1999 42nd Technical Conference Proceedings

Note: Number in brackets on the top line is the paper number for 1999.

Plenary Session

Ion Beam Sources, Past, Present and Future [1]
P.D. Reader, Ion Tech Inc., Fort Collins, CO.....3


Process Control and Instrumentation

Mechanical Booster Vacuum Pumps [2]
P.D. Vibert, Tuthill Corporation/Kinney Vacuum Division, Canton, MA.....11

Atomic Absorption Spectroscopy for Monitoring Evaporation Processes [3]
D.G. Jensen, C.L. Beall, T.N. Gaidzik and C.K. Carniglia, Optical Coating Laboratory, Inc., Santa Rosa, CA.....17

Modeling of Production Scale Reactive Deposition [4]
P. Greene and R. Dannenberg, BOC Coating Technology, Fairfield, CA.....23

In-Line Monitoring of Sputter Deposited Soft-Magnetic Thin Films [5]
H. te Lintelo, Innovative Sputtering Technology N.V. (I.S.T.), Belgium; and D. Van Wassenhove,
Innovative Specialty Films LLC (ISF), Research Triangle Park, NC.....29

Recent Developments on Optical Coatings Sputtered by Dual Magnetron Using a Process Regulation System [6]
U. Heister, J. Bruch, T. Willms, C. Braatz, A. Kastner and G. Bräuer, Leybold Systems GmbH, Germany.....34

Zinc and Magnesium Vapor Generators in a Steel Strip Coating System [7]
E. Yadin and Y. Andreev, J/S Co. Sidrabe, Latvia.....39


Decorative and Functional Coating

Racking for PVD Applications [8]
D. Bauer, Associated Rack Corporation, Chicago, IL.....45

Precision Cleaning Prior to Vacuum Deposition [9]
B.T. Nevill and F.J. Fuchs, CAE Cleaning Technologies, Cincinnati, OH.....48

Selection of Materials and Techniques for Performance Coatings [10]
G. Vergason and S. Gaur, Vergason Technology, Inc., Van Etten, NY.....53

Setting Up Mass Production of Decorative Coatings on Consumer Goods [11]
T. Hurkmans, G.J. van der Kolk, M. Eerden, T. Trinh and W. Fleischer, Hauzer Techno Coating Europe B.V., The Netherlands.....58

A Study of Corrosion Resistant Decorative Coatings Produced in a New In-Line Physical Vapor Deposition (IPVD) System [12]
R. Wilberg, M. Falz, T. Lunow, B. Gebhardt and J. Schulte, VTD Vakuumtechnik Dresden GmbH, Germany.....64

Process and Equipment for Large Scale Electromagnetic Interference (EMI) Coating on Plastic [13]
H.R. Powell and S.G. Galperin, Stokes Vacuum Inc., Philadelphia, PA.....69

A Low-Cost Industrial Process to Produce Hard-Coatings by PE-CVD on Optical Plastic Substrates [14]
S. Mengali, C. Misiano and E. Simonetti, CETEV, Italy; and R. Aimo and K. Pischow, Surfcoat, Finland.....75

Short Cycle Decorative Hard Coating of Door Hardware and Plumbing Fixtures for Brass, Zinc Diecast and Plastic Parts [15]
D. Hofmann, H. Maidhof and H. Schüssler, Leybold Systems GmbH, Germany.....78

The Combination of "Gold Plating" and High Wear Resistance of PVD [16]
M.H. Bouix, Ionitec S.A., France.....83


Emerging Technologies

An Estimate of the Potentials Developed on Coated Anodes During Pulsed DC Reactive Sputtering [17]
D.A. Glocker, Isoflux Incorporated, Rush, NY.....87

Ion-Assisted Filtered Cathodic Arc Deposition (IFCAD) System for Volume Production of Thin-Film Coatings [18]
M.L. Fulton, Ion Arc Corporation, Torrance, CA.....91

Enhanced Reactively Sputtered Al2O3 Deposition by Addition of Activated Reactive Oxygen [19]
D. Carter and G. McDonough, Advanced Energy Industries, Inc., Fort Collins, CO.....96

A New Hybrid Deposition Process, Combining PML and PECVD, for High Rate Plasma Polymerization of Low Vapor Pressure, and Solid, Monomer Precursors [20]
J.D. Affinito, G.L. Graff, M.-K. Shi, M.E. Gross, P.A. Mounier and M.G. Hall, Battelle Pacific Northwest National Laboratory, Richland, WA.....102

High Rate Deposition of Functional Coatings in an Electron Cyclotron Resonance Discharge [21]
C.-T. Lin, F. Li and T. D. Mantei, University of Cincinnati, Cincinnati, OH.....108

Effective Low Power Microwave Plasma CVD of Carbon Nitride Films [22]
L. Bárdos and H. Báranková, Uppsala University, Sweden; and Y.A. Lebedev, Russian Academy of Science, Russia.....111

Low Energy Ion and Plasma Beam Sources on the Step to Industrial Applications [23]
J. Waldorf, Ionen-und Plasmatechnik GmbH (IPT), Gemany.....116

Improvements in Equipment for the Evaporation of Subliming Materials in Reactive Gas Conditions [24]
P. Chang, W.K. Halnan and R.J. Hill, BOC Coating Technology, Fairfield, CA.....122

IVD Aluminum [25]
B.T. Nevill, CAE Cleaning Technologies, Cincinnati, OH 129

Protective Properties of Silicon Nitride, Deposited by Bias Reactive Sputtering [26]
Y. Lipin, and E. Machevski, J/S Co. Sidrabe, Latvia.....133

New Magnets-in-Motion (M-M) Plasma Sources [27]
H. Baránková and L. Bárdos, Uppsala University, Sweden.....136


Large Area Coating

Temperable Low Emissivity Coating Based on Twin Magnetron Sputtered TiO2 and Si3N4 Layers [28]
J. Szczyrbowski, G. Bräuer, M. Ruske, H. Schilling and A. Zmelty, Leybold Systems GmbH, Germany;
and H. Johnson, AFG Industries Inc., Kingsport, TN.....141

MF Sputtering—A Powerful Process Tool for Large Area Coating [29]
T. Rettich and P. Wiedemuth, Hüttinger Elektronik GmbH + Co. KG, Germany.....147

Bi-Directional Linear Magnetron Arc Cathode [30]
R.P. Welty, Vapor Technologies, Inc., Boulder, CO.....152

Advances in Cylindrical Magnetrons [31]
W. De Bosscher and D. Cnockaert, Sinvaco, Belgium; and H. Lievens, I.S.F., Belgium.....156

Industrial Scale Manufacture of Solar Absorbent Multilayers by MF-Pulsed Plasma Technology [32]
F. Milde and M. Dimer, Von Ardenne Anlagentechnik GmbH, Germany; P. Gantenbein, SPF Ingenieurschule Rapperswil ITR, Switzerland; Ch. Hecht, Von Ardenne Anlagentechnik GmbH, Germany; D. Pavic, Ikarus Coatings, Germany; and D. Schulze, Von Ardenne Anlagentechnik GmbH, Germany.....163

Anode Problems in Pulsed Power Reactive Sputtering of Dielectrics [33]
R. Scholl, Advanced Energy Industries, Fort Collins, CO; and A. Belkind and Z. Zhao, Stevens Institute of Technology, Hoboken, NJ.....169

A Simple Model of Oxygen Permeation Through Defects in Transparent Coatings [34]
G. Czeremuszkin and M. Latrèche, Polyplasma Inc., Canada; and A. S. da Silva Sobrinho and M. R. Wertheimer, École Polytechnique Montréal, Canada.....176

Uniformity Control of Rate Enhanced Reactive AC Sputtering [35]
R. Dannenberg, R. Newcomb and A. Ryan, BOC Coating Technology, Fairfield, CA.....181

A New Plant Generation for Large Area Vacuum Coating of Architectural and Automotive Glass [36]
H. Schilling, Leybold Systems GmbH, Germany.....186

The Effects of Bonding Sputtering Targets for Large Area Coaters [37]
W.R. Simpson and R.A. Scatena, Thermal Conductive Bonding, Inc., San Jose, CA.....191


Optical Coating

The State-of-the-Art of Switchable Glazing and Related Electronic Products [38]
C.M. Lampert, Star Science, Santa Clara, CA.....197

Silicon-Carbon Alloys Synthesized by Electron Cyclotron Resonance Chemical Vapor Deposition [39]
M.B. Moran and L.F. Johnson, Naval Air Warfare Center, China Lake, CA.....204

On-Line Inspection of Randomly Oriented Metallized Sheets and Panels [40]
T.A. Potts, Dark Field Technologies, Inc., Shelton, CT.....211

Bipolar Pulsed DC Sputtering of Optical Films [41]
D. Konopka, D.E. Morton and F.T. Zimone, Denton Vacuum, LLC, Moorestown, NJ.....217

Ultrathick Silicon Coatings for Infrared Mirror Applications [42]
P.M. Martin, J.W. Johnston, W.D. Bennett, and D.C. Stewart, Battelle Pacific Northwest National Laboratory, Richland, WA; and J. Robichaud, S. Daignault and A. Raudenbush, SSG, Inc., Wilmington, MA.....223

Electrically Conductive Anti-Reflection Coating for Display Applications [43]
P. Persoone, Innovative Specialty Films (ISF), Belgium; and P. Lippens, N.V. Bekaert, Belgium.....227

Assessing Contamination Sensitivity in Optical Coatings [44]
H.A. Macleod and C. Clark, Thin Film Center Inc., Tucson, AZ.....232

Optical Coating Process Simulation and Reverse Engineering [45]
C. Clark, Thin Film Center, Inc., Tucson, AZ.....237

Refractive Index as a Construction Parameter in Thin Film Design by Computer Optimization [46]
P.W. Baumeister, Sholem Consultants, Sebastopol, CA.....243

Design of Antireflection Coating Using Indium Tin Oxide (ITO) Film Prepared by Ion Assisted Deposition (IAD) [47]
R. Wang, Advanced Link Photonics Inc., Irvine, CA; and C.-C. Lee, Institute of Optics Sciences, National Central University, Taiwan.....246

Ion-Assisted Deposition of E-Gun Evaporated ITO Films at Low Substrate Temperatures [48]
D.E. Morton and A. Dinca, Denton Vacuum, LLC, Moorestown, NJ.....250

Accurate and Rapid Determination of Thickness, n and k Spectra, and Resistivity of ITO Films [49]
K. Zhang, EG&G Amorphous Silicon, Santa Clara, CA; and A.R. Forouhi and D.V. Likhachev,
n&k Technology, Inc., Santa Clara, CA.....255

The Characteristics of Indium Tin Oxide (ITO) Film Prepared by Ion-Assisted Deposition [50]
C.-C. Lee and S.-C. Shiau, National Central University, Taiwan; and Y. Yang,
Darly Custom Technology, Inc., Bloomfield, CT.....261

Heating of a Chamber During Vacuum Deposition—A Review [51]
P.W. Baumeister, Sholem Consultants, Sebastopol, CA.....265

Ion Bombardment Characteristics During the Growth of Optical Films Using a Cold Cathode Ion Source [52]
O. Zabeida, J.E. Klemberg-Sapieha, and L. Martinu, École Polytechnique Montréal, Canada; and D.E. Morton, Denton Vacuum LLC, Moorestown, NJ.....267

High Rate EB-PVD Processes for Optical Coating and Their Applicability for Long Time Deposition Cycles in Production Coaters [53]
E. Reinhold, J. Richter, O. Gawer and E. Zschieschang, Von Ardenne Anlagentechnik GmbH, Germany.....273

In-Situ Optical Measurements of Transmittance, and Reflectance by Ellipsometry on Glass, Strips and Webs in Large Area Coating Plants [54]
J. Struempfel, C. Melde, E. Reinhold and J. Richter, Von Ardenne Anlagentechnik GmbH, Germany.....280

High Rate Sputter Deposition of TiO2 from TiO2-X Target [55]
Y. Tachibana, H. Ohsaki, A. Hayashi, A. Mitsui and Y. Hayashi, Asahi Glass Co., Ltd., Japan.....286

Estimating the Reflection Losses in the Passband of Edge Filters [56]
R.R. Willey, Raytheon Optical Systems, Inc., Danbury, CT.....290

Broad Beam Ion Assisted Deposition of Titania and Alumina Films [57]
K. Narasimha Rao, M. Adinarayana Murthy, H.S. Vijaya and S. Mohan, Indian Institute of Science, India.....295


Plasma Processing

Plasma Treatment of Polymer Films [58]
S.A. Pirzada, A. Yializis, W. Decker and R.E. Ellwanger, Sigma Technologies International, Inc., Tucson, AZ.....301

Plasma Surface Modification of Acrylic-Based Polymer Multilayer for Enhanced Ag Adhesion [59]
M.K. Shi, G.L. Graff, J.D. Affinito, M.E. Gross, G. Dunham, P. Mounier and M. Hall, Battelle Pacific Northwest National Laboratory, Richland, WA.....307

Mass Resolved Ion Energy Distributions in Dual-Mode Microwave/Radio Frequency Plasma [60]
A. Hallil, O. Zabeida, J.E. Klemberg-Sapieha, M.R. Wertheimer and L. Martinu,
École Polytechnique Montréal, Canada.....311

Detection and Characterization of Defects in Transparent Barrier Coatings [61]
A.S. da Silva Sobrinho, École Polytechnique Montréal, Canada; G. Czeremuszkin and M. Latrèche,
Polyplasma Inc., Canada; and M.R. Wertheimer, École Polytechnique Montréal, Canada.....316

An Alternate Wear Treatment to Replace Chrome Plating [62]
W. Kovacs and K. Kovacs, Elatec Technology Corportation, Wilmington, MA.....320

Controlling Vacuum Pump Induced Contamination in Media Manufacturing [63]
A.N. Patil, BOC Edwards Vacuum Technology, Santa Clara, CA.....326

Fluorocarbon Based Anti-Smudge Coating Prepared by a Planar R.F. ICP Plasma Source for Display Applications [64]
A. Vanhulsel, E. Dekempeneer, W. Wegener, J. Meneve and J. Smeets, Vlaamse Instelling voor Technologisch Onderzoek (VITO), Belgium; P. Lippens, Innovative Specialty Films (I.S.F.), Belgium; and J.P. Celis, KU Leuven, Belgium.....332

Industrial Ion Sources and Their Application for DLC Coating [65]
A. Shabalin, M. Amann, M. Kishinevsky, K. Nauman and C. Quinn,
Advanced Energy Industries, Fort Collins, CO.....338


Tribological and Wear Coating

Hard Coating Technology Update [66]
D.T. Quinto, Balzers Ltd., Principality of Liechtenstein.....345

Wear Resistant PVD Coatings for High Temperature (950°) Applications [67]
W.-D. Münz, Bodycote-SHU Coatings Ltd., United Kingdom; and I.J. Smith, Sheffield Hallam University,
United Kingdom.....350

Self Lubricating Coatings for the Protection of Cutting and Forming Tools and Mechanical Components [68]
D.G. Teer, D. Camino. V. Fox, A. Jones and N. Renevier, Teer Coatings Ltd., United Kingdom.....357

Perspective for Replacement of Hard Chrome by PVD [69]
T. Hurkmans, J. Kubinski, T. Trinh, W. Fleischer and G.J. van der Kolk, Hauzer Techno Coating,
The Netherlands 364

Growth of SiC Protective Coating Layers on Graphite Using Single Molecular Precursors [70]
S.-J. Park, J.-G. Han and J.-H. Boo, Sungkyunkwan University, Korea.....368

Ultra Hard TiBN Coatings Obtained by New Plasma Enhanced Reactive Sputter Deposition [71]
P. Maurin Perrier, HEF USA, Columbus, OH; C. Heau and F. Vaux, HEF R&D, France; and J.M. Poirson, TS Developpement/HEF R&D, France.....373

Deposition and Characterization of Nanoscale CNX/HfN Multilayers [72]
A. Madan, M. Graham and J. Wessling, Northwestern University, Evanston, IL.....379


Vacuum Web Coating

Vacuum Web Coating of Polymers: An Update on European Collaborative R&D Activities [73]
U. Moosheimer and H.-C. Langowski, Fraunhofer Institute for Process Engineering and Packaging, Germany.....387

Transparent Oxide Coatings on Plastic Webs for Emerging Applications [74]
N. Schiller, H. Morgner, M. Fahland, S. Straach, M. Räbisch and C. Charton, Fraunhofer Institut Elektronenstrahl-und Plasmatechnik (FEP), Germany.....392

Wet Chemistry: Coatings Based on Inorganic-Organic Polymers [75]
K.-H. Haas, S. Amberg-Schwab, K. Rose and G. Schottner, Fraunhofer-Institut für Silicatforschung, Germany.....397

Characterization of Oxide Gas Barrier Films [76]
B.M. Henry, F. Dinelli, K.-Y. Zhao, A.G. Erlat, C.R.M. Grovenor and G.A.D. Briggs, University of Oxford, United Kingdom; and R.S. Kumar and R.P. Howson, Loughborough University, United Kingdom.....403

Permeation of Oxygen and Moisture Through Vacuum Web Coated Films [77]
U. Moosheimer and H.-C. Langowski, Fraunhofer Institute for Process Engineering and Packaging, Germany.....408

Clear Barrier Coatings [78]
F. Casey, A.W. Smith and G. Ellis, General Vacuum Equipment Ltd., United Kingdom.....415

A New Ceramic-Coated Barrier Film by Dual Element Electron Beam Evaporation [79]
S. Yokoyama, K. Iseki, T. Ohya, S. Komeda, Y. Yamada and H. Ishihara, Toyobo Co., Ltd., Research Center,
Japan.....420

Electron Beam Web Coating—Technology and Applications [80]
G. Hoffmann, R. Kukla, G. Löbig, R. Ludwig, P. Seserko and G. Steiniger, Leybold Systems GmbH, Germany.....425

Vacuum Coater Thread Path Design Using Basic Web Handling Principles and Techniques [81]
W.E. Hawkins, Film Handling Solutions, Ltd., Circleville, OH.....430

Worldwide Authentication Market for Holograms: Past, Present, Ensuring the Future [82]
L.T. Kontnik, International Hologram Manufacturers Association, Cherry Hills Village, CO.....433

Making Holographic Packaging Work on Shelf [83]
D.C. Beeching, Spectratek Technologies, Inc., Los Angeles, CA.....437

The Evolution of Security Holograms—They’re Not Just for Credit Cards Anymore [84]
T. Anagnostis, Van Leer Metallized Products (USA) Ltd., Franklin, MA.....440

Hardcoats in the World of the Vacuum Coater [85]
P. Moulds, Tekra - Advanced Technologies Group, New Berlin, WI.....442

A Low-Cost Flexible Circuit on a Polyester Substrate [86]
D.J. McClure, D.S. Dunn, G.M. Jellum and A.J. Ouderkirk, 3M Corporate Process Technology Center,
St. Paul, MN.....445

A Decade of Depositing Copper on Polymer Webs [87]
R.L. Swisher, Sheldahl Inc., Northfield, MN.....448

Patterned Metallized Films Used for Higher Energy Density Capacitor Components [88]
G.J. Walters, A.D. Tech, Inc., Taunton, MA.....453

Requirements of Flexible Substrates for Organic Light Emitting Devices in Flat Panel Display Applications [89]
J.K. Mahon, J.J. Brown and T.X. Zhou, Universal Display Corporation, Princeton, NJ; and P.E. Burrows and
S.R. Forrest, Princeton University, Princeton, NJ.....456

High Speed In-Line Treatment of Plastic Webs for Vacuum Coating [90]
H. Morgner, R. Rank, J. Reschke and N. Schiller, Fraunhofer-Institut Elektronenstrahl-und
Plasmatechnik (FEP),
Germany.....460

Plasma Pre-Treatment in Aluminum Web Coating: A Converter Experience [91]
V. Cassio, Neograf S.R.L., Italy; and F. Rimediotti, Galileo Vacuum Systems, Italy.....465

Surface Functionalization of Polymer Films [92]
A.Yializis, M.G. Mikhael and R.E. Ellwanger, Sigma Technologies International, Inc., Tucson, AZ; and
E.M. Mount III, Mobil Chemical Company, Macedon, NY.....469

Engineering Solutions Enabling a New Family of Expandable, Multi-Process, Multi-Chamber Vacuum Roll Coaters [93]
M.G. Langlois, M.G. Langlois & Associates, Inc., Atlanta GA; and M. McEuen, Delta V Technologies, Inc., Tucson AZ.....475

Properties of Metallized Film in a Free Span Web Metallizer [94]
F. Casey, N.A.G. Ahmed and G. Ellis, General Vacuum Equipment Ltd., United Kingdom.....480

Positioning Technology for Profits [95]
A. Comer, MarTech, Covington, VA.....484

Chemometrics—A Holistic Approach to Troubleshooting [96]
M.J. McCann, McCann Science, Chadds Ford, PA; and C.A. Bishop, C.A. Bishop Consulting Ltd., United Kingdom.....487

Colors by Chemistry or by Physics? [97]
R.W. Phillips and M. Nofi, Flex Products, Inc., Santa Rosa, CA.....494


Vendor Session

NeoVac, the Company and its Capabilities [98]
J.B. Fenn Jr., NeoVac, Santa Rosa, CA.....503

The Virtual Technology Center—A Cost-Effective Approach to Process and Product Development [99]
K. Legg, Rowan Technology Group, Libertyville, IL.....504

MarTech: Successfully Connecting Technology to the Marketplace [100]
A. Comer, MarTech, Covington, VA.....505

SKY™ Ceramic Capacitance Diaphragm Gauges [101]
P. Roth, Leybold Inficon, East Syracuse, NY.....506

Advances in Process Vacuum Measurements [102]
R. Traverso, P. Blackborow and L. Hinkle, MKS Instruments, Inc., Andover, MA.....507

The Leader in Magnetics—Dexter Magnetic Technologies [103]
G.-L. Wang, Dexter Magnetic Technologies, Fremont, CA.....510

Hostaphan® RHB 12—Further Developments and Commercial Applications [104]
R. Davis and H. Peiffer, Mitsubishi Polyester Film GmbH, Germany.....511

Simultaneous Optical Emission Control of Two Electron Beam Sources for (TiAl)N [105]
B. Garside, Tecvac Ltd, United Kingdom.....513

Swift-Kote Rapid Cycle 3-Dimensional Metallizer [106]
Y. Yang, Darly Custom Technology, Inc., Bloomfield, CT.....515

Rapid Cycle, Small Batch Titanium Nitride Coater [107]
D. Glocker, Isoflux Incorporated, Rush, NY; and D. Cook and J. Davis, Ion Tech Inc., Fort Collins CO.....517

A New Cathodic Arc Source [108]
R.I. Christy, Tribo Coating, Malibu, CA.....520

Choosing the Best Crystal for Your Coating Process [109]
P. Becker, Fil-Tech Inc., Boston, MA.....522

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