1992 35th Technical Conference Proceedings

Note: Number in brackets on the top line is the paper number for 1992.

Plenary Session

Thin Films on Glass: Challenges and Opportunities in the Nineties [1]
K. Sono, Nippon Sheet Glass Company, Ltd., Japan.....3

Vapor Deposition Present and Future [2]
J.J. Cuomo, C. Narayan and S. Purushothaman, IBM Corporation.....10

The Transition of Technology from R&D to Production [3]
D.M. Mattox, IP Industries.....14

Vacuum Web Coating

Uses of Web Coated Materials in Flexible Packaging [4]
A.A. Broomfield, General Vacuum Equipment.....21

New Colourless Barrier Coatings (Oxygen & Water Vapor Transmission Rate) on Plastic Substrates [5]
C. Misiano, E. Simonetti, F. Staffetti and G. Taglioni, Centro Technologie del Vuoto, Italy; and F. Rimediotti, Galileo Vacuum Tec SpA, Italy.....28

Packaging Markets for Metallized Films and Papers [6]
A.L. Brody, Rubbright · Brody, Inc......42

Recent Developments in Metallized Films for Microwave Heating and Computer Simulation of the Same [7]
G.J. Walters, Advanced Dielectric Technologies, Inc......48

Matching Barrier Requirements for Processed Food Packaging [8]
T.J. Dunn, Printpack, Inc......54

A Comparison of SiO₂ Barrier Coated Polypropylene to Other Coated Flexible Substrates [9]
L. Wood and H. Chatham, Airco Coating Technology.....59

Investigation of Curl and Residual Stress in Metallized Polyimide [10]
K.J. Blackwell, P.C. Chen and A.R. Knoll, IBM Corporation ; and J.Y. Kim, University of Michigan.....64

Metallized Polymeric Webs for Flexible Circuitry [11]
R.D. Weale, L.J. Matienzo, K.J. Blackwell and A.R. Knoll, IBM Corporation.....70

Scale-Up of Plasma Deposited SiO_x Gas Diffusion Barrier Coatings [12]
R.J. Nelson, Airco Coating Technology.....75

Studies on Characteristics of ITO Target Materials [13]
R. Yoshimura, N. Ogawa, T. Iwamoto and T. Mouri, Tosoh Company, Ltd., Japan.....80

Evaporation Boats - Investigations on the Electrical Properties [14]
B. Ruisinger, H. Kölker, M. Mohr and S. Müller, Elecktroschmelzwerk Kempten GmbH, Germany.....84

Fluoropolymer Filled SiO₂ Coatings; Properties and Potential Applications [15]
B.A. Banks, K.K. de Groh and S.K. Rutledge, NASA Lewis Research Center; C. LaMoreaux and R. Olle,
Cleveland State University.....89

Experiences of Operating a Closed-Loop Feedback Control System on a Vacuum Web Coater [16]
J. Brandenburg and C. Finsted, Union Industries; and M. Farrell, General Vacuum Equipment.....94

Integral Computer Control of Roll to Roll Coaters [17]
C. Beccaria, A. Pasqui and F. Rimediotti, Galileo Vacuum Tec SpA , Italy.....100

Effective Film Temperature Control for Vacuum Web Coaters [18]
I.K. Baxter, General Vacuum Equipment, United Kingdom.....106

State-of-the-Art and Economy of Aluminum and Non-Aluminum Barrier Coatings [19]
E. Hartwig, J. Meinel, T. Krug and G. Steiniger, Leybold AG, Germany.....121

Economical Considerations on Modern Web Sputtering Technology [20]
S. Beisswenger, T. Krug, R. Kukla, R. Ludwig and M. Luebbehusen, Leybold AG, Germany.....128

Air-To-Air Metallizer: Design and Operational Data [21]
T. Taguchi, S. Kamikawa and Y. Ito, Mitsubishi Heavy Industries, Ltd. , Japan; M. Mitarai and K. Matsuda,
Meiwa Pax Company, Ltd., Japan.....135

Optical Coating

New Materials for Production of Optical Coatings [22]
M. Friz and F. Koenig, E. Merck, Germany; and S. Feiman, EM Industries.....143

Product Requirements for an Ophthalmic Anti-Reflective Coating [23]
T.R. Reynolds, LensCrafters.....150

In-Line DC Sputter Production of Broad Band Anti-Reflection Coatings [24]
S.C. Schulz, Airco Coating Technology.....152

Process Control Ultrasonics [25]
J.H. Schleckser, J.M. Ney Company .....159

Weather Resistant Aluminum Mirrors with Enhanced UV Reflectance [26]
K.H. Guenther, C. Lee, X-F. Han and K. Balasubramanian, University of Central Florida; and G.J. Jorgensen, National Renewable Energy Laboratory.....165

Survey of Available Potential Replacements for Thorium Fluoride [27]
S.M. McNally and S.D. Feiman, EM Industries ; M. Friz, E. Merck, Germany; A.R. Wilson and B. Kinsman, Merck, Ltd., United Kingdom.....169

Abrasion Resistant Diamond-Like Carbon Films for Optical Applications [28]
B.J. Knapp and F.M. Kimock, Diamonex, Inc......174

Understanding and Using Fourier Transform Thin Film Design without Advanced Calculus [29]
R.R. Willey, Opto Mechanik, Inc.....180

A Study of Thin Film Interference Filters for Use in Heads Up Displays and for Laser Eye Protection [30]
A. Gibson and D. Morton, IMO/Varo-OSD.....185

Increase Productivity with a New Deposition Controller [31]
C. Cipro, C. Gogol, A. Wajid and J. Kushneir III, Leybold-Inficon.....191

Decorative and Protective Coating

Pollution Issues in Substrate Cleaning for the Coating Industry [32]
I.S. Goldstein, Providence Metallizing Company, Inc......199

Maximum Life from Tungsten Filaments [33]
W. Graham, W. Graham Associates, Inc......202

Decorative Vacuum Metallizing for the Cosmetic Industry [34]
N.L. Maconi, Terkelsen Molding Company.....206

Dry Blast for UV and Coatings Removal [35]
B.E. Drust, Maxi-Blast, Inc......211

Sputter Ion Plating with Plasma Boosters - A Breakthrough in Hard CoatingTechnology [36]
D. Hofmann, P. Ballhause and A. Feuerstein, Leybold AG, Germany; and J. Snyder, Leybold Technologies, Inc......218

Emerging Technologies

Metal-Mode Reactive Sputtering: A New Way to Make Thin Film Products [37]
J.W. Seeser, P.M. LeFebvre, B.P. Hichwa, J.P. Lehan, S.F. Rowlands and T.H. Allen, Optical Coating Laboratory, Inc......229

Unbalanced Magnetron Sputtering [38]
W.D. Sproul, BIRL, Northwestern University.....236

Unbalanced Magnetrons: Their Impact on Modern PVD Hard Coating Equipment [39]
W.D. Münz, Hauzer Techno Coating Europe B.V. , The Netherlands.....240

Jet Vapor Deposition of Thin Films [40]
B.L. Halpern, J.J. Schmitt, J.W. Golz, Y. Di, D.L. Johnson, D.T. McAvoy and J.Z. Zhang, Jet Process Corporation.....249

Diamond: From Sunglasses to Supercolliders [41]
C.J. Russell, Diamond Depositions, Superconductivity Publications, Inc......254

Diamond-Like-Carbon for Plastics [42]
B.K. Daniels, Monsanto Company.....260

Ion Beam Assisted Deposition: An Emerging Technology [43]
J.K. Hirvonen, R.M. Middleton and M. Levy, US Army Materials Technology Laboratory.....266

Plasma Processing

Plasma Processes in the Plastics Industry [44]
S.L. Kaplan, Himont/Plasma Science.....273

Enhancement of Chromium-to-Polyimide Adhesion by Oxygen DC Glow Treatment Prior to Roll-Sputter Seeding [45]
K.J. Blackwell, F.D. Egitto and A.R. Knoll, IBM Corporation.....279

Grounding Plasma Systems [46]
T. Kerr, Advanced Energy Industries, Inc......284

Process Control and Instrumentation

Modeling and EDS Measurements of Through-Hole Coverage in Sputtered and Evaporated Polyimide Webs [47]
K.J. Blackwell, R.H. Katyl and D.C. Van Hart, IBM Corporation.....293

A Prototyping Environment for Vacuum System Design [48]
L.M. Garverick, Essential Research, Inc......302

Neural-Network-Based Instrumentation and Control for Thin Film and Coating Processes [49]
A. Guha, Honeywell Sensor and System Development Center.....307

New Sensor Technology Permits Measurement of Plasma Impedance with High Accuracy and Repeatability [50]
R.A. Scholl, Advanced Energy Industries, Inc......313

Application of Optical Emission Diagnostics and Control Related to Deposition Processing [51]
B.P. Barney, ITC; G.C. Valoria, SC Technology, Inc.; and E. Lopata, Himont/Plasma Science.....319

A New Technique for Arc Control in DC Sputtering [52]
L. Anderson, Halmar Electronics, Inc......325

Calibration of Mass Flow Controllers in Production Environments [53]
R. Jacobs, MKS Instruments, Inc......330

Large Area Rigid Coatings

Meter Square Plastic Windows Coated by Plasma Polymerization [54]
R. Wielonski.....339

Optical Considerations in Thin Film Electrochromic Devices [55]
G. Caskey, D. Roberts, M. Hansen, D. Betz and M. Catlin, Donnelly Corporation.....345

High Volume Sputtered Optical Coatings on Large Rigid Substrates [56]
E. Bjornard, Viratec Thin Films, Inc......351

A Modular Approach to Sputter Coating of Flat Panel Displays [57]
H.I. Foster and W.T. Read, Innotec Group, Inc......357

Deposition of ZnO:Al Transparent Conductive Thin Films by DC Magnetron Sputtering [58]
N. Ogawa, R. Yoshimura, T. Iwamoto and T. Mouri, Tosoh Corporation, Japan; T. Minami, H. Sato and S. Takata, Kanazawa Institute of Technology, Japan.....362

Enhanced Chromium First Surface Mirrors [59]
S.J. Nadel and T.Van Skike, Airco Coating Technology.....365

Thin Film Media

Advances in Compact (CD) and Mini-Disc (MD) Metallization Technology [60]
G. Strasser and G. Oesterle, Balzers AG, Principality of Liechtenstein; and W.F. Graham, Balzers.....373

System Integration of Sputtering Power Supplies [61]
T. Kerr, Advanced Energy Industries, Inc......377

A New Single Disk Coating System for Magnetic Disks [62]
S. Schulz, B. Cord and H. Zahel, Leybold AG , Germany.....382

Nickel Sputtering for Optical Disc Mastering [63]
G. Strasser, D. Bernegger and R. Stucky, Balzers AG , Principality of Liechtenstein; and W.F. Graham, Balzers.....388

Process Improvements for Sputtering Carbon and Other Difficult Materials Using Combined AC and DC Process Power [64]
R.A. Scholl, Advanced Energy Industries, Inc......391

Contamination Control

Certification of Ultra-Clean Distribution Systems at the PPT Level with APIMS [65]
K. Siefering, H. Berger and W. Whitlock, Airco, a member of The BOC Group.....397

New Adhesion Technology with the Dry Plated Thin Films of Cobalt Alloys [66]
M. Yoshikawa, H. Sugiyama, Y. Kusano, S. Akiyama, K. Naito and T. Honda, Bridgestone Corporation, Japan.....405

Contamination Control and Reduction Through Dry Ice Media Blast Cleaning [67]
M.W. Lewis, Cold Jet, Inc......411

Obtaining Molecularly Clean Surfaces by Plasma Processing [68]
A. Ribner, Plasmatic Systems, Inc. .....414

Special Presentation

Technology Outreach [69]
D. Beeson, Lawrence Livermore National Laboratory.....419

Vendor Sessions

High Speed Throttle Valve with Versatile, Self-Tuning, Adaptive Controller for Vacuum System Pressure and Flow Control [70]
H. Gray, Edwards High Vacuum International.....423

Mitsubishi Air-to-Air Metallizer [72]
T. Taguchi, S. Kamikawa and Y. Ito, Mitsubishi Heavy Industries, Ltd., Japan; K. Matsuda and M. Mitarai,
Meiwa Pax Company, Ltd., Japan.....424

Balzers GSM-420 Optical Monitoring System [72]
R. Esposito, Balzers.....427

High Performance Capacitance Diaphragm Gauge for Measurement and Control of Pressure from the Low Millitorr Range to 1000 Torr [73]
H. Gray, Edwards High Vacuum International.....429

User Programmable Electron Beam Sweep Supply [74]
C.R. Vogel, Eddy Company.....430

Manufacturing Precious Metal Sputtering Targets [75]
H.M. Boyton, Handy & Harman.....431