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	<title>Society of Vacuum Coaters Forum : Conference : Public</title>
	<description>Conference : Public : tetetswtsetse</description>
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			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=79E627ED-2608-0B4C-CC0F2D91A2C376EB&amp;r=1">
			<title>Replacement Backing Pump for Syrus Pro</title>
			<description>I have an old Ecodry-L pump on my Leybold Syrus Pro that is getting noisy. Rather than having it rebuilt,I&apos;m considering replacing it with something new. It is paired with a Roots type blower. Just wondering if anyone has done this and what they may have used. Do I necessarily need a dry pump? Is there something that will bolt up to the existing blower without much trouble?

Thanks,
Jack</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=79E627ED-2608-0B4C-CC0F2D91A2C376EB&amp;r=1</link>
			<dc:date>2012-07-25T14:26:00-07:00</dc:date>
			<dc:subject>Replacement Backing Pump for Syrus Pro</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=F844FA5C-2608-0B4C-CC90FD196EB9EEBD&amp;r=2">
			<title>Thermal evaporation of Al, Au, LiF</title>
			<description>I am a project student and as part of my project, I need to coat Aluminium, Gold and Lithium Fluoride by thermal evaporation at a vacuum of approximately 10^-6 mbar. The metal pellets are kept on Molybdenum boats and evaporated by resistance heating. Could anyone please suggest the current levels, optimum vacuum level, coating rate etc. to get a uniform thin film? Thanks.</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=F844FA5C-2608-0B4C-CC90FD196EB9EEBD&amp;r=2</link>
			<dc:date>2012-06-08T08:16:58-07:00</dc:date>
			<dc:subject>Thermal evaporation of Al, Au, LiF</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=9D37A373-2608-0B4C-CCDCFFF9E83E0FAA&amp;r=3">
			<title>Need cosmetic spec that covers PVD deposited gold on optics</title>
			<description>Is there a MIL or ISO spec that addresses cosmetic defects (scratches, voids, etc) on PVD deposited metal coatings (specifically solderable perimeter metals) on optical components?

MIL-13830B and ISO 10110 only cover optical coatings.

There are all manner of specs for electrodeposited (plated) gold, but I&apos;m not finding anything specific to PVD solderable metal systems (NOT mirrors).

Thanks for any help,

Tom</description>
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			<dc:date>2011-12-30T11:04:42-07:00</dc:date>
			<dc:subject>Need cosmetic spec that covers PVD deposited gold on optics</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=7AC9F275-2608-0B4C-CC83F52D9D297447&amp;r=4">
			<title>RE: How sputter rare earth metals</title>
			<description>The rare earth material should sputter like any other element. BUT some of the rare earths, such as cerium, are very oxygen active so they will form thick oxide coatings which means pre-conditioning (pre-sputtering, sputter cleaning) of the target may be a problem. A bigger problem may be the cost of a rare earth target, rare earth materials can be very expensive. Both of these problems may be alleviated by a dual process where say cerium is EVAPORATED onto a plate which is the sputtering target. The material is then SPUTTERED off the target. A Note: One time I was e-beam evaporating cerium and the lump (charge) of cerium just got hotter and hotter until a crack formed in the surface and molten cerium ran into the pocket - the CeO surface layer had formed a high temperature coating (&quot;skull&quot;) that contained the molten cerium until the crack formed. Don
[i]* Last updated by: vacdepman on 10/2/2011 @ 3:56 PM *[/i]</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=7AC9F275-2608-0B4C-CC83F52D9D297447&amp;r=4</link>
			<dc:date>2011-10-02T15:52:38-07:00</dc:date>
			<dc:subject>How sputter rare earth metals</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=7AC9F275-2608-0B4C-CC83F52D9D297447&amp;r=5">
			<title>How sputter rare earth metals</title>
			<description>What is method for sputter rare earth metals?</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=7AC9F275-2608-0B4C-CC83F52D9D297447&amp;r=5</link>
			<dc:date>2011-10-01T08:32:50-07:00</dc:date>
			<dc:subject>How sputter rare earth metals</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=1E92F3FB-F0EE-10B1-0E1DA88FF005BD4E&amp;r=6">
			<title>RE: second hand metallizer</title>
			<description>I need more information: purpose? what kind of metal(s)? what is sputtering source? Pleace send information to ferrivatt@gmail.com</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=1E92F3FB-F0EE-10B1-0E1DA88FF005BD4E&amp;r=6</link>
			<dc:date>2011-10-01T08:23:08-07:00</dc:date>
			<dc:subject>second hand metallizer</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=49DA3ED8-01C9-40F1-7A7CC4D52F9D4C79&amp;r=7">
			<title>RE: Vacuum loss with radiant heater.</title>
			<description>For more information on plasma cleaning search on glow bar plasma cleaning.</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=49DA3ED8-01C9-40F1-7A7CC4D52F9D4C79&amp;r=7</link>
			<dc:date>2010-11-17T15:33:20-07:00</dc:date>
			<dc:subject>Vacuum loss with radiant heater.</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=49DA3ED8-01C9-40F1-7A7CC4D52F9D4C79&amp;r=8">
			<title>RE: Vacuum loss with radiant heater.</title>
			<description>If using a DC diode discharge the pressure will have to be above 10 mTorr or so to establish a plasma. The wall sheath then accelerates ions to the surfaces which then &quot;scrubs&quot; the surfaces of adsorbed molecules such as water. If you use air as the plasma gas the oxygen will react with hydrocarbons on the surface giving &quot;reactive plasma cleaning&quot; of the surface.</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=49DA3ED8-01C9-40F1-7A7CC4D52F9D4C79&amp;r=8</link>
			<dc:date>2010-11-17T10:41:11-07:00</dc:date>
			<dc:subject>Vacuum loss with radiant heater.</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=49DA3ED8-01C9-40F1-7A7CC4D52F9D4C79&amp;r=9">
			<title>RE: Vacuum loss with radiant heater.</title>
			<description>Thank you for your response,
Is it more effective to run the plasma discharge when the vacuum preasure is higher?
Therefore allowing the vacuum to recover before another period of discharge?</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=49DA3ED8-01C9-40F1-7A7CC4D52F9D4C79&amp;r=9</link>
			<dc:date>2010-11-17T02:06:26-07:00</dc:date>
			<dc:subject>Vacuum loss with radiant heater.</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=3B7F14EB-B592-B6DB-8105E6609626A01D&amp;r=10">
			<title>RE: Al evaporation on Polymer surface</title>
			<description>1b: if there is gas scattering there will be a less dense film.

LiF: Ref: Ionization-assisted deposition of LiF electron-injection layer for organic light-emitting diodes, Kuniaki Tanaka, Miyuki Amou, and Hiroaki Usui, J. Vac. Sci. Technol. B 22, L1 (2004). They found that LiF deposited as islands unless they used IAD. You might try exposing the Si to a plasma and see if that cleans the surface and perhaps generates some nucleation site from the UV in the plasma (assuming that you are using un-doped Si).</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=3B7F14EB-B592-B6DB-8105E6609626A01D&amp;r=10</link>
			<dc:date>2010-11-16T12:46:24-07:00</dc:date>
			<dc:subject>Al evaporation on Polymer surface</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=49DA3ED8-01C9-40F1-7A7CC4D52F9D4C79&amp;r=11">
			<title>RE: Vacuum loss with radiant heater.</title>
			<description>The culprit is probably water vapor. The radiant heat caused the water vapor to desorb. To eliminate water vapor run a DC plasma discharge that desorbs the water vapor. Then pump down. i.e. pump - desorb - pump. DMM</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=49DA3ED8-01C9-40F1-7A7CC4D52F9D4C79&amp;r=11</link>
			<dc:date>2010-11-16T00:09:39-07:00</dc:date>
			<dc:subject>Vacuum loss with radiant heater.</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=3B7F14EB-B592-B6DB-8105E6609626A01D&amp;r=12">
			<title>RE: Al evaporation on Polymer surface</title>
			<description>Thank you for the reply. 
answer 1b: does that depend on the distance between the source and the substrate too? my source and substrates surfaces are normal! 

On a different note:
I want to deposit LiF (lithium floride) on a substrate and calculate the tooling factor for my set up. I can not get a qood film. very poor coverage. looks like some islands/particles and not connected film. I am using Si substrate. can you pls. suggest any modification to this process to get a nice coverage. thanks</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=3B7F14EB-B592-B6DB-8105E6609626A01D&amp;r=12</link>
			<dc:date>2010-11-15T16:10:57-07:00</dc:date>
			<dc:subject>Al evaporation on Polymer surface</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=49DA3ED8-01C9-40F1-7A7CC4D52F9D4C79&amp;r=13">
			<title>Vacuum loss with radiant heater.</title>
			<description>I&apos;m very new and inexperienced to the whole industry and physics behind the processes, but very interested and willing to learn as much as possible.
I would greatly appreciate any answer to my problem with vacuum pressure failing when my radiant heater is switched on. I have just fully serviced both diffusion and backing pump, cleaning and replacing oils. The belljar has also been cleaned along with items contained. 
The pressure is good until the heater is on. Is this normal considering the exposure to atmosphere and moisture when cleaned?. Is the problem likely to improve through use? Or is it possible the heat could be exposing a leak?.
The diffusion and backing pump appear to be working well.
The plant is an old Edwards. Guessing built in the 70&apos;s-80&apos;s. Mainly used for anti-reflection coatings and alumnising in a optical workshop.

My ignorance and lack of knowledge is probably amusing but I&apos;m very lost and could use any help I can get.

Thanking you,
Abe
[i]* Last updated by: admin on 9/30/2011 @ 10:10 PM *[/i]</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=49DA3ED8-01C9-40F1-7A7CC4D52F9D4C79&amp;r=13</link>
			<dc:date>2010-11-14T05:07:00-07:00</dc:date>
			<dc:subject>Vacuum loss with radiant heater.</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=458468C4-94C2-8DDF-4A0E0E43C349C028&amp;r=14">
			<title>Historical Timeline</title>
			<description>I would like to bring the SVC Historical Timeline up to date (What is a vacuum coating/History of vacuum coating)and would like to have any additions, corrections or comments anyone might have. Please answer to the Forum or donmattox@mpinm.com. Thanks Don Mattox</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=458468C4-94C2-8DDF-4A0E0E43C349C028&amp;r=14</link>
			<dc:date>2010-11-13T08:54:00-07:00</dc:date>
			<dc:subject>Historical Timeline</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=435328EF-FFC7-E28E-AFEF3C0B686BC28E&amp;r=15">
			<title>Update Historical Timeline</title>
			<description>I would like to update the SVC Historical Timeline for Vacuum Coating Technology and Vacuum/Plasma Technology. Please look at the file under Whats a Vacuum/Historical Timeline of Vacuum Coating Technology and Vacuum/Plasma Technology. I would appreciate any corrections, additions, and/or comments. You can reply through the FORUM or by e-mail to donmattox@mpinm.com DMM</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=435328EF-FFC7-E28E-AFEF3C0B686BC28E&amp;r=15</link>
			<dc:date>2010-11-12T22:41:00-07:00</dc:date>
			<dc:subject>Update Historical Timeline</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=3B7F14EB-B592-B6DB-8105E6609626A01D&amp;r=16">
			<title>RE: Al evaporation on Polymer surface</title>
			<description>1a. Uniformity - depends on the area. The vapor source is essentially from a point source and the thickness will depend on the angle between a point on the substrate and the source. If it is a large area you may have to move the substrate in a pattern over the source. 

1b. Density - Greatest density will be when you have the deposition flux normal to the surface.

2. Don&apos;t know - see 3

3. Depends on how sensitive the polymer is. There will be the condensation energy and the radiant energy from the source. Use a shutter to minimize the radiant heating.</description>
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			<dc:date>2010-11-12T20:12:23-07:00</dc:date>
			<dc:subject>Al evaporation on Polymer surface</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=3B7F14EB-B592-B6DB-8105E6609626A01D&amp;r=17">
			<title>Al evaporation on Polymer surface</title>
			<description>we deposit Aluminum on conjugated polymer surfaces to develop the cathode on the solar cell.
the structure of a typical device is: Glass/ITO/PEDOT:PSS/(P3HT:PCBM blend)/LiF/Al
LiF is not present all the cases but mostly. the evaporation is done thermally using tungsten filaments, the vac. level  is ~5e-7mbar. all this happens in a glove box (N2 atmosphere) 
questions:
1- what are the conditions (parameters) that would result in a uniform dense coating
2-does the Al vapors damage the polymer (conjugation etc)
3-how can we minimize damage to the polymer/Al interface (if any) due to the hot Al flux or extra heat produced by the filaments
suggestions are highly appreciated. thanks in advance</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=3B7F14EB-B592-B6DB-8105E6609626A01D&amp;r=17</link>
			<dc:date>2010-11-11T10:12:52-07:00</dc:date>
			<dc:subject>Al evaporation on Polymer surface</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=3B25B19C-FEFC-9FB3-EC6BECE4BEF5E44C&amp;r=18">
			<title>Unconsistency of spectra</title>
			<description>Hello,

We use a PVD coating chamber with a quartz crystal for thickness measurements.
The evaporation is carried out using an EBG and the pumping is done by a cryo pump.
From time to time the spectrum suddenly and vastly changes without apparent deviations in the process parameters.

Any ideas regarding the cause?</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=3B25B19C-FEFC-9FB3-EC6BECE4BEF5E44C&amp;r=18</link>
			<dc:date>2010-11-11T08:35:14-07:00</dc:date>
			<dc:subject>Unconsistency of spectra</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=F1305BEE-BD74-03CC-46EB94B24523235F&amp;r=19">
			<title>RE: Thermal Evaporation with Liquid Nitrogen</title>
			<description>The cold finger is in the system to help remove water vapor - there should be no nitrogen entering the vacuum chamber itself. If you can&apos;t anodize the film it may be because the surface is being contaminated - possibly from pump oil in the chamber or the ambient outside the chamber. References: J.K.G. Panitz et al J. Electrochem Soc. 131(10) (1984) 2227    DMM</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=F1305BEE-BD74-03CC-46EB94B24523235F&amp;r=19</link>
			<dc:date>2010-11-07T07:44:19-07:00</dc:date>
			<dc:subject>Thermal Evaporation with Liquid Nitrogen</dc:subject>
			</item>
		
		
		
			<item rdf:about="http://www.svc.org/forums/messages.cfm?threadid=F1305BEE-BD74-03CC-46EB94B24523235F&amp;r=20">
			<title>RE: Thermal Evaporation with Liquid Nitrogen</title>
			<description>The cold finger is in the system to help remove water vapor - there should be no nitrogen entering the vacuum chamber itself. If you can&apos;t anodize the film it may be because the surface is being contaminated - possibly from pump oil in the chamber or the ambient outside the chamber. References: J.K.G. Panitz et al J. Electrochem Soc. 131(10) (1984) 2227 &amp; Anodization of mirrors - How to do it Stan Thomas. &lt;http://astro.umsystem.edu/atm/ARCHIVES/APR95/0129.html&gt; 1999   DMM</description>
			<link>http://www.svc.org/forums/messages.cfm?threadid=F1305BEE-BD74-03CC-46EB94B24523235F&amp;r=20</link>
			<dc:date>2010-11-07T07:43:55-07:00</dc:date>
			<dc:subject>Thermal Evaporation with Liquid Nitrogen</dc:subject>
			</item>
		
		

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