Process Control & Instrumentation
49th Annual SVC Technical Conference
April 22–27, 2006
Marriott Wardman Park Hotel
Washington DC
April 23–27, 2006
Tuesday Afternoon
Process Control & Instrumentation
Moderators: J. Grant Armstrong, Carberry Technologies, Brighton, CO and David Chamberlain, MKS Instruments, Inc., Andover, MA
1:30 p.m. A-1 An Overview of Thin Film Monitoring and Control Techniques
Invited Presentation
C. Lu, C. Lu Laboratory, Mountain View, CA
2:10 p.m. A-2 Real-Time Optical Sensing of Functional Nano-Layer Growth onto Polymer Films for Rollto-Roll Production of Flexible Electronic Devices
S. Logothetidis and M. Gioti, Aristotle University of Thessaloniki, Thessaloniki, Greece
2:30 p.m. A-3 Robust Controller Tuning for Evaporative Deposition Processes: Results from Manufacturing Case Studies
G. Reimann, A. Brewster, and B. Vattiat, Cyber Materials LLC, Auburndale, MA; and J. Hildebrand and C. Hildebrand, Maxtek, Inc., Cypress, CA
2:50 p.m. A-4 Simulation of the Plasma Emission Redistribution Effect
G. Buyle, Ghent University, Ghent, Belgium; S. Fnu and A. Belkind, John Vossen Laboratory, Hoboken, NJ; and R. De Gryse, Ghent University, Ghent, Belgium
TBD AFT-1 A Second Hysteresis Effect of Reactive Sputtering in Compound Mode
A. Pflug, M. Siemers, and B. Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany
TBD AFT-2 Radio Frequency Impedance Analysis of Silane Plasma for the Growth of Nanocrystalline Silicon Thin Films
P.N. Dixit, S. Kumar, C.M.S. Rauthan, M. Dilshad, A. Bhardwaj, and S.S. Rajput, National Physical Laboratory, New Delhi, India
Papers preceded by TBD and ending with FT, denote Guaranteed Flexible Time (FT) presentations, which will be presented in place of a cancelled paper earlier in the session if such situation arises, or will be presented at the end of the session.