1994 37th Technical Conference Proceedings

Note: Number in brackets on the top line is the paper number for 1994.

Plenary Session

Optical Thin Film Technology in Russia[1]
G.W. DeBell, DeBell Design.....3

The Art of Light and Surface [2]
L. Bell, Larry Bell Studio.....10

Optical Coating

Low Temperature Optical Coatings with High Packing Density Produced with Plasma Ion-Assisted Deposition [3]
S. Beißwenger, R. Götzelmann, K. Matl and A. Zöller, Leybold AG, Germany.....21

Reduced Set-Up Time and Improved Production Yield of Dielectric Filters with Reactive Ion Plating [4]
M. Dubs and R. Hora, Balzers, Principality of Liechtenstein; and H. Tafelmaier, Dünnschicht-Technik, Germany.....25

Characterization of Silicon-Compound Multilayer and Graded-Index Optical Coatings Deposited by Dual-Frequency Plasma [5]
D. Poitras, P. Leroux, J.E. Klemberg-Sapieha, S.C. Gujrathi and L. Martinu, Groupe des Couches
Minces (GCM) and École Polytechnique , Canada.....31

PE-CVD Hardening and Matching Coating for Ophthalmic Plastic Lenses [6]
S. Menichella, C. Misiano, E. Simonetti, L. De Carlo and M. Carrabino, Centro Tecnologie del Vuoto, Italy .....37

Transparent Conductive Thin Films of ZnO:Al by DC Magnetron Sputtering [7]
N. Ogawa, T. Iwamoto, T. Mouri, Tosoh Corporation , Japan; T. Minami, H. Satoh and S. Takata,
Kanazawa Institute of Technology, Japan.....41

Improved Temperature and Humidity Stability of Ultra-Narrow Band Filters [8]
M.A. Scobey and P. Stupik, Optical Corporation of America.....47

The Design of Interference Filters with Multiple Peaks [9]
H.A. Macleod, Thin Film Center Inc......53

Multilayer Software for Thin Film Deposition Controllers [10]
F. Goldstein, FTG Software Associates.....59

What those Defects in Optical Coatings Really Look Like [11]
R.J. Tench, R. Chow and M.R. Kozlowski, Lawrence Livermore National Laboratory.....63

Scanning Probe Microscope Analysis of Optical Thin Films in a Manufacturing Environment [12]
S.P. Sapers, R. Clark, Optical Coating Laboratory, Inc. ; and P. Somerville, Topometrix Corporation .....69

Electron Cyclotron Resonance High Ion Density Plasma Sources for Etching and Deposition in III-V Semiconductor Device Technology [13]
S.J. Pearton, University of Florida.....75

Low Temperature Ion-Assisted Deposition of Thermally Evaporated Silicon Monoxide [14]
I.C. Stevenson, Denton Vacuum, Inc......81

Manufacturing of Optical Security Devices by Sputtering Techniques [15]
I. Glick, D.F. Grigg and R.L. Wilkinson, Identicard Ltd., Canada.....85

Considerations in Applying Digital Processors to Update Vacuum Deposition Systems
C.R. Vogel, Eddy Company.....97

Calculation of Pumping Speeds of High Vacuum Systems in Molecular Flow
G.S. Ash, CTI-Cryogenics Division, Helix Technology Corporation.....100

Advancing Optical Coating Processes through Modern Electron Beam Evaporation Techniques
J.W. Moore and N.K. Tsujimoto, MDC Vacuum Products Corporation.....110

Comparative Experience in the Use of "Steering" in Automatic and Manual Optical Monitoring [19]
R.R. Willey, Opto Mechanik, Inc......113

Development of Medium and High Refractive Index Coating Materials for the Visible and UV Spectral Range [20]
F. Koenig and M. Friz, E. Merck, Germany.....118

Improvement of Temperature Stability of a Multilayer Stack by the Use of Ion Assisted Deposition [21]
U. Jeschkowski, Schott Glaswerke, Germany; and A. Musset, University of Aberdeen, Scotland.....122

Vacuum Web Coating

Snack Food Packaging Barrier: How Much is Enough? [22]
I.F. Gavitt, Frito-Lay, Inc......127

Thin Inorganic Barrier Coatings: The Converters Role [23]
J.F. Kinstle, James River Corporation.....134

Transparent SiO₂ Barrier Coatings: Conversion and Production Status [24]
E. Finson and J. Felts, Airco Coating Technology.....139

Development of Aluminium Oxide Clear Barrier Films [25]
R.S.A. Kelly, Camvac (Europe) Ltd., United Kingdom.....144

Commercial Low-Temperature Plasma System for Barrier on Flexible Films [26]
R.R. Newton, J.M. Parks, M.J. Perri and H.R. Thomas, PC Materials, Inc......150

Transparent Barrier Coatings by Reactive Evaporation [27]
G. Hoffmann, R. Ludwig, J. Meinel and G. Steiniger, Leybold AG, Germany.....155

New Technique for the Accurate Optical Monitoring of Coating Layers for Web Converting Applications [28]
J. Waszak, Custom Fabrication & Service Co., Inc......161

ISO 9001 Registration [29]
D. Esho, Courtaulds Performance Films.....167

Selection Criteria for Equipment for Slitting Web Coated Materials [30]
J. Southall, Atlas Converting Equipment Ltd., United Kingdom.....176

Real Time Defect Detection in Polymeric Webs Using High Frequency Laser Scanning Device [31]
J. Thornton and G. Phillips, Deposition Technologies, Inc......181

Automated Surface Inspection Technology for Web Coating Applications [32]
J.F. Meehan, EKTRON Applied Imaging.....187

Technologies and Markets for Thin Film EMI/RFI Shielding Materials [33]
P.J.D. Mason, Courtaulds Performance Films.....192

Sputter Deposited Media for Digital Optical Data Recording: A New Tape Product for an Emerging Market [34]
T.L. Larsen and F.E. Woodard, Southwall Technologies.....198

Plasma-Activated High-Rate Deposition of Oxides on Plastic Films [35]
S. Schiller, M. Neumann, H. Morgner and N. Schiller, Fraunhofer-Establishment for Electron Beam
and Plasma Technology, Germany.....203

Improved Adhesion in Two Layer Copper/Polyimide Clads [36]
D. Coulman and J. Edman, Du Pont Company.....212

New Technology for High Rate Thick Film Deposition [37]
I. Baxter, General Vacuum Equipment, United Kingdom.....218

Metallization of Elastic Nonwoven Webs [38]
B. Cohen, Kimberly-Clark Corporation.....227

Advanced Processing Techniques

Effect of Anode Location on Deposition Profiles for Long Rotatable Magnetrons [39]
P. Sieck, Airco Coating Technology.....233

Non-CFC Drying Technologies [40]
J.H. Schleckser, Ney Ultrasonics Inc.......237

Use of Vapor Deposited Acrylate Coatings to Improve the Barrier Properties of Metallized Film [41]
D.G. Shaw and M.G. Langlois, Catalina Coatings, Inc......240

Optical Properties of Undoped & CaF₂-Doped Yttrium Fluoride and Ytterbium Fluoride Coatings Fabricated by Conventional & Ion-Assisted Deposition [42]
M.R. Jacobson, Optical Data Associates and University of Arizona ; S.F. Feiman, EM Industries;
Z. Tianji, University of Arizona; and H.A. Macleod, Thin Film Center and University of Arizona .....248

Electrochromic Half-Cells on Organic Substrate Produced by Subsequent Deposition of ITO and WO₃ in a Roll Coater Using Optical Plasma Emission Monitor ing [43]
P. Lippens, N.V. Bekaert S.A., Belgium; and P. Verheyen, Innovative Sputtering Technology, Belgium.....254

Emerging Technologies

Reactive Gas Plasma Treatment of Polymer Films to Improve Capacitive Energy Storage [44]
A. Yializis, Sigma Labs Inc.; M. Binder and R.J. Mammone, U.S. Army Research Laboratory.....263

Ion Beam Assisted Deposition for Optical Coatings: R&D to Production [45]
J.K. Hirvonen, U.S. Army Research Laboratory.....269

Pulsed-DC Reactive Sputtering - New Opportunities [46]
M.E. Graham and W.D. Sproul, BIRL, Northwestern University.....275

Monitoring PVD Metal Vapors Using Laser Absorption Spectroscopy [47]
D.G. Braun, T.M. Anklam, L.V. Berzins and K.G. Hagans, Lawrence Livermore National Laboratory .....280

Plasma-Assisted Deposition of Dielectric Films by Using a Hollow Cathode Plasma [48]
M. Falz, G. Leonhardt and R. Wilberg, VTD Vakuumtechnik Dresden GmbH , Germany.....285

Thin Film Media

An Overview of Al and Al Alloys Used in CD Manufacturing [49]
D. Plaisted and J. Rissala, Soleras Ltd......291

PECVD Carbon Overcoat for Magnetic Media [50]
J. Bartella, B. Cord, M. Geisler and H. Zahel, Leybold AG, Germany.....299

A New Sputtering System for Hard Disk Media [51]
D. Lavine, Intevac Inc......307

Advances in Arc Handling in Reactive and Other Difficult Processes [52]
R.A. Scholl, Advanced Energy Industries, Inc......312

In-Line Sputtering Equipment for Minidisc Production [53]
T. Yasar, Materials Research Corporation.....317

Thin Film Technology for Optical Discs [54]
G. Strasser, D. Bernegger, C. Candrian, F. Gassmann, P. Tinner, S. Voser, Balzers AG, Principality of Liechtenstein; and W.F. Graham, Balzers.....323

Decorative and Protective Coating

Specifying Lacquers for Vacuum Metallization of Plastics [55]
G. Lezzer and A. Drybanski, Marbo Italia, Italy.....331

New Process Technology and System Concept for Decorative Hard Coating of Large Parts at Low Temperature [56]
D. Hofmann, M. Baehr, H. Bennecker, S. Kunkel and A. Rack, Leybold AG, Germany.....336

Diffusion Pump System and its Operation [57]
M.H. Hablanian, Varian Vacuum Products.....340

Deposition of (Ti,Al)N Films onto Tool Steel by Reactive R.F. Magnetron Sputtering [58]
C-T. Huang and J-G. Duh, National Tsing Hua University , Taiwan.....344

Just-In-Time Coater Concept for Coating of Plastic Parts [59]
D. Hofmann, G. Ickes, U. Patz and R. Kukla, Leybold AG , Germany.....350

Troubleshooting the Batch Vacuum Metallized Part [60]
K. Anetsberger and J. Stava, Midwest Tungsten Service, Inc.......355

Plasma Processing

Deposition of Diamond-Like Carbon Films on Polycarbonate by ECR-PECVD Method [61]
Y-T. Hwang, J.C.S. Chu, Union Chemical Laboratories, ITRI , Taiwan; and B.S. Mercer, PlasmaQuest Inc.,.....363

Large Area ECR Processing [62]
L. Bourget, ASTeX/Applied Science and Technology, Inc. ; and B. Lane, Plasma Dynamics, Inc......369

Applications of Numerical Modelling to Plasma Processing [63]
G.G. Lister, CRL, United Kingdom.....375

Optimization of ECR-Based PECVD Oxide Films for Superconducting Integrated Circuit Fabrication [64]
J.E. Sauvageau, C.J. Burroughs, M.W. Cromar and J.A. Koch, National Institute of Standards and Technology.....383

Self-Sputtering with DC Magnetron Source: Target Material Consideration [65]
Z.J. Radzimski, North Carolina State University ; and W.M. Posadowski, Technical University of Wroclaw , Poland.....389

Process Control and Instrumentation

Low Process Productivity Caused by Widely Used Vacuum Gauges [66]
P.C. Arnold and M. Ham, Granville-Phillips Company.....397

Vacuum Coating Process Control via In Situ Measurement [67]
J.C. Harlan and R.R. Comtois, ASOMA Instruments, Inc......403

Long Term Measurement Stability of an Inverted Magnetron Cold Cathode Gauge [68]
D.L. Hyatt and N.T. Peacock, HPS Division of MKS Instruments, Inc......409

Human Interface Design for Optical and Resistivity Monitors [69]
J.K. Zelisse and S. Draaijer, Delft Measurement Systems , The Netherlands.....413

Large Area Rigid Coating

X-Ray Photoelectron Spectroscopy Study of Sodium Ion Migration through Thin Films of SiO₂ Deposited on Sodalime Glass [70]
W. Baouchi, Donnelly Applied Films Corporation.....419

Metal Ion Beams for Sputter Cleaning and Deposition Assistance [71]
J.R. Treglio and A.J. Perry, ISM Technologies, Inc......424

The Evolution of Durable, Silver-Based, Low Emissivity Films Deposited by D.C. Magnetron Sputtering (ZnO to Si₃N₄) [72]
R.E. Laird and J.D. Wolfe, Airco Coating Technology.....428

Structure and Performance of ITO Sputtering Targets [73]
B.G. Lewis, Arconium Specialty Alloys; R. Mohanty and D.C. Paine, Brown University.....432

Comparison of Diffuse versus Specular Calibration Standards when Measuring the Reflection of Coated Glass [74]
M.L. Logan, Marcon Coatings Inc......440

In-Line Large Area Coater with Multifunction Cathodes [75]
G.A. Garzino-Demo and F.L. Lama, Braink A.G. , Principality of Liechtenstein.....443

Vendor Session

PPT Series Residual Gas Analyzers and Sampling Systems [76]
J.V. Welch, NGS Division of MKS Instruments, Inc......451

The Real Markets for Transparent Barrier Films [77]
H.L. Allison, PC Materials, Inc......458

Programmable EB Gun Sweep Generator [78]
M.T. Supple, DynaVac.....459

The Extraction of n, k, d and n Data for Films [79]
A. Macleod and C. Clark, Thin Film Center Inc......460

Marathon Crystals: An Innovative Quartz Crystal Design Dramatically Increasing Crystal Life for Dielectric Coatings [80]
M. Platt, Leybold Inficon Inc......463

The Balzers PLS 500/570 Laboratory Coating System [81]
R. Hellmer, Balzers .....465

The Values of On-Line Predictive Maintenance [82]
W.D. Yantz, Monitoring Technology Corporation.....466