacuum system for optimum performance. The course next introduces the concept of major design Considerations including: (A) the Purpose of the system, (B) the Work Size and/or Processing Time constraints, and (C) Ambient. The course then describes how these Considerations related to hardware Ramifications including: (A) Dimensions and Layout, (B) Chambers and Valves, and (C) Vacuum Pumps and Traps. In all cases, the influence that important operational concerns, such as desired vacuum pressure, gas mixtures, and operational temperature, will have on selection of components that comprise the system are discussed.

Once the basic operational criterial of the to-be designed system are established, the course progresses to discuss material and design criterial for vacuum chamber and overall layout considerations for locations within the chamber for specific vacuum processes and monitoring. The course proceeds with some simple calculations of pump-down time for various chamber/pump combinations, as well as how to appropriately size both low and high vacuum pumps, using both single and multiple chamber design assumptions. The course concludes with some comments on pre- and post-assembly cleaning of vacuum system components, and design considerations for reduction of particles during vacuum processing. Concluding comments also discuss important design considerations related to (higher) conductance of vacuum lines when these are at pressures consistent with viscous flow.

VT-220 Practical Guide to Vacuum System Operation Using a Trainer System

This one-day tutorial course will provide students with an understanding of a vacuum system through hands-on activities and demonstrations on a High Vacuum Equipment Trainer (HVET). This tutorial is intended for operators, process engineers and technicians who work with vacuum equipment but wish to possess a deeper understanding of how a system is configured and operated. The course will address the structure of a typical high vacuum system, the role of the key system components and how the components work together to form a functional process system. We will also investigate how to establish the baseline performance of a high vacuum system and the techniques used to troubleshoot problems typically encountered.

• Rough vs. high vacuum
• High vacuum system structure and schematics
• Manual operation of a high vacuum system
• Vacuum pumps, gauges, valves and mass flow controllers
• Baseline testing: pumpdown and rate of rise
• Calculation of gas load, conductance, effective pumping speed and system base pressure
• Conductance testing: mass flow controller

VT-240 Practical Elements of Leak Detection

This one-day class is recommended for Engineers, Technicians, and Scientists interact with vacuum processing in their professional endeavors. Maintenances of vacuum hygiene is essential for process control and repeatability. The development of leaks is an everyday occurrence and the ability to quickly locate them and affect a repair is critical.

Beginners as well as experienced users of leak testing equipment will benefit from this course as the material presented will give them a good understanding of basic vacuum and leak testing. Different leak testing methods available and useful tools will be described and compared. Further, attendees will learn how to select the right leak testing method as well as the correct leak testing equipment to meet their application requirement. Throughout the class participants will have the opportunity to do practical exercises to get the maximum out of the training (a scientific calculator will be provided to all tutorial participants).

Practical Elements of Vacuum Leak Detection

• Leaks
• Calibrated Leaks
• Air Leak Testing
• Introduction to Vacuum
• Surface and Other Effects in Vacuum
• Gas Flow in Vacuum
• Vacuum Equipment and Components
• Introduction to Helium Leak Detection
• Leak Rate Establishment
• Leak Detection Application Examples and Solutions

Attendees in this tutorial receive course notes.

For additional information on this course, view the Detailed Syllabus.

VT-230 Design and Specification of Vacuum Deposition Systems

This short course intended as a guide for the researcher or production specialist that has a requirement for a vacuum/thin film deposition system. It will cover topics including: turning an idea for a system into a pertinent RFQ; major price points of a system; how to get more system for less; and how to get effective support and training. Upon completion of the course, participants should know how to specify a system to cover the intended purpose(s), understand common options in terms of process requirements, price control strategies, how to set acceptance criteria to cover the purpose and still stay within budget, and how to make sure the vendor stays interested in keeping the system healthy.

Design and Specification of Vacuum Deposition Systems

• From concept to RFQ
• Vendor interactions and final pricing
• Getting facilities and labs in place
• Installation, training, acceptance
• Continued Support

Attendees in this tutorial receive course notes.

For additional information on this course, view the Detailed Syllabus.

M-102 Introduction to Ellipsometry

Ellipsometry is an important characterization technique for optical coatings. This tutorial will build an understanding of ellipsometry fundamentals. We start with basic theory behind optical measurements and discuss how ellipsometry extracts thin film properties such as single and multi-layer film thickness, complex refractive index, porosity, conductivity, and composition. A wide range of ellipsometry applications will be surveyed, with emphasis toward optical coatings.

The level of this tutorial is suitable for those new to the field of optical characterization but also contains worth-while information for current ellipsometry users. It will benefit anyone interested in exploring the potential of ellipsometry measurements.

• Principles of ellipsometry
• Optical constants and light-matter interaction
• Using Ellipsometry to measure material properties
  • Film thickness, complex refractive index, …
• Survey of applications:
  • What can Ellipsometry measure?
  • Ex-situ, in-situ, and in-line examples.

For additional information on this course, view the Detailed Syllabus.

M-110 Introduction to X-ray Photoelectron Spectroscopy

This introductory course covers the fundamentals of X-ray photoelectron spectroscopy (XPS), which is the most widely used and important method for chemically analyzing surfaces. This class is intended for scientists, engineers, and technicians who would like both a basic, working knowledge of the technique and the ability to understand and interpret XPS data, including survey and narrow scans. XPS is an important tool for understanding surfaces in many areas of technology, including in semiconductor manufacturing, failure analysis, thin film deposition, tribology, wetting, biosensors, coatings, catalysis, and electrochemistry. After taking this course, the student should understand the basic physics of XPS and how an XPS instrument works, including how X-rays are generated, why XPS is surface sensitive, the fundamental equation of XPS, how spin-orbit splitting dictates the type of peaks that are present in a spectrum, and the nomenclature of XPS (and Auger) lines. The student should also be able to identify/calculate the elements that are present at a surface, their concentrations (with appropriate caveats), and be able to understand some basic peak fitting.

Course Outline/Topics Covered:

• Why XPS?
• Introduction to XPS
• XPS Basics
  • Simple schematic of an XPS instrument
  • X-ray generation
  • XPS as a high vacuum technique
  • The fundamental equation of XPS
  • Why XPS is surface sensitive
  • Nomenclature of XPS and Auger Lines
  • Components of an XPS instrument (generating X-rays, Bremsstrahlung, X-ray monochromators, etc.)
  • Charge neutralization

• XPS survey spectra
  • Photoelectron peaks
  • Auger signals
  • Baseline rises
  • Phonon loss signals
  • The valence band

• Spectral interpretation
  • Peak shapes
  • Baselines
  • Chemical shifts
  • Shake-up peaks
  • Peak asymmetry
  • Baseline rises (buried layers)
  • C 1s peak fitting
  • Uniqueness plots
  • Bad examples of spectral interpretation

• Quantitation
• Reference signals (e.g., C 1s)

M-120 Design of Experiments for R & D

This course emphasizes issues of practical importance to those who use Design of Experiment (DOE) methodologies in the R&D or production environment. It is intended for scientists, engineers, and technicians who would like an understanding of DOE concepts and the practical challenges that can arise when incorporating them into one’s experimental practices. The basic introduction to DOE and discussion of fundamental assumptions will be useful to those unfamiliar with DOE concepts. The discussion of complications and examples of how they can be addressed will be useful to those who are experienced with DOE and are interested in achieving better results from applying DOE principles. Managers of groups involved in R&D and production will find the material helpful in their efforts to support the work in their groups.

This Webinar will be equally useful for students, engineers and technicians who are working with any thin film deposition process or are planning to work in related areas.

• Underlying assumptions of DOE
• DOE designs for screening factors
• DOE designs for modeling responses
• Response surface forms - the twisted plane, saddles, and domes
• Complications that arise - when is a factor not really a factor?
• More complications - dealing with non-linear responses
• Simulated experimental examples
  • screening factors
  • modeling responses
• Plasma web treatment example
• determining a suitable process factor space
• redefining the factor space using plasma diagnostics
• applying a physical model of the modification process

M-130 Scanning Electron Microscopy Sample Preparation, Image Optimization, and Microanalysis

A scanning electron microscope (SEM) is a technique to image and characterize materials. SEM's use a beam of electrons to bombard a sample that is placed in a vacuum. Considering the various interactions that can occur between the incident electron beam and the sample that is studied, topographical (surface imaging) and chemical compositional data is routinely obtained.

Surface preparation of samples is an extremely important consideration, especially in biological and non-conducting (dielectric) specimens. Charge buildup on the surface of the sample will affect the deflection of the incident electron beam as well as increasing the scattering of secondary electrons; degrading image quality and introducing artifacts in the imaging.

This course is designed for the scientist, engineer, and technician that will working with Scanning Electron Microscopy (SEM) and who has in interest in understanding the complex factors of sample preparation and microscope operation that control image quality and compositional data. This course will present techniques and information that will be invaluable in optimizing the utility of this powerful and widely available nondestructive characterization technique. The following topics will be explored in detail:

VACUUM

• 1.1 What is vacuum and the history
  • 1.1.1 Applications
• 1.2 Pressure ranges
  • 1.2.1 Time to form a monolayer
• 1.3 How do we create vacuum
  • 1.3.1 Different pumps in a SEM
    • 1.3.1.1 Pumps for rough vacuum
    • 1.3.1.2 Pumps for high vacuum
    • 1.3.1.3 Pumps for ultra-high vacuum
  • 1.3.2 Vacuum gauges for SEM
• 1.4 Gas load
  • 1.4.1 Sample considerations
• 1.5 Helpful tips

SAMPLE PREPARATION

• 2.1 How to start
  • 2.1.1 Sample as small as possible
• 2.2 Preparation of bulk - HARD
  • 2.2.1 Surface observations
  • 2.2.2 Inner surface
  • 2.2.3 Cross-sections
• 2.3 Preparation of bulk - SOFT
  • 2.3.1 Biological samples
• 2.4 Preparation of powders
  • 2.4.1 Diameter d > 3 mm
  • 2.4.2 Diameter 3 µm < d < 3 mm
  • 2.4.3 Diameter d < 3 µm
  • 2.4.4 Cross-sections
• 2.5 Mounting: holders and adhesives 2.6 Coating: sputtering and evaporation
• 2.7 Thin film growth
• 2.8 Helpful tips

SCANNING ELECTRON MICROSCOPY (SEM)

• 3.1. The basic principle?
• 3.2. Parts of the SEM
  • 3.2.1 Electron gun
  • 3.2.2 Optics:
    • 3.2.2.1 Lenses
    • 3.2.2.2 Apertures
    • 3.2.2.3 Deflectors
  • 3.2.3 Scanning system
  • 3.2.4 Detectors
• 3.3 Secondary (SE) and backscattered electrons (BSE)
• 3.4 SEM settings
• 3.5 Helpful tips

MICROANALYSIS: EDS, WDS, EBSD

• 4.1 What is microanalysis?
• 4.2 Electrons and their interactions
  • 4.2.1 X-ray (Bremsstrahlung)
  • 4.2.1 X-ray (Characteristic)
• 4.3 X-ray spectroscopy in SEM
  • 4.3.1 How does it work?
    • 4.3.1.1 Detector for EDS
    • 4.3.1.2 Counters for WDS
  • 4.3.3 Sample considerations
  • 4.3.4 Proper SEM and EDS parameters
• 4.4 EBSD
  • 4.4.1 Structure
  • 4.4.2 How it works
  • 4.4.3. Pattern formation mechanisms
  • 4.4.4. Some examples

ELECTRON MICROSCOPY SOFTWARE

• 5.1 Data analysis
• 5.2. Some examples
• 5.3 Image manipulation
  • 5.3.1 ImageJ
  • 5.3.2 Gatan DM
  • 5.3.3 Smile View
• 5.4 Spectrum manipulation
• 5.5 Monte Carlo simulations
  • 5.5.1 CASINO
  • 5.5.2 Win X-Ray
  • 5.5.3 pyPENELOPE

M-201 Flexible Electronics

Revolutionary new capabilities for monitoring physical health of humans, machinery, and the processes governing the climate and condition of our entire planet are currently in development. Low cost flexible electronic devices play a critical role in these endeavors. This course will trace the evolution of reliable, large-area, flexible electronics and associated technologies, and will cover fabrication approaches such as chip attachment, thin-film devices, and nanoscale self-assembled and printed device based coatings. Additionally, fundamentals of state of the art fabrication techniques including vapor phase processing and direct fabrication approaches such as printing with aerosols and particle-based inks featuring advanced electronic materials to enable flexible electronic devices will be presented.

• Flexible electronics overview
  • General concepts
  • Applications

• Evolution of synthesis and fabrication materials optimized for flexible electronics
  • Silicon
  • Organic electronics
  • Ultra-thin, or 2D materials

• Synthesis and processing methods for flexible electronics
  • Substrate considerations and preparation
  • Vapor phase processing
  • Printing
  • Photonic annealing

• Mechanical and electronic properties of flexible electronic devices
  • Limitations on flex – performance vs. strain
  • Lifetime dependence on strain

• Characterization and device integration
  • State of the art approaches for flex characterization
  • Challenges unique to flexible platforms

• The future of flex
  • Performance potential
  • Market/application projections

M-205 The Craftsmanship of Ophthalmic Coatings

Vision Monday Press Release

This tutorial covers the basic information needed to produce state-of-the-art ophthalmic coatings ranging from the coating characteristics to the production of coatings and process trouble shooting. The course is intended for technicians, floor shop managers and senior operators working in the ophthalmic industry dealing with the day to day traps of operating coating equipment, running processes, and the infrastructure that supports both.

The tutorial begins with the fundamentals of Ophthalmic coating and discusses the issues associated with selecting the best coating processes in terms of coating quality, process management and process performance on a day to day basis. An overview of the main processes for producing ophthalmic coatings is given, which includes hard coating by dip or spin methods, anti-reflective coatings by vacuum deposition processes, and ion assisted PVD. Test methods as leak rate determination are used to evaluate processing equipment and coatings are also overviewed, which covers tests for physical, chemical and mechanical properties for lifetime performance expectancy. Finally, functional coatings that have been developed and utilized for some specific applications will be discussed as well as troubleshooting for typical errors and how to recognize and prevent them.

• Coatings on ophthalmic lenses – Why use them and what are the characteristics
• Machines used in ophthalmic and the necessary infrastructure to operate them successfully
• Coating processes used and their application
• Benefits and risks of specific machine types and related processes
• The sampling method as measured standard and its consequences for batch processes
• The need for consistency, stable robust processes, high FPY and strict maintenance
• Testing methods in-house; per batch, per machine
• Testing methods at test facilities as COLTs for independent benchmarking of quality
• The Do´s and Dont’s of day-to-day production – Why pessimists are the best coating practitioners
• State-of-the-art coatings, properties, and applications

M-210 Introduction to Solid-State Thin Film Batteries

The half-day tutorial is designed to introduce the concept of solid-state thin film batteries to designers and component fabricators who are looking for a micro-sized energy storage device that can be permanently integrated into small electronic and energy harvesting systems. A review of the currently available deposition techniques will be presented as well as some of the benefits and limitations of this novel battery. Future directions to improve energy density through alternative materials combinations and 3-dimensional device designs will be discussed. Recommendations for deposition system design based on the issues associated with solid state thin film battery fabrication, including cross contamination and encapsulation, will also be presented.

1. Resources for Physical Vapor Deposition
   1. Books on PVD
   2. Reference tables
   3. Formulas
2. What is a solid-state thin film battery (SSTFB)
   1. How traditional batteries work
   2. How solid-state thin film batteries work
   3. Features, ionic motion, flexibility
   4. Discharge performance
3. History of (Modern) SSTFBs
   1. Oak Ridge National Lab and the invention of LiPON
   2. Patent history since 1993
   3. Patents by geography and company
   4. Summary of the manufacturing process
4. Applications of SSTFBs
   1. Sensors
   2. Mobile electronics
   3. Micro-energy harvesting systems
5. Environmental conditions
   1. The atmosphere
   2. Molecular speeds
   3. Pollution
   4. Molecular density and pressure
   5. Mean free path
6. PVD conditions
   1. Deposition system design
   2. Process parameters
   3. Fundamental parameters
   4. Substrate preparation
   5. Film microstructure and composition
   6. Film properties
7. The Sputter Process
   1. Basic schematic
   2. Effect of electrical biasing
   3. Example of LiCoO₂ cathode film
   4. Example of LiPON electrolyte film
   5. Sputter system designs: for research, for production
   6. Magnetron sputtering
   7. Sputtering yields
   8. Sputtering electrical insulators
8. Thermal evaporation
   1. Lithium metal anode films
   2. Basic thermal evaporation system design
   3. Equilibrium vapor pressure
   4. Materials utilization
   5. Thickness uniformity
9. Thin film growth models
   1. Structure zone models
      1. Impact of pressure
      2. Influence of substrate temperature
      3. Other factors effecting thin film morphology
   2. Thin film growth models
      1. Layered growth: Frank–Van de Merwe
      2. Island growth: Volmer-Weber
      3. Layered and island growth: Stranski–Krastanov
      4. Hybrid models – random growth models
10. Impact of stoichiometry on device performance
    1. The problem with LiCO₂ – impact of Li content on energy density and electrical conductivity
    2. Sputter yields – preferential sputtering
    3. Target geometry during sputtering – changing race track angles changes adatom flux directions
    4. Changing magnetron effects during sputtering
    5. Stress in thin films, effect of pressure, intrinsic stress, thermal stress
11. The need for smooth, particulate free films
    1. Impacts on making pinhole free electrolyte layers
    2. How particulates are generated
    3. Generation of localized hot spots
12. Post deposition processing
    1. Flexible substrates
    2. Rigid substrates
    3. Crystallization step to improve ionic conductivity
13. The need for encapsulation and approaches to protect the battery from moisture
    1. Short term encapsulation
    2. Long term encapsulation
       1. Hermetically sealed chip packaging
       2. Multi-layered coatings
14. Example deposition systems for SSTFBs
    1. Single chamber system
    2. Multi-chamber system with load lock
    3. Glove box integrated systems
15. SSTBs in 2D – approaches to increase capacity in a small footprint
    1. Cathode/Electrolyte combinations for higher voltage
    2. Thin substrates, flexible, temperature limitations
    3. Hunt for new materials
16. SSTBs in 3D – approaches to increase capacity in a 3D and small footprint
    1. 3D substrates,
       1. waves
       2. vias
       3. rods
       4. Gels or foams?
    2. Alternative deposition techniques (ALD, plasma assisted ALD (PEALD))
17. Characterization of SSTFBs
    1. Impact of discharge rates on performance
    2. Charge discharge examples
    3. Target materials
    4. As-deposited films
    5. Post deposition processes
    6. Half cells
    7. Full cells
18. Conclusions

M-220 Thin Film Superconductor Tapes

High Temperature Superconductors (HTS) are beginning to impact a large potential market in diverse applications such as energy, health, military, telecommunication, transportation and research. The challenge has been in developing these brittle ceramic materials in lengths of over a kilometer on flexible substrates with properties similar to that of high quality epitaxial thin films. Novel materials processing has been developed to fabricate superconducting tapes with excellent critical current performance by manipulation of grain orientations and nanoscale defects. HTS tapes are now being manufactured in quantities of few hundred kilometers annually with current carrying capacity of about 400 times that of copper wire of the same cross section. This tutorial delves into the details of RE-Ba-Cu-O (REBCO, RE = rare earth) HTS materials, challenges faced in utilizing these materials, innovative solutions developed to overcome these challenges, thin film vacuum deposition technologies to fabricate REBCO tapes, industrial-scale manufacturing, ongoing R&D activities and applications. This course is intended for students, scientists and engineers who are interested in new opportunities in the rapidly-growing field of thin film superconductor manufacturing or in applying innovative materials, process and roll-to-roll manufacturing technologies developed for superconductors in their own fields.

• Superconductors; Historical Overview:
  • Cryogenics
  • Discovery of superconductivity
  • Low temperature superconductors
• High temperature superconductors (HTS):
  • HTS materials including RE-Ba-Cu-O (REBCO)
  • Structure and properties
  • HTS tape fabrication
• Critical currents in HTS:
  • Challenges with anisotropy and grain boundaries
  • Solutions to address weak-link problems to increase critical current
  • Flux pinning
  • Nanoscale defects to improve flux pinning to increase critical current
• Biaxially-textured thin film templates to fabricate high-current REBCO tapes:
  • Ion Beam Assisted Deposition (IBAD)
  • Rolling Assisted Biaxially-Textured Substrates (RABiTS)
  • Inclined Substrate Deposition (ISD)
• REBCO thin film superconductor tapes using biaxially-textured templates:
  • Deposition methods – Pros and Cons
  • Engineering nanoscale defects in REBCO thin film tapes
  • Complete REBCO tape architecture
• Current status of thin film superconductor tapes:
  • Industry-scale roll-to-roll manufacturing
  • Ongoing R&D
  • Applications of thin film superconductor tapes

M-230 Nanoscale heat transfer in thin films and interfaces

Heat management in thin films and coatings has always been an important consideration in applications including optics, tribological coatings, flexible substrates, and a broad range of electronic devices. The modern drive for smaller scaling and higher power or heat loads demands both technological innovations and a better understanding of heat transfer. Modern technology and materials are commonly progressing to sub-micron characteristic length scales. In this regime, classical laws of heat transfer no longer apply, and the energy of the individual energy carriers (electrons, phonons, and photons) and how they interact on the time and length scales associated with their scattering events must be considered (i.e., nanometers and picoseconds). This leads to phenomena such as reduced thermal conductivity of thin films compared to their bulk counterparts, thermal resistances of thin film heterosystems that are dominated by interfacial processes, and novel heat transfer processes that are driven by the coupling of energy carriers across interfaces of solids, liquids, gases and plasmas. In this full-day course, we will review the fundamentals of heat transfer from a nanoscale, or atomic perspective. From considering heat transfer properties of materials from this “bottom-up” perspective, we will overview the critical length and time scales that dictate changes in thermal conductivity of thin films that arise due to growth conditions, material processing, manufacturing, and heterogeneous integration. This course, which is designed for a technical community with little to no background in heat transfer, will cover the following topics:

1. What makes a high and low thermal conductivity material – an electron and phonon nanoscale perspective
2. Thermal conductivity measurements: thin film methods
3. Thermal conductivity of thin films: how film dimensional and growth conditions can lead to interfaces and defects that scatter electrons and phonons, thus reducing the thermal conductivity of materials
4. Thermal boundary resistance: coherent and incoherent heat transfer across interfaces in nanostructures
5. Coupled nonequilibrium heat transfer: Energy coupling among electron, phonons and photons including ultrafast laser pulse effects
6. Heat transfer in materials during synthesis and manufacturing, including plasma-material interactions during deposition and laser-based manufacturing

C-103 An Introduction to Physical Vapor Deposition (PVD) Processes

This course is suitable for all seeking an introduction to Physical Vapor Deposition (PVD) processes and includes detailed descriptions of the hardware, systems, theory, and experimental details related to evaporation, sputtering, arc deposition, laser ablation, etc. This course also includes an introduction to the vacuum technology as relevant to PVD. Thus, it includes an introduction to vacuum science, pumps, vacuum measurement and control instruments, plasma and plasma characterization, etc. This course does not have any pre-requisite but some previous experience with any deposition technology or equipment is helpful.

Physical vapor deposition (PVD) processes are atomistic deposition processes in which material vaporized from a source is transported in the form of a vapor through a vacuum or low-pressure gaseous environment to the substrate, where it condenses and film growth takes place. PVD processes can be used to deposit films of compound materials by the reaction of depositing material with the ambient gas environment or with a co-deposited material. This tutorial will discuss and compare the basic PVD techniques including vacuum evaporation, sputter deposition, arc vapor deposition, pulsed laser deposition, ion beam sputtering and ion plating. Vacuum evaporation uses thermal vaporization as a source of depositing atoms; sputter deposition uses physical sputtering as the vaporizing source; arc vapor deposition uses a high-current, low-voltage arc for vaporization; and ion plating uses concurrent or periodic energetic particle bombardment to modify the film growth. The parameters used for each technique will be discussed along with their advantages, disadvantages, and applications. This is an entry-level tutorial to acquaint the students with various PVD processes used for “surface engineering.”

The day-long tutorial will be conducted in two sessions with the first session primarily dedicated to vacuum technology and instrumentation and the second session focusing on individual PVD processes.

After the completion of this tutorial, the participant will have acquired:
a. Working knowledge of a vacuum system, as pertinent to PVD processes.
b. Understanding of the technology that creates and measures vacuum.
c. Understanding of the various processes that lead to the formation of vapors
d. Understanding of the growth of thin films
e. Understanding of the surfaces involved in thin film growth and how to prepare these surfaces for a successful deposition run.

• Introduction: deposition environments (vacuum and plasma), film formation, film structures, reactive deposition, factors affecting film properties
• Vacuum evaporation and vaporization, evaporation and sublimation, deposition chambers, vaporization sources (resistive and e-beam), evaporation materials, fixture design, process parameters, monitoring and control, advantages and disadvantages, applications
• Sputter deposition and physical sputtering, plasmas (dc, rf, magnetron, and pulsed dc), sputtering target configurations, reactive sputter deposition, sputtering materials, process parameters, monitoring and control, advantages and disadvantages, applications
• Arc vapor deposition and vacuum and plasma arcs, properties of arcs, generation and “steering” of arcs, arc sources, reactive arc deposition, process parameters, monitoring and control, advantages and disadvantages, applications
• Ion plating and bombardment effects, bombardment configurations, reactive ion plating, ion plating vaporization sources and evaporation, sputtering and arc process parameters, monitoring and control, advantages and disadvantages, applications
• Ion beam sputtering – role of ions in the overall PVD processes, ion generation and use specifically in the ion beam systems, process geometries and systems.
• Laser ablation – Advantages and disadvantages of using a laser system for ablation and subsequent deposition of materials, process variables, system geometry.
• PVD deposition systems and configurations (batch, load-lock, and in-line), pumping options
   

The tutorial fee includes the text, Handbook of Physical Vapor Deposition (PVD) Processing, 2nd edition, Donald M. Mattox (Elsevier Publishing, 2010).

C-203 Sputter Deposition (two – day course)

This tutorial covers fundamental mechanisms associated with generation of glow discharges, sputtering, and energetics of target and substrate processes. Operation and system design will be discussed for dc, rf, magnetron (both magnetically balanced and unbalanced), pulsed dc, and ion beam sputtering. The advantages and disadvantages of these different modes of operation will be examined from the point of view of controlling film properties. Emphasis is placed on developing a sufficient understanding of sputter deposition to provide direction in designing new processes. Present and future trends in sputter deposition also will be addressed.

• Processes controlling film growth and properties
• The role of energetic particles in controllably modifying these processes
• Target sputtering effects
• Nature and energy of sputtered atoms
• Diode, triode, magnetron, and ion beam systems
• dc, HIPIMS, pulsed dc, mid-frequency ac, and rf power for targets and substrates
• Reactive sputtering of conducting and dielectric layers
• Alloy sputtering

For additional information on this course, view the Detailed Syllabus.

C-204 Basics of Vacuum Web Coating

This tutorial is intended for roll coater machine operators, maintenance personnel, technicians, engineers, scientists, supervisors, and others who would benefit from an introduction to issues related to roll-to-roll vacuum coating onto polymer substrates. This tutorial will emphasize practical aspects of the topics, and the treatment will be descriptive with little mathematics used. The tutorial focuses strongly on coatings made by resistance evaporation but touches on e-beam and induction evaporation and sputter coating. If your primary interest is sputtering onto webs, please see our other offering, “Sputter Deposition onto Flexible Substrates” (C-211).

• Markets for coated web products
• Vacuum technology for web coating
• Substrate characteristics
• Web handling and web winding systems
• Coating techniques and web cooling issues
• Process and product monitoring methods
• System maintenance issues
• Sources of information about web coating

For additional information on this course, view the Detailed Syllabus.

C-205 Introduction to Optical Coating Design

Optical interference coatings are essential and enabling components in sensors, display devices, biomedical instrumentation, aerospace systems, and numerous other applications. It is hard to think of an optical instrument or system that does not benefit from their use and many systems would simply not be possible without them. This one-day course provides an introduction to optical coatings and essential design methods.

The course begins with some relevant fundamentals of optics and important properties of optical materials. The basic principles of interference coatings are described and useful insight is gained through the use of simple formulas and diagrams. These tools are applied to understanding the most important and exemplary design types, such as antireflection coatings, edge filters, narrowband filters, and high reflecting coatings. The combination of simpler design types to create more complex functionalities and the use of computer-optimization to improve on the performance of simpler “starting designs” are considered.

The level of the course is geared towards engineers and scientists who are new to the field and need to understand optical coatings and design fundamentals. It is also a suitable course for technical managers, technicians, and experienced practitioners seeking a brush-up. An advanced background in mathematics or physics is not required.

• Introduction to light and optical materials
• Survey of optical coatings
• Optics of interfaces and interference fundamentals
• Graphical tools for understanding and designing coatings
• Antireflection coatings
• Quarterwave stacks and all-dielectric reflecting coatings
• Narrowband filters, wideband filters, and edge filters
• Coatings incorporating metal layers
• Coatings at oblique angles of incidence
• Design synthesis and optimization

C-207 Evaporation as a Deposition Process

Evaporation is a technology used widely to produce thin films in vacuum. The tutorial describes the basics of evaporation and its utilization in various technological processes. The tutorial provides the conceptional basis for a wide range of evaporation techniques. It is designed to meet the needs of both a newcomer to the field and the experienced professional. Experienced scientists and engineers will have an opportunity to broaden their view of this field and deepen their understanding of evaporation processes.

• Thin film deposition in vacuum
• Evaporation mechanism—Thermodynamic of evaporation, evaporation rate, vapor pressure of elements, evaporation of compounds, evaporation of alloys
• Film thickness uniformity and purity—Deposition geometry, film thickness uniformity, conformal coverage, film purity, deposition rate monitoring and process control
• Evaporation sources—General considerations, resistance heated sources, sublimation sources, induction heated sources, electron beam heated sources, arc evaporation, laser ablation
• Reactive evaporation—Reactive and activated reactive evaporation
• Ion-assisted evaporation—Ion plating, enhanced ion plating, plasma-assisted deposition, ion-beam-assisted deposition
• Microstructure of evaporated thin films—Film growth mechanisms, structural zones, ion-assisted growth
• Deposition systems for thin film deposition by evaporation—Major parts of the system, web coatings systems, vacuum batch systems
• When should we use evaporation as a deposition process

For additional information on this course, view the Detailed Syllabus.

C-208 Sputter Deposition for Industrial Applications

This course covers topics of practical importance to those who presently use sputtering or who would benefit from an introduction to the technology. The emphasis is on developing an understanding of the underlying science and the factors that influence product throughput, coating quality and process robustness and reliability. Typical applications of various sputtering techniques are presented as well as the advantages and limitations of each. Relationships between the sputtering conditions and important film properties - such as microstructure, composition, stress, adhesion and the resulting mechanical, electrical, and optical characteristics - are discussed. The emphasis is on process and hardware considerations rather than the detailed material properties of the coatings. No prior background in sputtering is needed.

• A Brief introduction to basic vacuum technology
• Sputtering plasmas and the nature of the sputtering process
• Estimating deposition rates and rate limiting factors
• Cathode geometries and associated film thickness profiles
• Film composition and compositional uniformity
• Film nucleation and growth
• Effects of substrate temperature and energetic particle bombardment
• Biased sputtering and the use of unbalanced magnetrons
• Sources of substrate heating
• rf sputtering of dielectrics from insulating targets
• The dc, pulsed dc, and ac reactive sputtering of dielectrics
• Process control methods for reactive sputtering
• Arcing, disappearing anodes, and other process stability issues
• Ion beam sputtering
• High Power Pulsed Magnetron Sputtering (HPPMS or HIPIMS)

For additional information on this course, view the Detailed Syllabus.

C-210 Introduction to Plasma Processing Technology

The goal of the tutorial is to show the link and provide understanding of relations between coating application, coating (or modified surface) properties, selection criteria on process characteristics, selection criteria on plasma parameters, and method design. It is possible to predict how the process parameters will be reflected in the coating and in the opposite direction, requirements on the coating properties can imply how the process should be designed.

• Plasma-assisted technologies, general attributes
• Useful criteria, basic relations and limits for plasma, classification of plasmas
• Generation of gas discharge plasma, plasma diagnostics
• Generation of vapor species, transport through medium, diffusion, condensation at the surface
• Consequences of the deposition process on film properties
• Fundamentals of radical and ion-assisted plasma chemistry
• Homogeneous and heterogeneous plasma-assisted reaction in deposition of films
• Examples of novel plasma processes
• Limits and new trends
• Hybrid plasma processes

C-211 Sputter Deposition onto Flexible Substrates

This tutorial is intended for engineers, scientists, and others who are interested in sputter deposition onto polymer substrates in a roll-to-roll format. This tutorial will emphasize practical aspects of the topics, and the treatment will be descriptive with little mathematics used. There will be time dedicated to problem solving; bring your questions and problems and leave with new solutions and/or new directions.

• Markets for sputter-coated web products
• Vacuum technology for sputter web coating
• Substrate characteristics
• Web handling, web winding, and web cooling issues
• The sputter coating process
• Process and product monitoring methods
• Current topics in sputter web coating

Additionally, the notes provide extensive information and references to sputtering (written at several levels) and a comprehensive bibliography on sputter web coating.

For additional information on this course, view the Detailed Syllabus.

C-212 Troubleshooting for Thin Film Deposition Processes

The tutorial is designed for process engineers and technicians, quality control personnel, thin film designers, and maintenance staff.

Vacuum deposited thin films are used for optical coatings, electrically-conductive coatings, semiconductor wafer fabrication, and a wide variety of other uses. They may be deposited on glass, plastic, semiconductors, and other materials. Usually, a vacuum deposition process produces durable, adherant films of good quality. But what do you do when things go wrong? Not all films can be deposited on all substrate materials. Sometimes films peel off or crack. Other times they are cloudy, absorbing, scattering, or have other unacceptable properties. 

This tutorial will teach you about techniques and tools that can be used to identify the source of the problems, correct the process, and get back into production. It will also help in learning how to develop new processes and products.

• Mechanical, electrical, and optical properties of thin films
• Process parameters that affect film properties
• Gauge and instrument calibration
• Properties of substrate surfaces
• Measurement of film stress
• Detection of contamination
• Introduction to surface analysis techniques (Auger, ESCA, SIMS, FTIR)
• Substrate preparation and cleaning

For additional information on this course, view the Detailed Syllabus.

C-214 Thin Film Deposition Optimization

As a preliminary, in the first half of the session, background of some process factors which can cause problems will be reviewed. Thin film growth properties such as nucleation and percolation/coalescence are reviewed along with conductivity in metallic films. Examples of thin film growth with columns and/or dendrites will be shown. The process factors which may cause stress and delamination will be presented. The importance of the quality of the vacuum and the control of process temperature and particle energy and flux level will be demonstrated.

Stability and reproducibility are critical to any production process. We want to get the same product today as we did yesterday and get the same result tomorrow. Setting control parameters optimally is one key to these results, but often found to be done less desirably in practice. This is addressed first for thickness and temperature control before more complex things. Design of Experiments Methodology (DOE) will then be addressed with history, principles, and examples.

Vacuum coating processes typically have many variables which influence the properties of the results. Although there may be dozens of variables which have some influence on the results, it is frequently possible to determine which three or four variables are most influential and ignore the rest as being only noise factors. It is desirable to find the optimal values for each influential variable where the results of the overall process meet the best compromise between all of the process goals.

One general methodology to accomplish this efficiently evolved approximately one century ago in the agricultural industry for developing new strains of plants and animals. The experimental/evolutional cycle times for these developments are typically long. Therefore, it is highly desirable to minimize the number of experiments needed, and to maximize the amount of data acquired from those experiments. This is generally referred to as DOE.

This course will show how the set up and carry out a DOE for various simple and complex example processes. The user should be able to become well acquainted with using DOE to debug ailing processes and/or optimize new processes.

• Effects of errors in deposition rate and temperature
• Constant/steady deposition rate and temperature
• Tuning-in control parameter settings
• History of Design of Experiments Methodology
• A non-mathematical view of the data gathering and processing
• Simple example of aluminum coating deposition process development
• Example of an ion assisted TiO₂ deposition process development
• Example of an ambient temperature MgF₂ deposition process
• Example of initial strategy in a complex process refinement
• A successful process problem solution

C-216 Practical Design of Optical Thin Films

The course is intended to be valuable to new coating engineers, scientists, technicians, and technical managers as well as seasoned thin film scientists who are involved in design, development, and production of optical thin films. Basic principles are laid out from the beginning for those new to the field, but the evolution of the topics then moves into material and techniques useful to even the more experienced practitioners. No extensive background in mathematics or physics is required; extensive graphical illustrations are used. This course deals with optical thin film coating design. It is a companion to, but not a requirement for, the course on optical thin film coating production on the following day with another book by the author. Advanced optical thin films are being used increasingly in communications, optical systems, and light control and collection applications. The sophistication of the optical coating industry is advancing rapidly to meet ever increasing demands for performance and production capability. New viewpoints, equipment, and processes are available to support advanced capability and efficiency. Objectives of this course include: to provide increased knowledge and understanding of the many practical aspects of optical coating design, to discuss the techniques and principles discussed, and to elucidate techniques and processes that are commonly successful in meeting optical coating needs.

• Firmly grasp, visualize, and use optical thin film design principles.
• Use graphical methods in thin film design.
• Estimate what can be achieved before starting a design.
• Obtaining good indexes from processes before final designs by good measurement techniques and avoiding pitfalls.
• Understand Fourier thin film synthesis and compare rugate and discrete layer designs.
• Solve practical coating design problems.

Attendees in this tutorial receive the text, Practical Design of Optical Thin Films, 4th edition, Ronald R. Willey (Willey Optical, Consultants, 2014) [printed by Lulu.com Press]

For additional information on this course, view the Detailed Syllabus.

C-217 Practical Production of Optical Thin Films

This course is intended to be valuable to coating engineers, scientists, technicians, and technical managers as well as seasoned thin film scientists who are involved in the development, and production of optical thin films. Basic principles are reviewed in the beginning to insure that all are using the same nomenclature, but the evolution of the topics then moves into material and techniques useful to even the more experienced practitioners. No extensive background in mathematics or physics is required; extensive graphical illustrations are used. This course deals with optical thin film coating production. It is a companion to, but not a requirement for, the course on optical thin film coating design with another book by the author. Advanced optical thin films are being used increasingly in communications, optical systems, and light control and collection applications. The sophistication of the optical coating industry is advancing rapidly to meet ever increasing demands for performance and production capability. New viewpoints, equipment, and processes are available to support advanced capability and efficiency. Objectives of this course include: to provide increased knowledge and understanding of the many practical aspects of optical coating production, to discuss the techniques and principles, and to elucidate techniques and processes that are commonly successful in meeting optical coating needs.

• Select appropriate optical coating equipment to support the needed processes.
• Be aware of the importance of pumping effects and measurement accuracy and how to avoid pitfalls.
• Be familiar with the properties and process know-how for common optical coating materials.
• Further understand the use of energetic processes such as sputtering, plasma, and ion assist.
• Understand various monitoring and control strategies and their advantages and limitations.

Attendees in this tutorial receive the text, Practical Production of Optical Thin Films, 3rd edition, Ronald R. Willey (Willey Optical, Consultants, 2015) [printed by Lulu.com Press].
 

For additional information on this course, view the Detailed Syllabus.

C-218 Advanced Design of Optical Thin Films

The course is intended to be valuable to coating engineers, scientists, technicians, and technical managers as well as seasoned thin film scientists who are involved in design, development, and production of optical thin films. Basic principles are reviewed in the beginning to insure that all are using the same nomenclature, but the evolution of the topics then moves into material and techniques useful to even the more experienced practitioners. No extensive background in mathematics or physics is required; extensive graphical illustrations are used. This course deals with optical thin film coating design. It is a companion to, but not a requirement for, the course on optical thin film coating production with another book by the author. Advanced optical thin films are being used increasingly in communications, optical systems, and light control and collection applications. The sophistication of the optical coating industry is advancing rapidly to meet ever increasing demands for performance and production capability. New viewpoints, equipment, and processes are available to support advanced capability and efficiency. Objectives of this course include: to provide increased knowledge and understanding of the many practical aspects of optical coating design, to discuss the techniques and principles discussed, and to elucidate techniques and processes that are commonly successful in meeting optical coating needs.

• Review Fundamentals of Thin Film Optics.
• Firmly grasp, visualize, and use optical thin film design principles.
• Discuss a variety of Applications.
• Designing with Absorbing Materials.
• Advanced Design Concepts.
• Estimate what can be achieved before starting a design.
• Obtaining good indexes from processes before final designs by good measurement techniques.
• Solving Practical Coating Design Problems.

Attendees in this tutorial receive the 400+ page text, Practical Design of Optical Thin Films, 5th edition, Ronald R. Willey (Willey Optical, Consultants, 2018) [printed by Lulu.com Press]

C-220 Introduction to Two-Dimensional Materials

Two dimensional (2D) materials are an expanding family of atomically thin materials with unique and unexpected optical and electronic properties that we continue discover each day. These materials are of particular interest because they offer the ultimate in layer-by-layer tailorablity to achieve the desired properties of materials. Moreover, electronic and optical devices produced from 2D materials demonstrate extreme mechanical flexibility, giving rise to new possibilities for technological developments with broad and impactful applications. This class will describe in detail the fundamental properties of this unique class of materials, typical approaches to making and characterizing them, and their applications.

• Properties
  • Fundamentals of physics associated with 2D materials resulting in unique combinations of electronic, optical, and mechanical properties.
  • Characteristics of two dimensional material families, including graphene, transition metal dichalcogenides, and group IV monochalcogenides.

• Processing
  • Approaches for synthesis of 2D materials including mechanical and chemical exfoliation, chemical vapor deposition, physical vapor deposition, additive manufacturing, as well as the associated challenges of processing low dimensional materials
  • Practical discussions on how to get started synthesizing new materials and fabricating 2D devices

• Characterization
  • Common chemical and structural characterization approaches for two-dimensional materials including Raman, XPS, TEM
  • Novel, in situ characterization techniques

• Applications
  • Transistors
  • Light sources
  • Photodetectors
  • Molecular sensors

C-230 PVD Processing of Plastics for Better Protection, Reflection, and Decoration (Half Day)

Thousands of PVD coating systems are installed around the world applying reflective, decorative, electronic shielding and tribological coatings on 3-dimensional polymer substrates including: automotive lighting and trim, toys, white goods (kitchen and bath appliances), sanitary (plumbing components), and electrical enclosures. These films are predominantly created using PVD thermal evaporation, or sputtering, and PE/CVD technologies. The industry is always looking for innovative thin film solutions, whether it be a new material, color or physical property. Today’s technologists must be versed in the basic PVD technologies in order to prepare for these innovation challenges. This course will review the technologies of thermal evaporation and sputtering as it applies to the various applications, as well as the ongoing maintenance required to ensure coating quality and where to look when the process goes astray.

Individuals who will benefit from this course will include: a.) technicians and engineers responsible for the setup, operation and maintenance of the equipment, b.) technologists who are responsible to develop new application, c.) Purchasing managers/executives responsible for capital expenditures, d.) supervisors responsible for production, quality and throughput, and finally e.) companies that are investigating getting into PVD processing.

For additional information on this course, view the Detailed Syllabus.

C-240 Fundamentals of Ion Beam Sputtering

This is a one-day class on Ion Beam Sputtering, designed to be an in-depth introduction to the process of ion beam deposition. The information presented will be appropriate for both process and equipment engineers, line management, sales, supply chain management, and anyone else who is interested in the use of ion beam in thin film coatings.

Some of the most advanced low-loss optics in the world are coated using ion beam deposition. This class will cover in detail the equipment of ion beam technology, ion sources, fixturing, and monitoring, how ion beam deposition works, and how all these pieces fit together to produce the highest performance coatings in the world. We will end with a brief discussion of the wide variety of applications that utilize ion beam technology.

1. Ion Source Theory: From Space to Factory
   1. A History of Ion Sources
   2. End-Hall (Gridless) Ion Sources
   3. Gridded Ion Sources
      1. Principles of Operation
      2. Generating a Plasma
      3. RF vs. DC
      4. Grids
      5. The Ion Beam
      6. Neutralizers and Neutralization
2. Ion Beam Systems
   1. Geometry
   2. Design Considerations
   3. Gas and Pumping
   4. Contamination Sources
   5. Uniformity Optimization
3. Sputtering
   1. Fundamentals of Sputtering
   2. Ion Energy and Incidence Angle
   3. Deposition Plume
   4. Sputtering vs. Assisting
4. Applications
   1. Ion Beam vs. Evaporation and Magnetron
      1. Process Speed
      2. Film Structure
      3. Film Quality: Defects, Stress, and Contamination
   2. Process Control: Time/Power, QCM, and OMS
   3. Ion-Assisted Ion Beam Deposition (IBAD)
   4. When is Ion Beam a good choice?

C-250 Introduction to Pulsed Laser Deposition

Pulsed Laser Deposition was a little-known deposition process until 1987. The discovery of High Temperature Superconductors (HTS) in 1986 and the subsequent growth of HTS thin films by Pulsed Laser Deposition (PLD) in 1987 sparked the growth of this unique physical vapor deposition process in materials research. PLD is now on the cusp to enter production in several MEMS and HTS Coated Conductor applications. This course will cover the basics of Pulsed Laser Deposition, variations of the process, and compare them to alternatives such as magnetron sputtering, MBE, and evaporation. No prior background in PLD is required.

Topical Outline

• Brief history of PLD prior to and after 1987
• The fundamental nature of the PLD process
• Unique characteristics of the PLD plume and the process over that of alternative PVD techniques
• Typical PLD equipment for R&D and large area applications
• Film composition and compositional uniformity
• Multi-layer film growth via PLD or a combination of PLD and sputtering
• In-situ diagnostics for PLD
• Combinatorial deposition via PLD
• Variations of PLD such as Matrix Assisted Pulsed Laser Evaporation and Resonant IR Pulsed Laser Evaporation
• Issues still facing the PLD process
• Examples of large-area PLD for production applications

C-260 Organic Electronics - The Future is Bright

This course is intended to give a practical approach to the audience on the fabrication of organic electronic and optoelectronic devices and emphasize on key parameters to consider during the design and building steps. The invention of low voltage and efficient thin film light emitting diode three decades ago, opened the door to organic thin films as a foundation for new generation electronics and optoelectronics. Since then, a wide range of possibilities using small organic molecules and conjugated polymers have been explored in a wide range of applications. Not only organic electronics have been proven in research, they have for a while now found space in consumer market. Organic light emitting device, or OLED as we all know it, is the most successful example along with organic solar cells and organic thin film transistors. In addition to screen displays, solar panels and transistors, these materials have recently emerged in intelligent wearable textiles, biomedical and bio-implantable devices, laser applications and found broader applications as sensors for non-invasive diagnostics or treatments. Organic electronics have become ubiquitous in society and the future of this industry is looking very bright.

Understanding the principle of operation and knowing how to build systems for fabrication of organic thin films is only the beginning of the adventure; after taking this course the only remaining question will be "When will you take part in building the future of organic electronics?”

1. Introduction to the organic electronics – brief history on discovery of electrical conductance through small molecules
2. Importance and prevalence of organic electronics
3. Progress in technology and future opportunities
4. Overview of applications – OLEDs, OPVs, OTFTs, OFET, Organic Sensors, etc.
5. Principle of operation of organic electronics
6. Fabrication of organic electronic devices
7. Thin film technology - Techniques and methodology
8. Thin film characterization methods for organic device analysis
9. Thin film properties in device layers – interfacial properties
10. Electrical performance and environmental stability of organic electronics:
    1. Considerations for device efficiencies
    2. PVD system design considerations and specifications – what works for organics!
    3. Challenges and failure modes - methods to overcome them!
    4. Consideration and optimization of Important parameters and variables (tools to get devices with high efficiencies and long lifetimes)

C-270 Coatings, Thin Films and Surface Solutions for Biomedical Applications: An overview of market trends, synthesis and characterization

With recent technological advances, there has been an increased emphasis on implantable biomedical devices with increased useful lifetimes, patient compatibility and performance. The BRAIN Initiative, launched in 2013 as the result of many advances in the understanding of neurological systems, has continued to improve our understanding of the human brain. The knowledge gained now allows the restoration of some physical functions after catastrophic injury. Within this realm, there are many applications for vacuum deposited coatings on electrodes. In general, coatings at the interface between an implanted medical device and the hosting biological system can improve device biocompatibility, performance and longevity. Example applications include hard coatings for artificial joints, x-ray opaque coatings to assist in device positioning, bactericidal coatings, and coatings on diagnostic devices.

In this half-day course, a broad overview of biomedically relevant coatings will be introduced including the market outlook for general groups of coatings. Coatings for specific applications will be discussed emphasizing the property that is exploited and the deposition conditions that are known to be important for best performing materials. This course is designed to provide an overview of biomedical coatings for those new to this area of research while providing a background intended to stimulate new ideas for devices.

• Description of Biomedical Applications
• Market Needs/Growth
• Hard Coatings (orthopedic/joint replacement)
• Bactericidal/Drug Eluting Coatings(nanoparticle/contact/eluting)
• Electrode Coatings
• Other Coatings for Biomedical Applications
• Deposition Techniques
• Alloying
• Combinatorial Approaches
• Characterization Techniques
  • Electrochemical
  • Microstructural
  • Biocompatibility
  • Mechanical
• Needed Coating Improvements
• Translational Path for Coatings/New Devices

C-280 Thermal Spray Technology

Thermal spray technology and coatings solve critical problems in demanding environments. They provide “solutions” to engineering needs involving wear, high temperature and aqueous corrosion, and thermal regulation and degradation. Thermal spray is being increasingly used to manufacture net shapes, advanced sensors, and materials for the biomedical and energy/environmental marketing sectors. These and a vast array of emerging applications take advantage of the rapid and cost-effective capabilities of thermal spray technology in the OEM and repair industries.

Thermal spray processes; including twin wire-arc, combustion, high velocity oxyfuel (HVOF), cold spray and plasma spray, as well as associated technologies, can deposit virtually any material as a surface coating onto a wide range of other materials. Coating reliability and effectiveness necessitates that these overlay coatings be selected, engineered and applied correctly.

The masterclass will provide the participants with a thorough and holistic review of the evolution of the thermal spray process. Participants will also gain insights on the fundamentals of the different thermal spray processes and in the process, enhance their ability to solve complex thermal spray issues in a systematic and practical manner. In addition, the course will also expose them to the emerging markets which the technology can be applied, thus challenging the participants to explore potential business opportunities in the various industries.

The masterclass is customized for professionals who are keen to enhance their knowledge and skills in the thermal spray industry. This course provides trainees with deep insights on the latest technologies and solutions. The masterclass focuses on:

• a thorough understanding of the thermal spray processes,
• depiction of the quite complex scientific concepts in terms of simple physical models, and
• integration of this knowledge to practical engineering applications and commonly accepted thermal spray practices.

C-304 ITO and Other Transparent Conductive Coatings: Fundamentals, Deposition, Properties, and Applications

This tutorial is intended for scientists, engineers, technicians, and others, interested in understanding the deposition and properties of transparent conductive coatings (TCCs). The major topic of the tutorial is indium tin oxide, ITO. Deposition by dc magnetron sputtering is emphasized although all common deposition processes are described. Specific examples of the ITO properties achieved with evaporation, reactive and ceramic target sputtering deposition processes are shown. Post-deposition processing also is discussed. A methodology is described for developing an ITO (or any TCC) deposition process in your own equipment. Typical ITO properties are compared with those achieved by optically enhanced metals TCC (alternative TCO to ITO are mentioned but not discussed in detail – see C-321). The selection and design of a TCC to meet the requirements of a particular application are presented. Some knowledge of basic thin film coatings and interference optics is assumed, although key basics will be reviewed. The tutorial will briefly cover the basic physics and fundamentals of conductivity. A prior introductory solid state physics tutorial would be helpful but is not required. Time will be available for questions concerning your process problems.

• Basic physics of transparent conductive coatings (TCCs)
• Major deposition methods for TCCs
• Control of TCC Film Properties
• Selection of deposition method and process conditions
• TCC performance in applications
• Manufacturing issues
• Optional topics
  

   

  — Thin film optics
  
  — Metal Nitride TCC

For additional information on this course, view the Detailed Syllabus.

C-306 Non-Conventional Plasma Sources and Methods in Processing Technology

This tutorial is a new edition of a well-established annual tutorial started in 1997. It is intended for anyone using or planning to use plasma processing technology, including cold atmospheric plasma sources and applications. Extensive applications of plasma processing are accompanied by an intense development of different new plasma sources and methods (e.g., afterglow and downstream plasmas, pulsed plasmas, inductively coupled plasmas and helicons, dc and rf hollow cathode plasmas, atmospheric plasmas, etc.). The tutorial covers both the explanation of basic physical and technical principles of conventional and non-conventional systems and typical examples of their applications. This is very important not only for adopting new plasma technologies and easier orientation in a new market, but also for better understanding of conventional commercialized systems.

• Gas discharge plasma - definition, characterization and generation principles.
• Fundamentals of plasma processing, conventional plasma sources and systems.
• Decaying plasmas and afterglows, time and space resolved afterglows, pulsed plasmas, hybrid plasma systems and processing.
• Microwave plasmas, ECR plasma, surfatron and surfaguide afterglows for PCVD of films.
• Novel radio frequency (rf) plasma systems, inductively coupled plasma (ICP) and helicons.
• Hollow cathode plasma sources (principles and basic applications), dc- and rf-generated hollow cathodes, linear hollow cathodes for large area processing.
• Classification of arcs, arc evaporation of films from rf hollow cathodes, vacuum arcs, metastable-assisted regimes in hollow cathodes.
• High density plasma sputtering.
• Magnets-in-motion concept in plasma sources, linear magnetized hollow cathodes.
• Cold atmospheric and subatmospheric plasma sources, corona and dielectric barrier discharges (DBD), microwave atmospheric plasma, fused hollow cathode discharge.
• Advantages and limits of the atmospheric plasma sources and applications.

C-307 Cathodic Arc Plasma Deposition

This tutorial is intended for engineers, technicians, and others interested in understanding deposition equipment, the deposition process, and film properties of cathodic arc deposition. The tutorial covers the basic physics and fundamental science of cathodic vacuum arc discharges, proper equipment design, and the particulars of arc coatings applications. Cathodic arc plasma parameters and their consequences for film properties are discussed. Cathodic arc deposition equipment is described and compared to other coatings equipment such as sputter and evaporation systems. The properties of cathodic arc-deposited coatings are reviewed and compared to coatings obtained by other deposition methods. Industrial aspects are discussed with emphasis on industrial applications and production processing. New fields of application and emerging cathodic arc applications are mentioned. Time will be available for questions concerning the applicability of cathodic arc films to specific problems such as the design and operation of cathodic arc deposition systems.

• The cathodic arc discharge
  — Physics of cathodic arc discharge
  — Explosive emission and fractal nature of cathode spot
  — triggering
  — macroparticle generation
  — steered arcs
  — plasma guiding in filters
• Vacuum arc deposition equipment
  — Historical overview
  — Arc source integration
  — Macroparticle filters
  — System design
• Deposition of films
  — Film growth mechanisms
  — energetic condensation
  — Nitrides, Oxides, ta-C (DLC)
• Industrial aspects
  — Substrate cleaning, fixturing, inspection
  — Emerging applications

C-308 Tribological Coatings

This tutorial is intended for design engineers, materials scientists, and coatings developers who have a need to specify and develop coatings for tribological applications (i.e., those in which wear must be reduced or prevented and/or friction minimized). The coatings also may need to have corrosion-resistant properties to operate in arduous conditions. The tutorial begins with a description of the mechanics of wear and discusses the problems of selecting coatings for optimal tribological performance. An overview of the main processes for producing tribological coatings is given, emphasizing vacuum deposition methods. Tribological test methods also are over-viewed, including tests for adhesion and mechanical properties. Coatings developed for enhanced tribological properties are described, and information is provided on some applications for these coatings.

• Wear mechanisms and theories (adhesion, abrasion, erosion, fatigue, corrosion, etc.)
• Tribological and mechanical test methods (e.g., pin on disc, abrasive wheel, scratch adhesion, microhardness, etc.)
• Coating processes and selection
• Benefits of ceramic coatings by PVD methods
• Information on tribological coatings (e.g., metal nitrides, carbides, oxides, superlattices, multilayers, nanocomposites, DLC, etc., plus hybrid and duplex processes)
• Applications information (e.g., metal cutting and forming, molding, bearings, pumps, auto parts, etc.)

For additional information on this course, view the Detailed Syllabus.

C-309 Cathodic Arc Deposition (half day)

Cathodic arc deposition is a high rate deposition process well established for some applications such as hard, protective, and decorative coatings. The rather unusual properties of cathodic arc plasmas are discussed, including their consequences for film properties such as high film density and stress. Cathodic arc deposition is put in context of other PVD coating techniques such as sputter and evaporation. Of special concern is the infamous macroparticle problem, which can be addressed with filters other strategies. This course is intended for engineers, technicians, and students interested in understanding the underlying physics of cathodic arc plasmas and energetic film growth processes, and practical aspects of deposition from the vapor/plasma phase.

• Motivation: Why would one use cathodic arcs for coatings?
• Some plasma basics: plasma versus sheath
• The physics of cathodic arc discharge
   - Explosive electron emission and fractal nature of cathode spot
   - spot types
   - plasma properties
   - macroparticle generation
• Plasma Guiding and Filtered Arcs
• Deposition of films
  - Film growth mechanisms
  - Energetic condensation / biasing
  -Nitrides, Oxides incl. TCOs, ta-C (DLC)
• Deposition equipment
   -DC versus pulsed
   -arc triggering
   -anodes
   -power supplies
   -filter integration
   -system integration

C-310 Sputtering

This course addresses scientists, engineers, technicians, and students that are interested in sputtering. This course will start with fundamentals on plasma discharges. General aspects of process parameters and resulting film properties will be addressed. Different sputtering configurations will be addressed from diode, hollow cathode to magnetrons. Course will cover both, non-reactive and reactive sputtering. It will address DC, pulse-DC, RF magnetron sputtering as well as high power impulse magnetron sputtering HIPIMS. Non-reactive and reactive sputtering will be discussed.

• Plasma
• Interactions of process parameters and coating properties
  • Structure zone models
  • Energetic particles
  • Thermalization
  • Stress
• Fundamentals of sputtering
• Hollow cathode sputtering
• Magnetron sputtering
  • Sputtering cathodes
  • DC-, pulse-DC-, RF-excitation
  • Reactive Sputtering
• High power impulse sputtering HIPIMS
  • Fundamental aspects
  • Self sputtering runaway
  • Generalized Recycling Model
  • Reactive sputtering
  • Examples

C-311 Thin Film Nucleation, Growth, and Microstructure Evolution

This tutorial is intended for scientists, engineers, technicians, and others involved with the vapor deposition of thin films by sputtering, evaporation, MBE, CVD, etc., and who need to obtain a better understanding of the effects of operating parameters on the properties of metal, semiconductor, and dielectric films and alloys. The tutorial is concentrated on the development of a detailed atomic-scale understanding of the primary experimental variables and surface reaction paths controlling nucleation/growth kinetics and microstructural evolution during vapor-phase deposition of thin films. The goal is to develop an appreciation of the advantages and disadvantages of competing growth techniques and to learn how to design better and more efficient film growth processes to achieve required properties. Thin films are pervasive in many advanced fields of modern technology including microelectronics, optics, magnetics, hard and corrosion-resistant coatings, micromechanics, etc. Progress in each of these areas depends upon the ability to selectively and controllably deposit films (thicknesses ranging from tens of Ångstroms to many micrometers) with specified physical properties. This, in turn, requires control—often at the atomic level—of film microstructure and microchemistry.

• The role of the substrate in mediating growth kinetics
• The nucleation process
• Film growth modes
• Epitaxy
• The development and control of film stress (strain engineering)
• Nucleation and growth of strain-mediated self-organized structures
• Polycrystalline film growth, texture, and microstructure evolution
• Structure-zone models of film microstructure
• The role of low-energy ion/surface interactions during film growth
• The relationship between film growth parameters and film properties

For additional information on this course, view the Detailed Syllabus.

C-313 Practical Aspects of Permeation Measurement: From Polymer Films to Ultra-high Barriers (half-day)

More and more applications based on web-coating require detailed permeation characteristics. Examples are flexible electronics (displays, solar cells, batteries etc.) and vacuum insulating panels. This tutorial is designed for those who wish to learn about methods to measure the rate of permeation of gases and vapors through films. The tutorial will provide an understanding of basic permeation processes through polymers and barrier layers, and basic principles and apparatus used to measure the permeability of polymers and barrier films. We will introduce chemical sensors used in permeation measurements and discuss recent developments based on nanotechnology.

• Basic permeation processes for gases and vapors through polymers and barrier layers for non-reactive and reactive species, barrier materials
• applications of barrier layers (food packaging, flexible electronics, vacuum insulating panels)
• ultra-high barrier technologies
• methods to measure the rate of permeation: different methods (total pressure, coulorimetric method, Ca-test, mass spectrometric method)
• gas sensors
• ASTM standards

C-314 Plasma Modification of Polymer Materials and Plasma Web Treatment

Plasma treatments are used in the web coating and roll conversion industries to tailor polymer surfaces while preserving their bulk properties. This tutorial is intended for engineers, scientists, and technicians who would like to gain a better understanding of the influence of plasma process factors on treatment performance, as well as the practical issues related to process robustness, process speed, and ease of scale-up. While much of the tutorial deals with treatment of polymer webs, the key concepts presented are applicable to polymer surfaces in general and plasma treatment of materials in general.

• A basic introduction to plasmas including discussion of species distributions, the structure of glow-discharge plasmas, electrical breakdown of gases, and mechanisms of sustaining a plasma.
• Discussion of industrial applications of plasmas for polymer surface modification including wettability control & printing, bonding & adhesion, nucleation of films, control of biointeraction with surfaces, and control of gas-film interactions.
• Description of a variety of plasma treatment technologies and the importance of controlling the industrial treatment environment.
• The interaction of plasmas with polymer surfaces.
• The basics of polymer surface analysis along with examples of surface analytical techniques applied to plasma treated polymers including X-ray photoelectron spectroscopy, static secondary ion mass spectrometry, and high-resolution electron energy loss spectroscopy. Also included is discussion of adhesion, wetability, etc.
• Practical aspects of plasma web treatment including treatment dose, process factors and their roles, practical treatment efficiency, process verification, and process stability issues.
• Mechanisms of surface modification in the context of a site balance model.

For additional information on this course, view the Detailed Syllabus.

C-315 Reactive Sputter Deposition

This tutorial covers the fundamental mechanisms and technology of high rate reactive sputter deposition of conducting and insulating thin films. Following a brief introduction to reactive sputtering, including discussion of basic issues, target choices, and system configurations, we examine the effects of reactive gas addition on target surface and glow discharge processes which control film growth rates. Deposition approaches used in reactive sputtering – dc, rf, magnetron, pulsed dc, and ion beam – are discussed and compared. Process control strategies (e.g.: flow, partial pressure, and target voltage, and multi-loop control) and their implementation are described in detail using numerous examples. The advantages and disadvantages of these different modes of operation are examined from the point of view of controlling film properties. Emphasis is placed on developing a sufficient understanding of reactive sputter deposition to provide direction in designing new processes. The effects of energetic particle irradiation (positive and negative ions and fast neutrals) on film properties are also discussed. Present and future trends in reactive sputter deposition are addressed.

• Introduction to reactive sputter deposition of conducting and insulating thin films
• Target processes during reactive sputtering
• Glow discharge volume processes during reactive sputtering
• Deposition technologies used in reactive sputtering (dc, rf, magnetron, pulsed dc, ion beam)
• Process control strategies
• Particle irradiation effects during film growth
• Film properties
• Computer-based modeling

For additional information on this course, view the Detailed Syllabus.

C-316 Introduction to Atomic Layer Deposition (ALD) Processes, Chemistries, and Applications

This course is intended for senior technicians, scientists, engineers or graduate students.

Atomic Layer Deposition (ALD) is a powerful and enabling thin film deposition technology with a growing range of applications including semiconductors, energy, catalysis, thin film encapsulation, and emerging areas of nanotechnology. ALD fills a unique niche in thin film deposition technology where exceptional control is required for thickness, stoichiometry, and other film properties at an industrially relevant scale. New chemistries specifically designed for ALD are enhancing the repertoire of materials that can be grown, encompassing the whole range from insulating to conductive layers. New developments in the area of in situ tools for monitoring ALD growth are also enhancing the properties of films grown with ALD. Although generally limited to relatively thin layers, there is a growing interest in spatial ALD to scale to larger size substrates and thicker layers for new and emerging applications, and the field will continue to grow in size and application while demanding new solutions specific to ALD.

This introductory course will cover the essentials of ALD including discussion of practical issues such as reactor design, precursor choice, in-situ growth monitoring, and scale-up, as well as providing insight into the molecular scale phenomena that dictate the final product. We will also cover new developments in materials applications and ALD chemistries, as well as emerging applications in non-traditional thin film areas. This full day course allows sufficient time to cover both the fundamentals of ALD and more recent approaches including plasma ALD and spatial ALD. Potential students are encouraged to contact the instructor to highlight their background and specific goals.

• Introduction: basic concepts & fundamentals of Atomic Layer Deposition, ideal and non-ideal aspects.
• Overview of materials and chemistries for ALD
• Specific examples & case studies
• ALD reactor designs & operation
• In situ analytical tools for ALD
• Plasma ALD
• Spatial ALD
• Non-traditional applications and emerging areas of ALD

For additional information on this course, view the Detailed Syllabus.

C-317 Reactive Sputter Deposition

This tutorial is intended for engineers, technicians, materials scientists, and coating developers, who have a desire and need to understand how the reactive sputter deposition process really works. The goal of the tutorial is to give the student a thorough understanding of all of the factors that affect the reactive sputtering process in order that the student can apply this knowledge to improve their reactive deposition process and achieve both high deposition rates and excellent film properties.

This tutorial covers the basics of reactive sputtering followed by a comparison of the use of flow control versus partial pressure control of the reactive gas. The latter allows operation in the transition region between the metallic and poisoned states of the target, and films can be deposited at much higher rates with excellent properties using partial pressure control compared to flow control of the reactive gas. Along with using partial pressure control, it is important to use the right type of power to assure that there is no arcing during the deposition. Which type of power to use and along with which partial pressure sensor are reviewed. Large area coating presents special challenges for the control of the reactive gas, and the need for multiple gas inlets along the length of a long cathode and sensing in each gas inlet zone are discussed. The requirements for a partial pressure control system along with commercially available controllers are presented. Multiple gas reactive sputtering and reactive high power pulsed magnetron sputtering (HPPMS) are emerging areas that are advancing the state of the art for reactive sputtering. How they work and what factors are important for controlling these two processes are discussed.

• Basics of reactive sputtering
• Flow control versus partial pressure control of the reactive gas
• Power supplies for reactive sputtering
• Reactive gas sensors
• Large area reactive sputtering
• Control systems for reactive sputtering
• Multiple gas reactive sputtering
• Reactive high power pulsed magnetron sputtering

For additional information on this course, view the Detailed Syllabus.

C-318 Nanostructures: Strategies for Self-Organized Growth (half-day)

 (The Materials Science of Small Things)

• Learn about the primary classical and quantum effects which controllably alter the properties of increasingly small nanostructures.
• Understand the mechanisms controlling self-assembly and self-organization during nanostructure growth.
• Learn how to better design nanostructure growth processes.
  

The study of nanotechnology is pervasive across widespread areas including microelectronics, optics, magnetics, hard and corrosion resistant coatings, mechanics, etc. Progress in each of these fields depends upon the ability to selectively and controllably deposit nanoscale structures with specified physical properties. This, in turn, requires control -- often at the atomic level -- of nanostructure, nanochemistry, and cluster nano-organization.

Deceasing size scales of solid clusters can result in dramatic property changes due to both "classical" effects associated with changes in average bond coordination and, as cluster sizes become of the order of the spatial extent of electron wavefunctions, quantum mechanical effects. The course will start with examples including reduced melting points, higher vapor pressures, increased optical bandgaps, decreased magnetic hysteresis, and enhanced mechanical hardness. Essential fundamental aspects, as well as the technology, of nanostructure formation and growth from the vapor phase will be discussed and highlighted with "real" examples using insights obtained from both in-situ and post-deposition analyses.

Nanostructure case studies include:

• examples of template, size, and coarsening effects: self-assembled Si/Si(001), Cu/Cu(001),TiN/TiN(001), TiN/TiN(111) nano-clusters,
• examples of controlled template plus strain effects: self-organized Ge wires on Si(111), Ge wires on Si(187 72 81), Au chains on Si(553), InAs metal wires on GaAs(001), insulated metal wires on Si(111),
• quantum dot engineering: formation, shape transformations, and ordering in self-organized SiGe/Si(001); InAs/GaAs(001), CdSe/ZnSe(001), PbSe/PbEuSe(111), Ag/Pt(111), and MnN/Cu(001) quantum dots,
• examples of 3D nanostructures:(Ti,Ce)N/SiO₂, TiB_x/SiO₂, and d-TaN/g-Ta₂N/SiO₂.

The course provides an understanding of:

• the classical and quantum effects controlling the dramatic property changes observed in nanostructures as a function of cluster size and dimension (3D – 2D – 1D)
• self-assembly and self-organization during film growth
• the role of the substrate template and defect structures in mediating growth kinetics
• the use of film stress to controllably manipulate nanostructure
• other mechanisms (including surface segregation, surfactant effects, low-energy ion bombardment, cluster coarsening, etc) for controlling nanostructures
• the design of nanostructures with specified properties.

Scientists and engineers involved in deposition, characterization, or manufacturing/marketing of nanostructures and nanostructure deposition equipment.

For additional information on this course, view the Detailed Syllabus.

C-320 Diamond Like Cardon Coatings-From Basics to Industrial Realization

This tutorial is recommended for engineers and R&D staff members, who are involved in specifying new designs and surface treatments for components and tools. The application of Diamond Like Carbon, often in combination with pre-treatments like plasma nitriding and polishing, allows much improved wear resistance (abrasive, adhesive, fatigue) and to reduction of friction forces. Under the umbrella name of DLC, various classes of coatings have been developed, where each class of coatings has its own deposition technology and coating characteristics.

The industrial applications are presently mainly in components for e.g. automotive, aerospace, general machine building.

• Basics and standardization
  • Classification of different DLC’s
  • DLC’s in comparison to diamond films
  • Structure of hydrogen free and hydrogenated DLC’s
  • Mechanical properties of DLC’s
  • Tribological behaviour of DLC’s
  • Carbon based coating systems
• Technology and processes
  • PVD processes for deposition of hydrogen free DLC films
  • Plasma assisted CVD processes for preparation of a-C:H and modified a-C:H:X coatings
  • Hybrid processes
  • Duplex processes
  • Sputter deposition of metal containing a-C:H:Me coatings
  • Sputter deposition of metal free a-C:H coatings
  • Improved coating adhesion by interlayer systems
• Industrial applications
  • Contact modes and wear mechanisms
  • Coating design for specific wear mechanisms
  • Industrial DLC applications
  • Industrial deposition methods
  • Representative industrial examples
  • Near future expectations

C-322 Characterization of Thick Films, Thin Films, and Surfaces

This course is intended for people with a basic background in thin films who need to understand the broad range of techniques available to characterize films. The course is appropriate for technicians, engineers, and managers who perform or specify characterization work as well as students seeking a broad understanding of the field.

This tutorial examines the broad range of techniques available to characterize thin film materials. We examine the range of properties of interest and how thin film properties may differ from bulk properties. Generic differences between counting and spectroscopic techniques are presented. Available “probes” are identified.

The main emphasis of the tutorial is an overview of a wide range of characterization techniques. We examine imaging techniques such as Optical microscopy, Scanning electron microscopy (SEM), Transmission electron microscopy (TEM), and Scanning probe microscopies (STM, AFM …). We also explore techniques, which provide information about structural properties including X-ray diffraction (XRD), Stylus profilometry, Quartz crystal monitors (QCM) and density measurements.

The tutorial examines techniques, which explore chemical properties such as Auger electron spectroscopy (AES), Energy Dispersive Analysis of X-rays (EDAX), X-ray Photoelectron Spectroscopy (XPS, ESCA), Secondary Ion Mass Spectrometry (SIMS), and Rutherford Backscattering (RBS). AES is used as a prototype to examine quantitative analysis of spectroscopic data. Characterization techniques for optical properties such as ellipsometry and optical scattering are also considered. Many of these chemical and optical techniques can also provide information about structural properties.

Techniques for determining electrical and magnetic properties are also discussed. These include resistance / four point probe, Hall effect, magneto-optical Kerr effect and ferromagnetic resonance. The emphasis here is on materials characterization as opposed to device characterization.

The tutorial concludes with an examination of techniques used to explore mechanical properties such as stress-curvature measurements, friction testing, micro/nano indentation and adhesion tests.

Overview of wide range of characterization techniques for thin films including:

• Mechanical properties (stress, friction, micro/nano indentation, adhesion…)
• Imaging (microscopies: optical, SEM, TEM, AFM …)
• Structural properties (XRD, profilometry, QCM …)
• Chemical properties (AES, EDAX, XPS, SIMS, …)
• Electrical/magnetic properties (resistance, Hall effect, Kerr effect …)

For additional information on this course, view the Detailed Syllabus.

C-323 Fundamentals of High Power Impulse Magnetron Sputtering (HIPIMS)

This course is intended for people with a basic background in materials science who need to understand the broad range of techniques available to characterize thick films, thin films, and surfaces. The course is appropriate for technicians, engineers, and managers who perform or specify characterization work as well as students seeking a broad understanding of the field. The tutorial examines a broad range of important properties of discusses how film thickness may cause measured values/performance to differ from bulk properties. Generic differences between counting and spectroscopic techniques are presented and available “probes” are identified.

• HIPIMS - An Introduction
• Stationary plasmas, sheaths, discharge
• DC magnetron, and comparison to DC arc
• Ion surface modification: etching and film growth, energetic condensation
• Pulsed plasmas and sheaths
• High Power Impulse Magnetron Sputtering: the discharge
• Plasma characterization and plasma diagnostics
• Substrate biasing: etching / growth assist
• Interface engineering by using HIPIMS plasmas
• Deposition and coatings by HIPIMS
• Microstructure and Texture tailoring by HIPIMS
• Deposition rates
• Hardware
• Applications

For additional information on this course, view the Detailed Syllabus.

C-324 Atmospheric Plasma Technologies (half day)

Atmospheric plasma technologies is a rapidly growing area in plasma-assisted technologies. However, the atmospheric plasma requires a special design of plasma sources to ensure non-equilibrium, i.e. non-thermal plasma in a number of applications in coating and surface treatment. Technologies using the atmospheric pressure plasma sources bring about fast processes, but it is important to be aware of limits given by atmospheric plasma properties and plasma chemical reactions. This introduction tutorial course addresses the most important principles and applications of non-thermal atmospheric plasma.

• Cold atmospheric plasma sources - principles, problems to solve
• Corona and Dielectric Barrier Discharges (DBD)
• Atmospheric pressure plasma jets
• Fused Hollow cathodes
• Microwave atmospheric plasmas
• Atmospheric plasma with/in liquids
• Applications of the atmospheric plasma
• Advantages and limits of the atmospheric plasma sources

C-326 Manufacture of Precision Evaporated Coatings

This tutorial provides detailed information on how to establish and improve evaporated coating processes for precision optical coatings. Design considerations for coating chambers, such as source placement, substrate fixturing, control of film thickness uniformity, and thickness monitors will be discussed. Trade-offs in the selection of source materials, means of controlling film structure, and the influence on the performance of the coated component will be considered. Process details will be approached with a focus on practicality; film properties must be measurable and system designs must be practical and cost-effective. Measurement techniques will be discussed to identify the influence of the coating process, understanding film performance as well as characterizing shortcomings of process methods. These process concepts are readily implemented in standard evaporation systems, providing significant improvements in existing coating facilities.

For additional information on this course, view the Detailed Syllabus.

C-329 Properties and Applications of Tribological and Decorative Coatings

Understanding the factors that control friction and wear are of vital industrial and economic importance. The function, reliability, and lifetime of many mechanical, electromechanical and even biological systems are impacted by the complex relationships between materials, surfaces, design, and the environments that they are exposed to. Increasing complexity and performance requirements that are driven by economics, and a heightened awareness of health and safety issues with traditional chemical plating processes offers new opportunities and challenges for novel coatings and advanced surface engineering techniques. This tutorial is intended for engineers, designers, managers and purchasing professionals who have a need to specify, develop and procure coatings for tribological applications (i.e., those applications in which wear must be reduced or prevented and/or friction minimized). These coatings will likely require corrosion-resistant properties to operate in arduous conditions and must also exhibit functional characteristics (color, adhesion scratch resistance, etc.) that span the complete range from industrial to consumer products. The tutorial begins with a description of the mechanics of wear and discusses the criteria for selecting coatings for optimal tribological performance. An overview of the main processes for producing tribological coatings is provided with emphasis on vacuum deposition methods. Tribological test methods also are reviewed, including tests for adhesion and mechanical properties. Finally, coatings developed for enhanced tribological and decorative properties are described and examples of applications are presented.

• Wear mechanisms and theories (adhesion, abrasion, erosion, fatigue, corrosion, etc.)
• Tribological and mechanical test methods (e.g., pin on disc, abrasive wheel, scratch adhesion, microhardness, etc.)
• Coating processes and selection
• Benefits of ceramic coatings by PVD methods
• Information on tribological coatings (e.g., metal nitrides, carbides, oxides, superlattices, multilayers, nanocomposites, DLC, etc., plus hybrid and duplex processes)
• Applications information (e.g., metal cutting and forming, molding, bearings, pumps, auto parts, etc.)

For additional information on this course, view the Detailed Syllabus.

C-330 Introduction to Thin Film Photovoltaic Technologies (half day)

This course focuses on PV thin film technologies like Cu(In,Ga)(Se,S)₂, CdTe an the amorphous and microcrystalline silicon solar cells which are nowadays mainly introduced. Starting point is a market overview followed by the basic designs of these solar cell types and their efficiency potentials. Especially the different manufacturing technologies are introduced focusing the different production and process steps of each solar cell type.

• Market situation
• Cell design of thin film solar cells
• Research activities
• Production and process technologies for thin film solar cells

For additional information on this course, view the Detailed Syllabus.

C-332 Zinc Oxide-Based and Other TCO Alternatives to ITO: Materials, Deposition, Properties and Applications

Indium tin oxide, ITO, is the most common of Transparent Conductive Oxides (TCO). However, there are concerns about ITO cost, availability and in some cases, performance. This tutorial covers zinc oxide-based alternatives with various dopants including, aluminum (AZO) and gallium (GZO), as well as other TCO alternatives to ITO. The tutorial is intended for scientists, engineers, technicians and others, interested in understanding the materials, deposition, properties and applications of TCO. The effects of dopant material choice and concentration on TCO properties are explored. TCO deposition by common methods, e.g., evaporation and CVD/pyrolysis, are described, although magnetron sputter deposition is emphasized. The influence of the deposition method on the TCO properties is shown including reported performance with Pulsed Laser Deposition (PLD). Engineering of TCO film properties by controlling deposition process parameters is explained. TCO properties with high temperature processes, e.g., on glass substrates, and low temperature processes, e.g., on plastic substrates, are compared. The instability of ZnO-based and other TCO in high temperature and high humidity environments is discussed, progress reported and future directions suggested. Designing and engineering TCO properties for specific applications is explained and examples presented. (This full-day tutorial is much more in-depth than the previously offered one-half day course (C-321) which surveyed alternative TCO types and achieved performance).

• Conductivity in transparent metal oxides
• Performance expectations; Theory and ITO baseline
• ZnO-based materials and dopants
• Performance of TCO grown by major deposition methods
• Control of TCO film properties
• Other TCO hosts and dopants
• Advanced doping techniques
• Environmental performance of ZnO-based and other TCO
• Designing and engineering TCO properties for applications
• Applications examples of TCO

C-333 Practice and Applications of High Power Impulse Magnetron Sputtering

This half day tutorial is intended for decision makers, engineers, technician and students interested in equipment availability, applications and process requirements of HIPIMS. Basic understanding or experience with plasma and materials is desirable but not required.

HIPIMS is a highly ionized pulsed sputtering process that produces significant ionization of the sputtered materials that, in turn, enables effective surface modification by ion etching and energetic deposition. Energetic deposition allows the formation of coatings with unique or superior properties compared to other deposition processes. Presently HIPIMS is undergoing the transition from academic research to being a major industrial process. 

The tutorial starts with a short introduction in the basics of HIPIMS technology. An extended treatment of HIPIMS is provided by the tutorial C-323 “High Power Impulse Magnetron Sputtering. The main focus of this tutorial is on commercially available equipment and its specifications as well as the general processing principles. Finally industrial (or close to industrial) applications will be presented.

1. Introduction to HIPIMS Technology

2. Industrial Equipment
   a. HIPIMS pulse generation
   b. Process control (reactive HIPIMS)
   c. HIPIMS diagnostics
   d. HIPIMS Coating systems

3. HIPIMS Applications
   a. HIPIMS etching
   b. Trench filling, Through via connection
   c. TCOs
   d. Hard coatings
     - nitrides
     - carbides
e. Optical coatings
 

For additional information on this course, view the Detailed Syllabus.

C-334 Manufacture of Precision Evaporative Coatings (full-day version of C-326)

This tutorial provides detailed information on how to establish and improve evaporative coating processes for precision optical coatings. Design considerations for coating chambers, such as source placement, substrate fixturing, control of film thickness uniformity, and thickness monitors will be discussed. Trade-offs in the selection of source materials, means of controlling film structure, and the influence on the performance of the coated component will be considered. Process details will be approached with a focus on practicality; film properties must be measurable and system designs must be practical and cost-effective. Measurement techniques will be discussed to identify the influence of the coating process, understanding film performance as well as characterizing shortcomings of process methods. These process concepts are readily implemented in standard evaporation systems, providing significant improvements in existing coating facilities.

1) Chamber Components
    a) Pumping
        i) Types of pumps and gauges
        ii) Cleanliness
        iii) Mean-free path
   b) Heating
        i) Influence on film structure
        ii) Types of heaters and output spectra
        iii) Risks in heating/cooling profiles (breakage)
   c) Gas Control
        i) Pressure control
        ii) Flow control
   d) Evaporant Sources
        i) Electron-beam guns (sweeps, material form, comparisons of different configurations)
        ii) Resistance sources (boats, filaments, material form)

2) Thin-film Monitoring
   a) Optical monitoring
        i) Single-wavelength (reflection, transmission, addressing limitations of each)
        ii) Broad-spectrum (data fitting, understanding of complexity in implementation)
   b) Quartz crystal monitoring
        i) Stability and control with a single monitor
        ii) Multi-point monitoring
        iii) Crystal changing due to dynamic calibration changes
        iv) Understanding of vapor plume through multiple crystal monitors

3) Thin-film Uniformity
   a) Simple rotation
        i) Uniformity calculations
        ii) Optimal source placement
        iii) Mask design for improved film distribution
   b) Domed, or pyramidal, rotation
        i) Improved system capacity
        ii) Uniformity and source determination
        iii) Masking
   c) Planetary Rotation
        i) Influence of gearing on achieved film uniformity, and optimal selection of gears
        ii) Optimal source placement
        iii) Characterization of uniformity using laser photometry (single wavelength)
        iv) Calculation of film distribution in a uniformity model
        v) Design and modeling of a corrective mask
        vi) Advanced planetary motion (tilted planets, domed planets)
   d) Impact of errors
        i) Changes in substrate height
        ii) Influence of tilt in a planet
   e) Uniformity measurement
        i) Spacing of measurements
        ii) Spectral versus laser-based

4) Thin-film stress
   a) Theoretical basis of stress
        i) Calculation of stress from Stoney’s equation
        ii) Thermal stresses
        iii) Intrinsic stresses
        iv) Structure zone models (Movchan & Demchishin, Thorton)
   b) Measurements of optics for determination of film stress
        i) Choice of substrate
        ii) Influence of interferometer wavelength and coating phase
        iii) Impact of humidity on thin-film stress
        iv) Aging of film stress
   c) Modifications to film stress by process changes
        i) Thermal
        ii) Pressure
        iii) Substrate material
        iv) Coating material
        v) Densification (ion sources, plasma sources)

5) Properties of Thin Films
   a) Optical constants of thin films
   b) Measurement of thin film performance
        i) Selection of substrate
        ii) Spectral measurements
        iii) Ellipsometric measurements
        iv) Laser-based measurements
        v) Scatter measurements
        vi) Defect counts
        vii) Laser damage thresholds
        viii) Surface roughness (AFM versus white light interferometry)
        ix) Film thickness (optical versus step-height measurements, and the problems with each)
        x) Interferometry and the influence of coating phase
        xi) Other evaluation techniques - XRD, XPS, ToF-SIMS, Auger, SEM/EDAX, TEM/Electron-Diffraction
   c) Modeling of film properties
   d) Influence of film properties on the design of optical thin films
   e) Process dependence on coating performance
 

C-336 Transparent Gas Permeation Barriers on Flexible Substrates

This tutorial course will be of special value and interest to scientists, engineers, senior technical staff, and graduate students and anyone who want to learn the latest advances and applications in the specific field.

Thin transparent layers on polymer films are being used to drastically enhance the permeation barrier properties of polymer films while at the same time maintaining the flexibility and optical transparency of the polymer film. Applications range from food packaging films to encapsulation films for solar cells or flexible electronics.

This tutorial gives a comprehensive overview about the state-of-the-art in the field of transparent thin film permeation barriers. It covers a short overview about the scientific and technological fundamentals and their consequences for applications. Different permeation measurement principles and methods will be compared briefly. Single and multi-layer materials and technologies for the fabrication of thin film permeation barriers will be reviewed and evaluated regarding their suitability for different applications. Not only gas permeability but also optical properties, mechanical robustness and processing aspects will be discussed. Products and application examples will be discussed and an outlook about the current hot-topics in the field will be given.

• The need for barriers – products and requirements
• How to apply a barrier to your product - types of encapsulation
• Thin-film permeation physics and consequences for application
   - Permeation in polymers and solids
   - Models and mechanisms for permeation in thin films – the role of layer defects
   - Influence of measurement conditions (temperature, gas concentration, time)
   - Permeation in multi-layer stacks
• Overview about measurement-methods for barrier properties
   - Measurement concepts and methods
   - Typical measurement conditions
• Materials and Technologies for thin film barriers
   - Single and graded layer technologies
• Evaporation techniques
• Sputtering
• Plasma-enhanced chemical vapor deposition (PECVD)
• Atomic layer deposition (ALD)
• Short note on other methods
   - Influence of substrate quality and processing on barrier performance
   - Multilayer technologies
   - Techniques for interlayer deposition
• Properties of multi-layer stacks compared to single layers
• Application examples and outlook
   - Devices and their performance
   - Functional films and substrates for flexible electronics
   - Direct encapsulation versus barrier film lamination
   - Economic aspects
 

This course was developed by John Fahlteich, Steffen Günther, Nicolas Schiller, and Matthias Fahland, Fraunhofer Institute for Electron Beam and Plasma Technology FEP, Dresden, Germany

C-337 ITO and Alternative TCO: From Fundamentals to Controlling Properties

This tutorial course is intended for scientists, engineers, technicians, and others, interested in understanding the fundamentals, materials, deposition, manufacturing, properties and applications of TCO.

The tutorial explains doping and conductivity in Transparent Conductive Oxides (TCO) including, indium tin oxide (ITO), indium zinc oxide (IZO), and zinc oxide with various dopants, particularly aluminum (AZO) and gallium (GZO). Other alternative TCO, e.g., SnO₂:F, are included in examples. TCO deposition by magnetron sputtering is emphasized, although other methods, e.g., evaporation, CVD/pyrolysis and Pulsed Laser Deposition (PLD) are briefly described, but can be expanded based upon class interest. Specific examples of the TCO Optical/Electrical (O/E) properties achieved with various processes are shown. Developing a robust deposition process for TCO is explained. The importance of substrate temperature and the effect of post-deposition processing also are discussed. TCO properties achieved with high temperature processes, e.g., on glass substrates, and low temperature processes, e.g., roll-to-roll on flexible plastic substrates, are compared and the large differences explained. Designing and engineering of TCO O/E properties for specific applications by controlling deposition process parameters are explained. Many application examples are presented.

• Introduction (History and Review)
• Conductivity and Transparency in Metal Oxides
• Optical Properties Related to Conductivity
• TCO Performance Expectations, Theory and ITO Baseline
• Control of TCO Film Properties
• Developing a Robust Deposition Process: The “Resistivity Well”
• TCO Host (ZnO, In2O3, SnO2) Materials and Dopants
• Designing and Engineering TCO Properties for Applications (Examples)
• Appendix I, Thin Film Optics
• Appendix II, Performance of TCO Grown by Energetic Deposition Methods
• Appendix III, Advanced Doping Techniques
• Appendix IV, Transition Metal Doping, e.g., Mo, Ti, W, Zr, …

C-338 Application of Reactive Sputtering

This tutorial covers the fundamentals of reactive sputtering for applications. A short introduction in reactive sputtering is given, dealing with the occurrence of hysteresis and ways to control the process. A theoretical description using the Berg model will motivate the understanding of the reactions involved in the coating chamber. Following the basics, different options for process control will be discussed. Especially for processes that drift towards compound mode the risk of arcing is increasing. Ways to control and avoid arcing will be discussed. Different sensors for the process control will be presented and discussed with respect to benefits and limitations of each one. Reactive process control for industrial processes will be addressed. The course will conclude with recent developments.

C-339 Mechanical Heart Valve Thrombosis: An Introduction and Review (half day)

The course is addressed to: biotechnologists, medical professionals, biomedical engineers, physicists, surface engineers, mechanical engineers, thin film specialists, electronics engineers, and sensor developers. Participants should possess a basic minimum knowledge of the functions of the human heart and lungs. This is a comprehensive course on mechanical heart valves.

Over the past fifty years, more than 100 different mechanical heart valves have been designed and implanted. A large number of mechanical heart valves are being implanted worldwide; a large number of them are failing after implant. There are many challenges in the materials, design and surface engineering of mechanical heart valves. The primary aim of the course is to introduce the basic functions of heart valves; the course also aims at a review of the present status of the mechanical valves. The opportunities (in terms of design) and challenges of mechanical heart valves will be summarized.

- Introduction to Heart valves and valve functions
- Basics of Haemodynamics
- Basic understanding of thrombosis and embolism (coagulation cascade is beyond the course content)
- Basics of prosthetic heart valves : problems and management
- Mechanical heart valves: designs and evolution
- Mechanical heart valves: basic working principles
- Mechanical heart valves: problems and management
- Comparison of performance of contemporary mechanical heart valves
- Mechanical versus prosthetic valves: advantages and disadvantages
- Criteria for mechanical valve replacement
- Valve dysfunctions: Obstructive thrombosis, Pannus (over growth of fibrous tissue and impairment in leaflet movement) and diagnostic techniques
- Engineers’ perspective of surface and surface engineering of mechanical valves
- Thin film coatings for next generation mechanical heart valves : management of thrombosis and incorporation of sensor technology
- Diagnostic techniques for heart valve monitoring: existing and emerging sensors and techniques
- Concept of early warning (eWAR) of mechanical heart valve failure

C-340 Plastic Optics - Coatings and Antireflective Structures

Modern optical applications need solutions for the antireflective equipment of polymer surfaces. The problems for coating comprise thermal limitations, incompatible mechanical properties of coating and substrate materials and the interaction between polymers and plasma. This course provides attendees with a basic knowledge of transparent polymer materials for optical applications. The course concentrates on polymer material properties, coating processes suitable for polymers, interactions between polymers and plasma, adhesion, stress, interference layers for polymers, hard coatings, top-layers to control the wettability and evaluation and testing procedures.

The course especially concentrates on antireflection coatings and antireflective sub-wavelength structures. The potential to produce antireflective interference coatings is shown for plasma-assisted vacuum deposition techniques as well as for sol-gel wet chemical processes. In addition, various procedures to obtain antireflective structures on polymers will be explained. Special solutions are discussed for acrylic, polycarbonate and cycloolefine polymers.

This course is of use for anyone who would like to get an overview about the problems connected with coating plastics. It is addressed to newcomers and experts on technical and high school level and to engineer and science students of higher terms.

 This course should enable you to:
• Specify the best suitable polymer materials for your application;
• Understand the special behavior of polymers during vacuum coating processes;
• Evaluate different techniques for antireflection of polymer surfaces; and
• Define suitable characterization tools and testing procedure for your plastic optics.

C-341 Processing on Flexible Glass - Challenges and Opportunities

One of the most innovative and developed flexible transparent substrate materials in the last few years is flexible glass. This Tutorial course is intended for engineers, technicians, and others involved with vapor deposition of thin films by magnetron sputtering, and who is interested in a better understanding of challenges and opportunities of thin film processing on flexible glass.

With thicknesses below 200 μm glass is thin enough to be flexible and opens as a new substrate material a wide range of new application fields. For applications - e.g., displays, OLEDs, or sensors - flexible glass enables realization of thin, light, robust, curved, and conformable devices.

Besides the challenge of substrate handling, the functionalization of the surface by thin films using PVD deposition methods also has to be optimized for further processing of a device. The thermal and dimensional stability of the coated substrate influences device fabrication and processing in sheet-to-sheet and roll-to-roll.

Due to the low thickness of flexible glass, the handling generally presents challenges for manufacturers of thin-film coatings. Mechanical film stress is here one of the main influences of the bendability of flexible glass. The sputtering process parameters have to be adjusted for multiple processing procedures, to improve processing stability and manufacturing of high quality films. Experimental results will be used to illustrate the challenges during thin film processing on flexible glass. The influence of selected process parameter for high deposition rate sputtering on the film- and substrate-stress will be discussed. Several examples of functional layer stacks on flexible glass, such as transparent conductive coatings, anti-reflective coatings, and infrared-blocking coatings including their properties will be demonstrated. The properties of these functional layers and layer stacks will be compared with those on flexible polymer substrates.

Transparent conductive oxides (TCOs) are also key materials in optoelectronic applications; mainly indium tin oxide (ITO) and indium zinc-oxide (IZO) are the most popular materials. For highly conductive TCO films thermal pre and post- annealing process steps are standard in film processing. Recently, ultra-short time annealing methods like flash lamp annealing (FLA) in the millisecond time-range, are gaining more importance for improved performance of thin films and surfaces refinement and will be also discussed in this Tutorial. The ability of FLA enables new options for high quality TCO film fabrication, also on flexible glass.

The focus of the Tutorial is pointing out critical parameters of thin-film sputter deposition for an improved handling and performance of flexible glass, and will showing possible path ways forward for optimized thin film processing on flexible glass. The Tutorial course concludes with a detailed discussion of the challenges, chances and solutions of flexible glass processing.

- Introduction
- Application fields for flexible glass
- Properties of flexible glass
   • Mechanical properties
- Advanced processing and handling of flexible glass
   • Sheet-to-sheet and roll-to-roll processes of inorganic and organic films
   • The role of film stress on the reliability
   • Large area coatings
   • Optimized magnetron sputtering processes for low film stress depositions
   • Substrate handling
   • Post treatment of thin films by flash lamp annealing (FLA)
- Examples for functional layer and layer stack processing on flexible glass
   • Infrared blockers (IR)
   • Anti-reflecting coatings (AR)
   • Transparent electrodes based on transparent conductive oxides (TCOs)
   • Organic emitting diodes (OLED)
- Summary
- Discussion

C-342 Thin Film Photovoltaic Solar Cells

This one-day course will provide a background of the present state of thin-film photovoltaic (PV) solar cell technologies, and markets within the context of expected national and global future energy requirements. The technologies discussed will be primarily those in present world-wide production, focusing on amorphous Silicon (a-Si), Copper Indium Gallium Diselenide (CIGS), and Cadmium Telluride (CdTe), although some discussion will be provided for emerging thin-film technologies, such as Kesterites.

For each technology, discussion will include historical development, present advantages and limitation, and possible future directions for improved devices and modules. A very condensed discussion of PV device physics will be provided to establish an appreciation of material parameters that are important to related device operation. The course will also discuss advancements in related technologies that may be critical for accelerating deployment of thin-film PV products. Examples of this include development of thin-film PV specific glass and device-specific transparent conducting oxides and buffer layers.

The course will conclude with a discussion of considerations for large-scale deployment of thin-film PV that are becoming much more important as these technologies mature. These considerations include: reliability and expected product lifetime, expectations of mineral resource abundance, perceived or real concerns material toxicity, and the important interrelationship between energy-pay-back time and production-doubling time.

C-343 From Basic Aspects to Industrial Components and Applications in HIPIMS Technology

This course is intended for scientists, engineers, technicians, and students that are interested in the practical application and industrial use of high power impulse magnetron sputtering. This course will start with some fundamentals on magnetron sputtering and the transition to pulse sputtering, and especially HIPIMS. Besides the introduction of the technology, the focus will be on industrially relevant topics. This includes commercially available components like power supplies, plasma diagnostic, and process control. Finally, the course will conclude with an overview on industrially available products, i.e. coatings.

1. Introduction of sputtering
2. Introduction of high power impulse sputtering
3. Plasma and process characteristics
4. Operation modes in HIPIMS
5. Commercial equipment
   1. Power supplies
   2. Diagnostic tools
   3. Feedback / process control
6. Coating systems and applications
7. Industrial coatings

For additional information on this course, view the Detailed Syllabus.

B-101 Creating a Business from your Idea, Product or Service

The vacuum coating business has produced many products around the world, many of which, the end-user has no idea that it was enabled by a coating or process derived from vacuum coating. These coatings, processes and equipment produce optical, chemical and other physical properties that are unique to the specific product or application. Many courses and conferences deal with the specific science and application of these processes, but there are few that present and discuss how to actually move from an idea, product or service to create a profitable business. This course will delve into how you can create a business from your idea, product or service, starting with a basic analysis of whether there is a true business opportunity. The simple “back of the envelope” calculation allows an inventor or entrepreneur (or existing business) to quickly determine if there is a reason to invest time and resources into creating a business entity. From this point, the course will discuss business models, how to protect the idea (process or product) as well as how to structure a business around the specific business model. All of the discussion will be centered about actually deriving a profit from the investment of time and money. This class is intended for individuals and existing companies.

For additional information on this course, view the Detailed Syllabus.

B-110 Getting the Most Value out of Marketing without Spinning your Wheels

This course is a crash course on Marketing for business leaders and their teams. If you are not sure you have the best, most effective and efficient Marketing you can have, this course is for you.This course is also for those who participate in Marketing without ever having received training for it (Engineers, Sales professionals…) and for those who want to broaden their knowledge of Marketing.

Following a philosophy of doing less better, this course teaches what elements of Marketing to use and how to use them for different purposes. This course challenges the notion that best practices are universal and that followed, they deliver universal benefits. It will demystify Marketing terminology such as branding, value proposition, segmentation, Marketing automation, SEO, SEM, content Marketing, Inbound Marketing, social listening….By the end of the class, you will be able to determine based on your situation, which Marketing activities to focus on, which to ignore, and why. Knowing why you make your choices will allow you to adjust your Marketing focus when your situation changes. This course will also include generally applicable principles and practical tips for getting more impact out of limited resources.

Selling internationally can be a challenge, especially without Fortune 500 level resources. The course will provide guidelines on how to approach selling outside of the U.S. and practical tips and resources for providing “essential to success” Marketing overseas. This section of the course is specifically geared to small and medium size businesses with limited resources.

This course will pay for itself through elimination of ineffective Marketing activities you identify during the day. The consistent application of principles you learn here will drive higher top and bottom line, as good Marketing has a positive impact on every aspect of a business: revenue growth, profitability, return on R&D investment, capital efficiency, product line, closing rate, margin, and employee recruitment and retention.

B-120 Introduction to Patents and Trademarks

This course provides an overview of patents and their place in developing an intellectual property portfolio. It will cover the basics of what a patent is, how a patent compares to other forms of intellectual property, when a patent is useful, and the process required to obtain a patent. It will highlight what is required to write high quality patent, with a good chance of success. This course is intended for those with minimal to no experience with patents or for those who would like to refresh their knowledge. It is designed to provide an overview of the subject and help understand the costs and work involved in developing patents in order to make informed decisions about when they are useful.

1. What is a patent?
   1. Definition of a patent
   2. History of patent law
   3. Types of patents
      1. Utility patents
      2. Design patents
2. When is a patent useful? Patents vs. trademarks, copyright and trade secrets
   1. What is a trademark and when is it useful?
   2. What does copyright protect?
   3. What is a trade secret?
   4. Comparison of the different types of IP
3. What qualifies as a patentable idea? What is required for an idea to be patentable?
   1. Things that cannot be patented: Laws of Nature, Physical Phenomena, Abstract Ideas
   2. Utility – Is the invention useful?
   3. Novelty – Is the invention something not previously known to the public?
   4. Nonobviousness – Is the invention an obvious variation of something already known?
   5. Statutory bars to patenting
4. So, you have a patentable idea. Where should you file?
   1. Filing in the United States
   2. Filing in Europe – EU Patent office vs. individual countries
   3. Filing in China, Japan and India
5. You have a patentable idea and have decided where to file. What constitutes a good application?
   1. Provisional or no provisional?
   2. Prior art search
   3. What to do if you find problematic prior art
   4. The individual parts of an application.
   5. How to write good claims
6. You filed an application. What now?
   1. The patent office rejected the application
      1. How to respond to an office action
      2. Final vs. non final rejections
      3. Appealing a final rejection
7. Your patent was granted.
   1. Maintenance fees
   2. Enforcement
   3. Licensing
8. Trademarks
   1. Purpose of a trademark
   2. Distinctiveness – Does the proposed trademark stand out? Is it generic?
   3. Functionality – Trademark cannot be a functional feature of a product
   4. Use – Must use the trademark in commerce.
9. Registering a Trademark
   1. Registered vs. unregistered trademarks
   2. Process to federally register a trademark
10. Enforcing a trademark
    1. Geographic limits on trademark rights
    2. How to determine if a trademark is infringing on another mark.
    3. Permissible uses of another’s trademarks.

B-130 Doing Business in the U.S.A.

The U.S. economy is a big market. A small win in the U.S. could be as impactful as a big one in the country of origin. But a big market also means more competition. Success requires conquering the double challenge of creating a new business and doing so in a foreign culture.

This course is intended for business leaders who are considering doing business in the U.S. or desire to improve the results of their existing approach. The course is organized into the stages encountered in chronological order and addresses the critical decisions and factors for success of each stage.

The instructor has held the top Strategic Marketing role in global B2B companies with Engineered Products in various industries, including thin films and coatings. She has built business in the U.S. for a foreign multinational, held a global leadership role in a U.S. Fortune 500 company, and has been an Executive in several smaller multinationals.

As a Management consultant, she has helped small and medium size business clients shape their business strategy for growth. Increase in profit from innovation, shortening in time to market for global companies, and higher business valuation at time of sale have resulted from her implementation of Stage Gate®, presented at SVC TechCon 2011, and market research for product design or new market entry. As a foreign-born professional, she is well acquainted with the impact of culture on business.

For additional information on this course, view the Detailed Syllabus.