Emerging Technologies
49th Annual SVC Technical Conference
April 22–27, 2006
Marriott Wardman Park Hotel
Washington DC
April 23–27, 2006
Monday Afternoon
Emerging Technologies
Moderators: Hana Baránková, Uppsala University, Uppsala, Sweden and David Glocker, Isoflux Incorporated, Rochester, NY
2:00 p.m. E-1 Modification of Film Structure in Pulse and Inductively-coupled-plasma-assisted Pulse Sputtering
Invited Presentation
E. Kusano, Kanazawa Institute of Technology, Hakusan, Japan
2:40 p.m. E-2 Investigation of Reactively Sputtered Alumina and Titania Thin Films Prepared by DC, Pulsed, and Highly Ionized Pulsed Power Magnetron Sputtering
R. Bandorf, M. Vergoehl, and K. Schiffmann, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany
3:00 p.m. E-3 Materials for Large Area Solar Reactors for Photobiological or Photoelectrochemical Hydrogen Production from Water
D. Blake and C. Kennedy, National Renewable Energy Laboratory, Golden, CO
4:10 p.m. E-4 Niobium Oxide Film Deposition Using a High-Density Plasma Source
R. Chow, M.A. Schmidt, and A.W. Coombs, Lawrence Livermore National Laboratory, Livermore, CA; and J. Anguita and M.J. Thwaites, Plasma Quest Limited, Hook, United Kingdom
4:30 p.m. E-5 Multi-layered Coatings by Dual Cathode Arc Sources on Industrial Scale
R. Aharono and H. Gekonde, IonBond, LLC, Madison Heights, MI
4:50 p.m. E-6 New Vacuum Equipment for Complex Coatings Deposition on Powder Materials
E. Yadin, V. Kozlov, and I. Ashmanis, Sidrabe Inc., Riga, Latvia
TBD EFT-1 Room Temperatures Solder Joining of Sputtering Target to Backing Plate
J. Subramanian, A. Duckham, J. Newson, and J. He, Reactive NanoTechnologies, Hunt Valley, MD
Tuesday Afternoon
Emerging Technologies
Moderators: Ladislav Bárdos, Uppsala University, Uppsala, Sweden and Hana Baránková, Uppsala University, Uppsala, Sweden
1:30 p.m. E-7 Comparison of Current and Emerging Surface Treatment Technologies
A. Yializis and R. Ellwanger, Sigma Technologies International, Inc., Tucson, AZ; and R. Wolf, Enercon Industries, Menomonee Falls, WI
1:50 p.m. E-8 Characterization of Hybrid Atmospheric Plasma in Air and Nitrogen
H. Baránková, L. Bárdos, and D. Soderstrom, Uppsala University, Uppsala, Sweden
2:10 p.m. E-9 Surface Modification by a Plasma Accelerator with Closed Electron Drift (PACED)
W. Choi, Korea Institute of Science and Technology, Seoul, Korea; J. Cho, Toray Saehan, Inc., Seoul, Korea; and Y. Ermakov, D.V. Skobeltsyn Institute of Nuclear Physics of the Lomonosov, Moscow, Russia
2:30 p.m. E-10 Room Temperature Industrially-Scaled Pulsed Laser Deposition of Coatings for Wear-Protection, Low-Friction, and Decorative Applications
W. Waldhauser and J.M. Lackner, JOANNEUM RESEARCH Forschungsgesellschaft mbH, Graz, Austria
2:50 p.m. E-11 Applications of Low Temperature Plasmas in Bio-MEMS and Organic- Micro Fluidic Devices
M. Dhayal, H.G. Jeong, and C.H. So, Dongshin University, Naju, South Korea
TBD EFT-2 Concept for Lightweight Spaced-Based Deposition Technology
M. Fulton, Ion Beam Optics, Inc., Thousand Oaks, CA; and A. Anders, Lawrence Berkeley National Laboratory, Berkeley, CA
TBD EFT-3 Properties of a Non-Thermal Radio Frequency Atmospheric Pressure Plasma Jet (APPJ)
K.-D. Weltmann, R. Foest, E. Kindel, H. Lange, and M. Stieber, INP Greifswald, Greifswald, Germany
Papers preceded by TBD and ending with FT, denote Guaranteed Flexible Time (FT) presentations, which will be presented in place of a cancelled paper earlier in the session if such situation arises, or will be presented at the end of the session.