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Tutorial Course Descriptions

Detailed Syllabus

C-343 From Basic Aspects to Industrial Components and Applications in HIPIMS Technology

This course is intended for scientists, engineers, technicians, and students that are interested in the practical application and industrial use of high power impulse magnetron sputtering. This course will start with some fundamentals on magnetron sputtering and the transition to pulse sputtering, and especially HIPIMS. Besides the introduction of the technology, the focus will be on industrially relevant topics. This includes commercially available components like power supplies, plasma diagnostic, and process control. Finally, the course will conclude with an overview on industrially available products, i.e. coatings.

Topical Outline:
  1. Introduction of sputtering
  2. Introduction of high power impulse sputtering
  3. Plasma and process characteristics
  4. Operation modes in HIPIMS
  5. Commercial equipment
    1. Power supplies
    2. Diagnostic tools
    3. Feedback / process control
  6. Coating systems and applications
  7. Industrial coatings
Course Details:

1. Chamber Components

Instructor: Ralf Bandorf, Fraunhofer IST - Braunschweig, Germany
Ralf Bandorf

born 1973, studied Physics at Friedrich-Alexander University Erlangen/Nuremberg, Germany and received his diploma in 1998. His work focused on preparation of metastable ironsilicides and phase characterization by LEED. In 1998 he joined Fraunhofer IST for his PhD thesis. Ralf Bandorf received his PhD in Mechanical Engineering in 2002 from Fraunhofer IST / Carolo-Wilhelmina Technical University Braunschweig, Germany. His thesis focused on sub-micron tribloogical coatings for electromagnetic microactuators. Ralf continued at Fraunhofer IST as a scientist, specifically as Project leader in Group Micro and Sensor Technology with a Focus on PVD and PACVD coatings. He worked in the field of plastic metallization for flexible circuits, piezoresistive materials (especially based on DLC), electrical conductive and insulating coatings as well as magnetic thin films. In 2007, he became Head of Group “Sensoric Functional Coatings” and since 2015 he has been Head in Group “PACVD and hybrid processes” at Fraunhofer IST. His focus is on PACVD with different excitation, plasma sources, hollow cathode processes, especially gas flow sputtering, and HIPIMS.

Ralf Bandorf is internationally recognized expert in the field of HIPIMS. He was session chair of the HIPIMS session at ICMCTF, US from 2009-2012. He has served as assistant TAC Chair at the Society of Vacuum Coaters since 2009. Ralf is the conference Chairman of the International Conference on Fundamentals and Applications of HIPIMS and Action Chair of the COST Action MP0804: Highly ionized pulse plasma processes (HIPP processes, 2009-2013), a European scientific networking activity gathering experts worldwide in the field of HIPP plasmas, especially HIPIMS.


This course is currently available via:
On Location Education Program

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