A technique for analysis of reflection and transmission data from thin films in the Extreme Ultraviolet (EUV) has been developed. Efforts to deposit films on polyimide membranes to allow for transmission measurements are discussed. Later experiments use thin films of interest deposited directly onto photodiode detectors. This coated photodiode is used for making transmission measurements, and use of a second, uncoated detector allows for the simultaneous collection of reflection data as well. The development of this technique and the analysis of data from thorium thin films and scandium oxide thin films are presented here. EUV measurements were made at the Advanced Light Source (ALS), Beamline 6.3.2, in Berkeley, California.
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