47th Annual Society of Vacuum Coaters Technical Conference

Adam's Mark Dallas Hotel
Dallas, TX
April 24–29, 2004

Innovators Showcase
Exhibitors! There is still time to participate in the Innovators Showcase. This is an opportunity to reach a larger, focussed audience than is possible in the Exhibit Hall. Submit your abstract using the SVC Online Abstract Submission process.

Click here to view Technical Program Abstracts.

Tuesday Morning

Innovators Showcase
Tuesday Morning, April 27
Times to be announced
Moderator: F.T. Zimone, Denton Vacuum, LLC

8:30 a.m. IS-1 Industrial Batch Coater with Integrated Laser-Arco Technology
T. Schuelke and H.-J. Schiebe, Fraunhofer USA, East Lansing, MI

8:40 a.m. IS-2 Alumina-containing Silica for Durable Coatings on Polycarbonate
F. Koenig and M. Friz, Merck KGaA, Gernsheim, Germany; K. Lau, U. Schulz, and N. Kaiser, Fraunhofer Institute for Applied Optics and Precision Engineering, Jena, Germany

8:50 a.m. IS-3 Specialty Slitters for Vacuum Coated Films
P. Raugei, Galileo Vacuum Systems, Inc., Alpharetta, GA

9:00 a.m. IS-4 How to Capture the Enormous Value of the Chinese Marketplace
J. Xu, Fortune Consultancy, Beijing, China

9:10 a.m. IS-5 Next Generation Crystal Microbalances for Thin Film Deposition Monitoring and Control
S.F. Grimshaw, Tangidyne Corporation, Syracuse, NY

9:20 a.m. IS-6 Recent Advances in State-of-the-art Imaging, Compositional, and Chemical Analysis of Thin Films and Coatings
S. Baumann, Evans Analytical Group, Round Rock, TX

9:30 a.m. IS-7 Denton Vacuum Discovery Multi-Wafer Loading Sputtering System
J. Colbridge and M. Brazil, Denton Vacuum, Moorestown, NJ

9:40 a.m. IS-8 High Rate & Target Use Sputter Metallizing Cathode
D. Monaghan and V. Bellido-Gonzalez, Gencoa Ltd., Liverpool, United Kingdom

9:50 a.m. IS-9 Magnetron Sputtering Cathode Designed for High Power Applications
J. Hrebik, M.A. Bernick, and R. Belan, Angstrom Sciences, Inc., Duquesne, PA

10:00 a.m. IS-10 Patented Method of High Target Utilization Sputtering (HiTUS)
D. Bingaman, Kurt J. Lesker Company, Clairton, PA

10:30 a.m. IS-11 Cygnus -Advanced Thin Film Deposition Controller for Organic Vapor Deposition
R. Mueller and C. Cipro, Inficon, Inc., East Syracuse, NY

10:40 a.m. IS-12 Denton Vacuum's Glove Box Solutions
J. Crowe, Denton Vacuum LLC, Moorestown, NJ

10:50 a.m. IS-13 High Power Ion Beam Solutions for Large Area Ion Assisted Deposition
D. Siegfried, D. Burtner, and E. Wahlin, Veeco Instruments, Fort Collins, CO

11:00 a.m. IS-14 Introducing the Millbrook MiniSIMS - Surface Analysis for Everyone
B. Cliff, N. Long, and J. Eccles, Millbrook Instruments, Blackburn, UK

11:10 a.m. IS-15 Uniform 16” Microwave Plasma Sources at High Pressure and Larger
H. Sung-Spitzl and R. Spitzl, Iplas Innovative Plasma Systems GmbH, Troisdorf, Germany

11:20 a.m. IS-16 Advances of MEMS Sensor Technology
D. Kelly, MKS Instruments, Inc., Boulder, CO; O. Wenzel, MKS Instruments, HPS Products, Hellebaek, Denmark

11:30 a.m IS-17 New Technology for Rotary Target Tubes
G. Wityak, Academy Precision Materials, Albuquerque, NM

11:40 a.m IS-18 The WAM TFP Solution for all your PVD Requirements is More Thorough Than You Think!
M.A. LoPiccolo and J. McMullen, Williams Advanced Materials, Brewster, NY

11:50 a.m. IS-19 The MultiCPM: A Real Time In Situ Multi Sensor Platform for Advanced Process Control, Plasma Monitoring, and End Point Detection
E. Teboul, Jobin Yvon Inc., Thin Film Division, Edison, NJ; Y. Ji, Jobin Yvon Inc., Thin Film Division, Sunnyvale, CA; J.P. Vassilakis, C. Louis, E. Bluem, and R. Benferhat, Jobin-Yvon S.A.S. Thin Film Division, Chilly-Mazarin, France

12:00 noon IS-20 In Situ Measurement of Material Properties by Phase Modulation Spectroscopic Ellipsometry
Y. Ji, Jobin Yvon Inc., Thin Film Division, Sunnyvale, CA; A. Kramer and
E. Teboul, Jobin Yvon Inc./Horiba Group, Thin Film Group, Edison, NJ