Hot Topic Session on High Power Impulse Magnetron Sputtering (HIPIMS)

Hot Topic on High Power Impulse Magnetron Sputtering (HIPIMS)
Moderator: Jolanta Klemberg-Sapieha, École Polytechnique de Montréal, Canada

9:30 a.m. JHP-1 Detailed Measurements of the Bombarding Ion Energies in a Pulsed Magnetron Discharge
J.W. Bradley, G.C.B. Clarke, S.A. Voronin, and M. Cada, University of Liverpool, Liverpool, United Kingdom; and P.J. Kelly, Manchester Metropolitan University, Manchester, United Kingdom

9:50 a.m. JHP-2 Deposition Flux Characteristics Near the Substrate in High Power Impulse Magnetron Sputtering (HIPIMS)
A.P. Ehiasarian, A. Vetushka, and A. Hecimovi, Sheffield Hallam University, Sheffield, United Kingdom

10:10 a.m. JHP-3 Deposition Rates of High Power Impulse Magnetron Sputtering
Invited 40 min. Talk
A. Anders, Lawrence Berkeley National Laboratory, Berkeley, CA10:50 a.m. JHP-4 Substrate Heating and Deposition Rate Measurement in a HIPIMS Discharge
G.T. West and P.J. Kelly, Manchester Metropolitan University, Manchester, United Kingdom; J.W. Bradley and G.C.B. Clarke, University of Liverpool, Liverpool, United Kingdom; and P. Ozimec, HUETTINGER Electronic, Sp. z o.o., Zielonka, Poland

11:10 a.m. JHP-5 High Power Impulse Magnetron Sputtering (HIPIMS) on the Industrial Level
G. Greczynski and J. Bohlmark, Chemfilt Ionsputtering AB, Linkoping, Sweden; Y.T. Pei, C.Q. Chen and J.T.M. De Hosson, University of Groningen, Groningen, The Netherlands; and M. Aulunovic and R. Cremer, CemeCon AG, Wurselen, Germany

11:30 a.m. JHP-6 The Historical Development of HIPIMS Power Supplies: From Laboratory to Production
D. Ochs, HÜTTINGER Electronik, Freiburg, Germany; P. Ozimek, HUETTINGER Electronic Sp. z o.o., Zielonka, Poland; A. Ehiasarian, Sheffield Hallam University, Sheffield, United Kingdom; and R. Spencer, Alacritas Consultancy, Ltd., Leicestershire, United Kingdom

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Monday Afternoon, April 21

Hot Topic on High Power Impulse Magnetron Sputtering (HIPIMS)
Moderator: Arutiun P. Ehiasarian, Sheffield Hallam University, United Kingdom

2:10 p.m. JHP-7 Research on Promising Applications for High Power Pulse Magnetron Sputtering
Invited 40 min. Talk
V. Sittinger, B. Szyszka, R. Bandorf, M. Vergoehl, and A. Pflug, Fraunhofer Institute for Surface Engineering and thin Films (IST), Braunschweig, Germany; D.J. Christie, Advanced Energy, Fort Collins, CO; and F. Ruske, Hahn-Meitner-Institut Berlin, Berlin, Germany

2:50 p.m. JHP-8 Electrical and Optical Properties of Ag Films Deposited by High Power Impulse Magnetron Sputtering
J. Li, S.R. Kirkpatrick and S.L. Rhode, University of Nebraska-Lincoln, Lincoln, NE

3:30 p.m. JHP-9 Low-Temperature Hysteresis-Free Reactive Deposition of Alpha-Alumina Coatings using High Power Impulse Magnetron Sputtering
Sponsored Student Presentation
E. Wallin, Linkoping University, Linkoping, Sweden; T.I. Selinder, Sandvik Tooling AB, Stockholm, Sweden; and U. Helmersson, Linkoping University, Linkoping, Sweden

3:50 p.m. JHP-10 Investigation of TiO₂ Thin Films Prepared by Different HIPIMS Processes
M. Vergoehl, R. Bandorf, and P. Giesel, Fraunhofer Institute for Surface Engineering and Thin Films (IST), Braunschweig, Germany; and G. Mark, MELEC GmbH, Ottersweier, Germany

4:10 p.m. JHP-11 Modulated Pulse Power Deposition of Nanometer-Scale Multilayered Coatings
R. Chistyakov and B. Abraham, Zond, Inc. / Zpulser, LLC, Mansfield, MA; W. Sproul, Reactive Sputtering, Inc., San Marcos, CA; and J.J. Moore and J. Lin, Colorado School of Mines, Department of Metallurgical and Materials Engineering, Golden, CO

4:30 p.m. JHP-12 Properties of NiCr Sputtered by HIPIMS in Unipolar and dc-Superimposed Mode
R. Bandorf, S. Falkenau, and K. Schiffmann, Fraunhofer IST, Braunschweig, Germany

4:50 p.m. JHP-13 High Power Pulse Plasma Generator for Modulated Pulse Power Sputtering Processes
R. Chistyakov and B. Abraham, Zond, Inc. / Zpulser, LLC, Mansfield, MA