2004 47th Technical Conference Proceedings

Plenary Session

Electrospray: Wings for Molecular Elephants [1]
Plenary Speaker: Professor J.B. Fenn, Virginia Commonwealth University, Richmond, VA
Executive Summary provided by: V.A. Shamamian, Dow Corning Corp., Midland, MI ..... 3

Keynote Presentation

Essence of UHV Technology in Surface Processing Systems [2]
C. Hayashi, ULVAC, Inc., Chigasaki, Kanagawa, Japan ..... 11

Special Presentation

Vacuum Coating—An Enabling Technology [3]
D.M. Mattox, Management Plus, Inc., Albuquerque, NM ..... 23

Process Control & Instrumentation

Modeling of Sputtering Equipment, Process and Film Growth as an Engineering Tool: Building a Virtual Sputter Tool [4]
J.C.S. Kools, Veeco Instruments, Fremont, CA ..... 31

Effective Closed-Loop Control for Reactive Sputtering Using Two Reactive Gases [5]
D.C. Carter, W.D. Sproul, and D.J. Christie, Advanced Energy Industries, Inc., Fort Collins, CO ..... 37

Flexible Reactive Gas Sputtering Process Control [6]
V. Bellido-González, B. Daniel, J. Counsell, and M. Stevens, Gencoa Ltd., Liverpool, United Kingdom; and E. Momeñe, Cromo Duro, Bilbao, Spain ..... 44

Stabilizing RF Generator and Plasma Interactions [7]
V. Brouk and R. Heckman, Advanced Energy Industries, Inc., Fort Collins, CO ..... 49

Computer Aided Design of Optical Transmittance and Electromagnetic Shielding Efficiency on Conductive Anti-Reflection Coating [8]
S.M. Yang and J.C. Yang, Department of Aeronautics and Astronautics, National Cheng Kung University, Taiwan ..... 55

Fundamentals of Feedback Control for Reactive Sputtering [9]
M.A. George and E.A. Craves, Deposition Sciences Incorporated, Santa Rosa, CA; and R. Shehab and K. Knox, Ametek Incorporated, Pittsburgh, PA ..... 62

Combination Gauges: Responding to the Technological Challenges [10]
S.J. Smith and P.M. Rutt, Helix Technology Corporation, Granville-Phillips Product Center, Boulder, CO ..... 67

High Accurate In Situ Optical Thickness Monitoring for Multilayer Coatings [11]
A. Zoeller, M. Boos, H. Hagedorn, W. Klug, and C. Schmitt, Leybold Optics GmbH, Alzenau, Germany ..... 72

Emerging Technologies

Optical Coatings for Special Effect Pigments [12]
G. Pfaff, Merck KGaA, Darmstadt, Germany ..... 79

Ion Assisted vs. Plasma Assisted PVD: Preparation of Optical Multilayers in a Versatile Cluster System Implementing Electron Beam and Sputter Technology [13]
U. Beck, A. Hertwig, G. Reiners, M. Weise, Bundesanstalt für Materialforschung und -prüfung (BAM), Division VIII.2 Surface Technology, Berlin, Germany; and J. Hartung, E. Reinhold, and J. Strümpfel, VON ARDENNE Dresden, Dresden, Germany ..... 86

Hot Hollow Cathode Arc Deposition of Highly Oriented Chromium and Chromium Nitride Films [14]
L. Bárdos and H. Baránková, Uppsala University, Angstrom Laboratory, Uppsala, Sweden ..... 91

The Reactive Sputter Deposition of Aluminum Oxide Coatings Using High Power Pulsed Magnetron Sputtering (HPPMS) [15]
W.D. Sproul, D.J. Christie, and D.C. Carter, Advanced Energy Industries, Inc., Fort Collins, CO ..... 96

Industrial Precision Deposition for Microelectronics and Next Generation Hard Disk [16]
J. Berthold, Fraunhofer IWS, Dresden, Germany; W. Hentsch, FHR Anlagenbau, Ottendorf-Okrilla, Germany; H. Hilgers, IBM Germany, Mainz, Germany; T. Schülke, Fraunhofer USA; P. Siemroth, Arc Precision GmbH, Dresden, Germany; S. Seifried, UNAXIS Balzers, Liechtenstein; and C. Wenzel, TU Dresden, Dresden, Germany ..... 101

Characterization of RF Polymer Sputtering by Ion Mass Spectrometry [17]
M. Misina, Academy of Sciences of the Czech Republic, Prague, Czech Republic; H. Koshelyev, Czech Technical University, Prague, Czech Republic; H. Biederman, A. Choukourov, D. Slavinska, Charles University, Prague, Czech Republic; and E. Fuoco, A. Bowers, and L. Hanley, University of Illinois at Chicago, Chicago, IL ..... 108

A Novel Pulsed Supply With Arc Handling and Leading Edge Control as Enabling Technology for High Power Pulsed Magnetron Sputtering (HPPMS) [18]
D.J. Christie, W.D. Sproul, D.C. Carter, and F. Tomasel, Advanced Energy Industries, Inc., Fort Collins, CO ..... 113

Continuous, Substrateless Production of Nanoparticles and Nanosheets [19]
W.C. Kittler, Jr., Gnomic Enterprises, Rohnert Park, CA ..... 119

p-Type Sb-doped ZnO Thin Films Prepared with Filtered Vacuum Arc Deposition [20]
T. David, S. Goldsmith, and R.L. Boxman, Electrical Discharge and Plasma Laboratory, Tel Aviv University, Tel Aviv, Israel ..... 122

Heuréka! Post-Deadline Recent Developments Session

Electromechanics of a Highly Flexible Transparent Conductor for Display Applications [21]
J. Lewis, S. Grego, B. Chalamala, E. Vick, and D. Temple, MCNC Research and Development Institute,
Research Triangle Park, NC ..... 129

Quality of Plasma Polymerized Corrosion Resistant Layers of New Materials in Large Scale Coating Machines for Car Reflectors [22]
K. Nauenburg, P. Fiedler, W. Dicken, G. Deppisch, K. Kruse, and G. Ickes, Leybold Optics GmbH,
Alzenau, Germany ..... 134

Stress Reduction in Sputter Deposited Thin Films Using Physically Self-Assembled Nanostructures as Compliant Layers [23]
T. Karabacak, J.J. Senkevich, G.-C. Wang, and T.-M. Lu, Department of Physics, Applied Physics
and Astronomy, Rensselaer Polytechnic Institute, Troy, NY ..... 138

Internal ICP Assisted Magnetron Sputtering for Fast Deposition at Low Pressure (10-4 mbar range) in Semi Industrial Coating Chamber (0.1 m³) [24]
C. Nouvellon, J.P. Dauchot, Y. Paint, F. Monteverde, and M. Hecq, Materia Nova, Mons, Belgium ..... 146

Vacuum Deposition of Thick Multilayers on Thin Flexible Polymer Substrates [25]
N. Magriotis, Arcotronics Nissei Group, Sasso Marconi, Italy; and G. Comini, Department of Energy and Fluid Machinery, University of Udine, Italy ..... 150

Modeling of the Film Thickness Distribution Along Transport Direction in In-line Coaters for Reactive Sputtering [26]
A. Pflug and B. Szyszka, Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany; and M. Geisler, A. Kastner, C. Braatz, U. Schreiber, and J. Bruch, Applied Films GmbH & Co. KG, Alzenau, Germany ..... 155

Sputtering of Very Thin Pd-alloy Hydrogen Separation Membranes [27]
H. Klette and R. Bredesen, Sintef Materials Technology, Oslo, Norway ..... 161

Recent Developments in Measuring Permeation Through Barrier Films and Understanding of Permeation Processes [28]
H. Nörenberg, Technolox Ltd., Oxford, United Kingdom; and V.M. Burlakov, Department of Materials, University of Oxford, Oxford, United Kingdom ..... 164

Aluminum Soldering Performance Testing of H₁₃ Steel as Boron Coated by the Cathodic Arc Technique [29]
G. Mackiewicz Ludtka and V.K. Sikka, Oak Ridge National Laboratory, Oak Ridge, TN; and J.M. Williams, C.C. Klepper, R.C. Hazelton, and E.J. Yadlowsky, HY-Tech Research Corporation, Radford, VA ..... 168

New Modular Roll-to-Roll PVD Web Coater For Clean Room Production [30]
R. Kukla, H.G. Lotz, R. Ludwig, and P. Sauer, Applied Films GmbH & Co. KG, Alzenau, Germany ..... 174

Innovative Production of High Quality Optical Coatings for Applications in Optics and Optoelectronics [31]
M. Scherer, J. Pistner, and W. Lehnert, Leybold Optics GmbH, Alzenau, Germany ..... 179

High Power Pulsed Reactive Sputtering of Zirconium Oxide and Tantalum Oxide [32]
D.A. Glocker and M.M. Romach, Isoflux Incorporated, Rochester, NY; and D.J. Christie and W.D. Sproul, Advanced Energy Industries, Fort Collins, CO ..... 183

Special Joint Session

Influence of DC and MF Sputter Technology on the Properties of ITO Layers on PET Film [33]
H.-G. Lotz, P. Sauer, R. Kukla, M. Liehr, and J. Schröder, Applied Films GmbH & Co. KG, Alzenau, Germany ..... 189

AR Coatings by Plasma Enhanced CVD on Flexible Substrates [34]
O. Sakakura, T. Nakajima, and T. Oboshi, Dai Nippon Printing Co. Ltd., Kashiwa-shi, Japan ..... 194

Slightly Conductive Transparent Films for Space Applications—Manufacturability and Durability [35]
N. Uppala, J. Griffin, J. Vemulapalli, and P.D. Hambourger, Cleveland State University, Cleveland, OH ..... 199

Large Area Coating

Saving $40B Per Year—Performance Needs for Energy Efficient Coated Glazings in Buildings [36]
S. Selkowitz, Building Technologies Department, Lawrence Berkeley National Laboratory, Berkeley, CA ..... 207

Reactive Pulsed Magnetron Sputtering of SiO2-Influence of Process Parameters on Layer Properties [37]
R. Nyderle, V. Kirchhoff, R. Vanecek, and H. Sahm, Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (FEP), Dresden, Germany ..... 209

High Power Pulse Reactive Sputtering of TiO2 [38]
J.A. Davis, Applied Films, Inc., Longmont, CO; W.D. Sproul and D.J. Christie, Advanced Energy Industries, Inc., Fort Collins, CO; and M. Geisler, Applied Films GmbH, Alzenau, Germany ..... 215

Plasma Emission Monitoring of Low Rate Materials on Rotating Cylindrical Magnetrons [39]
P. Greene and S. Nadel, VON ARDENNE Coating Technology, Fairfield, CA ..... 219

Enhancements to Rotating Cylindrical Magnetrons [40]
J. Rietzel and S. Nadel, VON ARDENNE Coating Technology, Fairfield, CA ..... 224

Latest Developments of Large Area Coater and Application [41]
M. Geisler, C. Braatz, J. Bruch, A. Kastner, R. Newcomb, A. Reus, G. Kleideiter, and M. Englert, Applied Films GmbH Co. KG, Alzenau, Germany ..... 231

Arc Management in DC and MF Generators for Large Area Coating Systems [42]
T. Rettich, P. Wiedemuth, Hüttinger Elecktronik GmbH + Co. KG, Freiburg, Germany; and L. Anderson,
Huettinger Electronic, Inc., Farmington, CT ..... 237

Effects of Methods of Manufacturing Sputtering Targets on Characteristics of Coatings [43]
J.J. Finley and S.D. Walck, PPG Glass Technology Center, PPG Industries, Inc., Pittsburgh, PA; and E. Bono, Crucible Research, A Division of Crucible Materials Corporation, Pittsburgh, PA ..... 241

Rotatable ZnO Targets—A New Generation of Ceramic Targets [44]
G. Hüttl and K. Schwarz, FNE Forschungsinstitut für Nichteisen-Metalle Freiberg GmbH, Freiberg,Germany; and K. Böhme and F. Jürgens, Fremat GmbH & Co. KG, Freiberg, Germany ..... 252

Sputtering of Conductive ZAO Films from Metallic and Ceramic Targets using Planar and Cylindrical Magnetrons [45]
F. Milde, M. Dimer, J. Fiukowski, J. Strümpfel, VON ARDENNE Anlagentechnik GmbH, Dresden, Germany ..... 255

New Sputtering Targets: to Test or Not to Test? [46]
J.O. McGeever, Technology Assessment International, Cranberry Township, PA ..... 261

Characterization of the Electron Movement in Varying Magnetic Fields and the Resulting Anomalous Erosion [47]
G. Buyle, D. Depla, K. Eufinger, J. Haemers, and R. De Gryse, Ghent University, Ghent, Belgium; and W. De Bosscher, Bekaert Advanced Coatings (Bekaert VDS), Deinze, Belgium ..... 265

Influence of Rotating Magnets on Hysteresis in Reactive Sputtering [48]
O. Kappertz, T. Nyberg, D. Rosén, and S. Berg, Solid State Electronics, The Ångström Laboratory, Uppsala University, Uppsala, Sweden ..... 271

Optimizing AC Switching Parameters for Rotating Cylindrical Magnetron Sputtering [49]
A. Blondeel, Bekaert Advanced Coatings, Deinze, Belgium; and W. De Bosscher, Bekaert Advanced Coatings, Zulte, Belgium ..... 276

Cylindrical Magnetron Sputter Deposition of Chromium Coatings for Erosion and Wear Resistant Application [50]
K. Truszkowska, M. Wotzak, F. Yee, G.N. Vigilante, and M. Cipollo, US Army Armament Research, Development and Engineering Center, Benét Laboratories, Watervliet, NY ..... 282

High Rate Evaporation of Alloys [51]
J.P. Zijp, J.F.M. Velthuis, and J.L. Linden, TNO TPD, Delft, The Netherlands ..... 289

Optical Coating

Advanced TCO and CIS Coatings Through the Pulsed Magnetron Sputtering of Powder Targets [52]
P.J. Kelly, Y. Zhou, J. Hisek, and R.D. Pilkington, School of Computing Science and Engineering, University of Salford, Salford, United Kingdom ..... 295

Reactive Low Voltage Ion Plating Plasma Assisted (RLVIPPA): A New Perspective for Optical Coatings [53]
C. Misiano, Romana Film Sottili S.R.L., Anzio, Italy; and S. Schlichtherle and H.K. Pulker, University of Innsbruck, Innsbruck, Austria ..... 300

Multilayer Protective Coatings for Polycarbonates Prepared by Plasma Enhanced CVD [54]
Z. Kucerová*, L. Zajícková, and V. Bursíková, Department of Physical Electronics, Masaryk University, Brno, Czech Republic ..... 304

Developments in Materials and Processes: Key to Advances in Thin Film Design [55]
J.A. Dobrowolski, Institute of Microstructural Sciences, National Research Council of Canada, Ottawa, Ontario, Canada ..... 310

Broadband Antireflection Coating Design Recommendations [56]
R.R. Willey, Willey Optical, Consultants, Charlevoix, MI ..... 322

The Production of Ultra-Low Loss AR Coatings [57]
I. Stevenson and G. Sadkhin, Denton Vacuum, LLC, Moorestown, NJ ..... 328

Application of Ion Beam Assisted Thin Film Deposition Techniques to the Fabrication of a Biosensor Chip With Fieldability Potential for Important Biohazard Detection Applications [58]
D. Lloyd, Loats Associates, Westminster, MD; L. Hornak and S. Pathak, West Virginia University, Morgantown, WV; D. Morton, Denton Vacuum, LLC, Kemp TX; and I. Stevenson, Denton Vacuum, LLC, Moorestown, NJ ..... 334

Light Scattering, Photothermal Microscopy and Laser Damage of Optical Interference Coatings [59]
C. Amra, M. Commandre, C. Deumié, and J.Y. Natoli, Institut Fresnel, Marseille, France ..... 340

Optical Response from Metal/Dielectric Nanocomposite Thin Films Systems Modified by Heavy Ion Irradiation [60]
J.-M. Lamarre* and L. Martinu, Department of Engineering Physics, École Polytechnique de Montréal, Montréal, Canada; and Z. Yu, C. Harkati, and S. Roorda, Physics Department, Université de Montréal, Montréal, Canada ..... 343

Structural Characterization of Wurtzite Al1-xInxN (0.1<x<0.9) Grown by Dual Reactive DC Magnetron Sputter Deposition [61]
T. Seppänen and P.O.Å. Persson, Thin Film Physics Div., Department of Physics and Measurement Technology (IFM), Linköping University, Linköping, Sweden; G.Z. Radnóczi and B. Pécz, Thin Film Physics Div., Department of Physics and Measurement Technology (IFM), Linköping University, Linköping, Sweden and Research Institute for Technical Physics and Materials Science (MFA) of the Hungarian Academy of Sciences, Budapest, Hungary; and L. Hultman and J. Birch, Thin Film Physics Div., Department of Physics and Measurement Technology (IFM), Linköping University, Linköping, Sweden ..... 347

Versatile Reactive Sputtering Batch Drum Coater with Auxiliary Plasma [62]
M.A. George, H.R. Gray, N. Boling, and E. Krisl, Deposition Sciences Incorporated, Santa Rosa, CA ..... 353

High Reflectivity Protected Silver Coatings on Stainless Steel and Aluminum Substrates [63]
F. Sabary, D. Marteau, P. Hamel, and H. Piombini, CEA Le Ripault, Monts, France ..... 358

Optical and Compositional Analysis of Annealed SiOx Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition [64]
T. Roschuk, J. Wojcik, and P. Mascher, Centre for Electrophotonic Materials and Devices and Department of Engineering Physics, McMaster University, Ontario, Canada ..... 362

Removing Surface Contaminants from Silicon Wafers to Facilitate EUV Optical Characterization [65]
R.E. Robinson, Department of Physics & Astronomy, University of Rochester, Rochester, NY; and R.L. Sandberg, D.D. Allred, A.L. Jackson, J.E. Johnson, W. Evans, T. Doughty, A.E. Baker, K. Adamson, and A. Jacquier, Department of Physics & Astronomy, Brigham Young University, Provo, UT ..... 368

Flexible and High Throughput Deposition of Multilayer Optical Coatings Using Closed Field Magnetron Sputtering [66]
D.R. Gibson, J.M. Walls, and I. Brinkley, Applied Multilayers Ltd., Coalville, Leicestershire, United Kingdom; and D.G. Teer, P. Teer, and J. Hampshire, Teer Coatings Ltd., Kidderminster, Worcestershire, United Kingdom ..... 377

Manufacturable Filter for CWDM’s [67]
D. Cushing, 3M Precision Optics Inc., Cincinnati, OH ..... 383

Interface Engineering of Porous/Dense Multilayers of SiN1.3: In situ Real-time Spectroscopic Ellipsometry Study [68]
A. Amassian, R. Vernhes, J.E. Klemberg-Sapieha, P. Desjardins, and L. Martinu, Regroupement québécois sur les matériaux de pointe (RQMP) and Department of Engineering Physics, École Polytechnique, Montréal, Canada ..... 389

Improving Rate Control in Electron-Beam Evaporated Optical Coatings: The Role of Arcing and Controller Tuning [69]
M. Gevelber and B. Xu, Manufacturing Engineering, Boston University, Brookline, MA; D. Smith, Vacuum Process Technology Inc., Plymouth, MA; and J. Oliver and J. Howe, Laboratory for Laser Energetics, University of Rochester, Rochester, NY ..... 395

Plasma Processing

Real-time Monitoring of Ion Energy and Ion Flux in Plasma Reactors Using RF Current and Voltage Measurements [70]
M.A. Sobolewski, National Institute of Standards and Technology, Gaithersburg, MD ..... 405

Materials Processing in Electron Beam-Generated Plasmas [71]
C. Muratore, S.G. Walton, D. Leonhardt, R.F. Fernsler, and R.A. Meger, Plasma Physics Division,
U.S. Naval Research Laboratory, Washington, DC ..... 412

Method to Design Magnetrons that Match Preferred Erosion Patterns [72]
R. Stelter, Dexter Magnetic Technologies, Inc., Fremont, CA; M. Schilling, Dexter Magnetic Technologies, Inc., Elk Grove Village, IL; A. Welk and C. Padua, Dexter Magnetic Technologies, Inc., Fremont, CA; and C. Li, and M. Devine, Dexter Magnetic Technologies, Inc., Hicksville, NY ..... 418

Cylindrical Magnetron Sputtering in a Ferromagnetic Cylinder [73]
F. Yee, M. Wotzak, M. Cipollo, and K. Truszkowska, US Army Armament Research, Development and Engineering Center, Benét Laboratories, Watervliet, NY ..... 421

High-power Pulsed dc Magnetron Discharges for Ionized High-rate Sputtering of Thin Films [74]
J. Vlcek, A.D. Pajdarova, P. Belsky, M. Kormunda, J. Lestina, and J. Musil, Department of Physics, University of West Bohemia, Plzen, Czech Republic ..... 426

Optical Emission Study of the Ionization Fractions in a High Power Pulsed Magnetron Plasma [75]
J. Böhlmark, Department of Physics, Linköping University, Linköping, Sweden; A.P. Ehiasarian and P.Eh. Hovsepian, Materials Research Institute, Sheffield Hallam University, Sheffield, United Kingdom; and U. Helmersson, Department of Physics, Linköping University, Linköping, Sweden ..... 432

Influence of Pressure and Power on the Composition and Time Evolution of Plasmas in High Power Impulse Magnetron Sputtering [76]
A.P. Ehiasarian, R. New, and P.Eh. Hovsepian, Materials Research Institute, Sheffield Hallam University, Sheffield, United Kingdom; and J. Böhlmark, J. Alami, and U. Helmersson, Department of Physics, Linköping University, Linköping, Sweden ..... 437

Microwave-Assisted DC Magnetron Sputtering [77]
S. Moh and F. Placido, Thin Film Centre, University of Paisley, Paisley, United Kingdom ..... 443

Industrial Implementation of Plasma Deposition Using the Expanding Thermal Plasma Technique [78]
M.C.M. van de Sanden, P.J. van den Oever, and M. Creatore, Department of Applied Physics, Equilibrium and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands; M. Schaepkens, T. Miebach, and C.D. Iacovangelo, General Electric Global Research Center, Schenectady, New York; R.C.M. Bosch, M. Bijker, and M. Evers, OTB Engineering B.V., Eindhoven, The Netherlands; and D.C. Schram and W.M.M. Kessels, Department of Applied Physics, Equilibrium and Transport in Plasmas, Eindhoven University of Technology, Eindhoven, The Netherlands ..... 447

Atmospheric Pressure Plasma Source for Wire Cleaning [79]
D. Korzec, M. Teschke, and E.G. Finantu, Forschungszentrum für Mikrostrukturtechnik - fmt, University of Wuppertal, Wuppertal, Germany; G. Nau, JE Plasma Consult GmbH, Wuppertal, Germany; and J. Engemann, Forschungszentrum für Mikrostrukturtechnik - fmt, University of Wuppertal, and JE Plasma Consult GmbH, Wuppertal, Germany ..... 455

Plasma Polymerization of Hybrid Organic-Inorganic Monomers in an Atmospheric Pressure Dielectric Barrier Discharge [80]
R. Rego, S. Paulussen, O. Goosens, and D. Vangeneugden, VITO - Flemish Institute for Technological Research, Mol, Belgium ..... 461

Plasma Diagnostic for Development and Optimization of Plasma Activated Deposition Processes [81]
P. Spatenka, University of South Bohemia, Ceské Budejovice, Czech Republic, and Technical University of Liberec, Liberec, Czech Republic; K.-D. Nauenburg and T. Schmauder, Leybold Optics Germany GmbH, Alzenau, Germany; and A. Kolouch, Technical University of Liberec, Liberec, Czech Republic ..... 465

Production Equipment for Plasma Enhanced CVD Permeation Barrier Coating of PET Beverage Bottles [82]
H. Grünwald, Tetra Pak Plastic Packaging R&D GmbH, Darmstadt, Germany ..... 470

Modular Linear Ion Source [83]
H.R. Kaufman, J.R. Kahn, and R.E. Nethery, Kaufman & Robinson, Inc., Fort Collins, CO ..... 477

Scale-up of Microwave Resonator Plasma Sources for Large Area [84]
H. Sung-Spitzl and R. Spitzl, iplas Innovative Plasma Systems GmbH, Troisdorf, Germany ..... 483

Industrial Size High Power Impulse Magnetron Sputtering [85]
A.P. Ehiasarian, Materials Research Institute, Sheffield Hallam University, Sheffield, United Kingdom; and
R. Bugyi, AC Sp. z o.o., Warsaw, Poland ..... 486

Tribological and Decorative Coating

Engineered Tribological Coatings [86]
D. Zhong, Colorado School of Mines, Golden, CO; K. Ho Kim and I.-W. Park, Pusan National University, Busan, South Korea; T. Dennin and B. Mishra, Colorado School of Mines, Golden, CO; E. Levashov, Moscow State Institute of Steels and Alloys, Moscow, Russia; and J.J. Moore, Colorado School of Mines,
Golden, CO ..... 493

Laser-Arc Process and Technology for Deposition of Hard Amorphous Carbon (ta-C) [87]
H.-J. Scheibe, Fraunhofer USA, Center for Coatings and Laser Applications, Michigan State University, East Lansing, MI; and B. Schultrich, Fraunhofer Institute for Material and Beam Technology, Dresden, Germany ..... 501

Replacement of Hard-Chrome in Cylinder Liners—A PVD Deposition Approach [88]
V. Bellido-González, Gencoa Ltd., Liverpool, United Kingdom; A. Igartua and G. Mendoza, Tekniker, Eibar, Spain; S. Powell, Gencoa Ltd., Liverpool, United Kingdom; M.G. Talks, QinetiQ, Farnborough, United Kingdom; and E. Momeñe, Cromo Duro, Bilbao, Spain ..... 509

The Effect of Process Parameters on the Mechanical and Microstructural Properties of Thick UMS TiN Coatings [89]
M. Bielawski, D. Seo, and R.C. McKellar, National Research Council Canada, Institute for Aerospace Research, Ontario, Canada ..... 516

Metal Plasma Immersion Ion Implantation & Deposition (MPIII&D) using a Newly Developed Plasma Source [90]
R. Wei, T. Booker, C. Rincon, and J. Arps, Southwest Research Institute, San Antonio, TX ..... 523

High Performance Colorful PVD Coatings [91]
P.Eh. Hovsepian, Sheffield Hallam University, Sheffield, United Kingdom; G.E. Gregory, CATRA, Sheffield, United Kingdom; M. Fenker FEM, Schwäbisch Gmünd, Germany; P. Nicole Naja, La Chaux du Bombrief, France; K. Schönhut, Titantec, Schwäbisch Gmünd, Germany; M. Spolding, Ibberson Ltd., Sheffield, United Kingdom; N. Jackson and E. Ehiyazaryan, Cotelere Ltd., Sheffield, United Kingdom; and W.-D. Münz, Eifeler Plasma Beschichtungs GmbH, Wien, Austria ..... 528

A Dual Approach for PVD/PECVD Coatings Costs Reduction [92]
H. Delorme, ExproHEF, Andrezieux-Boutheon, France; P. Maurin-Perrier, HEF R&D, Andrezieux-Boutheon, France; and C. Fountain, HEF USA, Columbus, OH ..... 534

Comparison of Titanium Oxide Coatings Deposited by PVD and PECVD [93]
A. Kolouch*, Sulzer Innotec, Sulzer Markets and Technology Ltd., Winterthur, Switzerland, and Technical University of Liberec, Liberec, Czech Republic; A. Macková, Nuclear Physics Institute of Academy of Sciences of the Czech Republic, Rez, Czech Republic; T. Polcar, Czech Technical University, Prague, Czech Republic; J. Krumeich, Sulzer Innotec, Sulzer Markets and Technology Ltd., Winterthur, Switzerland; P. Spatenka, Technical University of Liberec, Liberec, Czech Republic; N. Ganev, Czech Technical University, Trojanova, Czech Republic; and J. Karasek, Technical University of Liberec, Liberec, Czech Republic ..... 538

Scratch-Adhesion Durability Testing of Display Coatings [94]
N. Gitis, M. Vinogradov, and J. Xiao, Center for Tribology, Inc., Campbell, CA ..... 543

Comparison of Black Decorative PVD Coatings on Soft Substrates [95]
T. Trinh, D. Lewis, T. Hurkmans, J. Hopkins, and G.J. van der Kolk, Bodycote PVD Coatings, Greensboro, NC ..... 547

Cleaning of Parts Prior to Functional Coating in the Automotive Industry [96]
J. Strobel and R.M. Hohl, Ultrasonic Cleaning Machines (UCM) AG, Rheineck, Switzerland ..... 551

Oxygen as a Reactive Gas: Opportunities in the Decorative Coating Field [97]
M. Eerden, M. Schreurs, P. Schreurs, and R. Tietema, Hauzer Techno Coating, Venlo, The Netherlands ..... 556

Vacuum Web Coating

A New Class of Ultra-Barrier Materials [98]
J. Affinito, Consultant to Helicon Research Corporation, Tucson, AZ; and D. Hilliard, President, Helicon Research Corporation, Tucson, AZ ..... 563

Metallized Polymer Films as Replacement for Aluminum Foil in Packaging Applications [99]
W. Decker, D. Roy, C. Voght, C. Roy, and P. Dabbert, Toray Plastics (America), Inc., North Kingstown, RI ..... 594

UV Versus Electron Beam Radiation Curing of Vacuum Deposited Polymer Leveling Coatings for High Barrier Applications [100]
A. Yializis and M. Mikhael, Sigma Technologies International, Tucson, AZ ..... 600

Development of a Pilot Manufacturing Process for High Volume Catalyzation of Fuel Cell Electrodes [101]
J. Arps, B. Lanning, F. Campbell, W. Machowski, and J. Riggs, Southwest Research Institute, San Antonio, TX ..... 606

Gas Barrier Properties of Transparent Metal Oxide Coatings on PET Film [102]
B.M. Henry, H. E. Assender, A.G. Erlat, C.R.M. Grovenor, and G.A.D. Briggs, Department of Materials, University of Oxford, Oxford, United Kingdom; and T. Miyamoto and Y. Tsukahara, Technical Research Institute, Toppan Printing Co., Ltd., Saitama, Japan ..... 609

Possible Future Trends for Aluminium Metallizing [103]
C.A. Bishop, C.A. Bishop Consulting Ltd., Middlesbrough, United Kingdom ..... 615

Electron Beam Web Coating—Not Only for Consumables? [104]
R. Ludwig, G. Hoffmann, R. Kukla, H.-G. Lotz, P. Sauer, J. Schroeder and G. Steiniger, Applied Films GmbH & Co KG, Alzenau, Germany ..... 620

High Speed EB-PVD Web Coating—A New Coater Concept for New Applications [105]
E. Reinhold, M. List, H. Neumann, and C. Steuer, VON ARDENNE Anlagentechnik GmbH, Dresden, Germany ..... 625

Adhesion Promotion Techniques for Coating of Polymer Films [106]
R. Rank, T. Wuensche, M. Fahland, C. Charton and N. Schiller, Fraunhofer Institute for Electron Beam and Plasma Technology, Dresden, Germany ..... 632

Buckling or Wrinkling of Thin Webs off a Drum [107]
M.J. McCann, McCann Science, Chadds Ford, PA; D.P. Jones, Emral Ltd., Yarm, United Kingdom; and J. Affinito, Sion Power Corp., Tucson, AZ ..... 638

The Application of Reliability-Centered Maintenance 2 (RCM2) to High Volume Vacuum Thin Film Coaters [108]
A.D. Douglas Jr., Flex Products Inc. Santa Rosa, CA ..... 644

Control of Transparent Conductive and Antireflection Coating Deposition Processes [109]
E. Yadin, V. Kozlov, and E. Machevskis, Sidrabe, Inc., Riga, Latvia ..... 650

Ultra-high Barrier Coatings on Polymer Substrates for Flexible Optoelectronics: Water Vapor Transport and Measurement Systems [110]
A.G. Erlat, M. Schaepkens, T.W. Kim, C.M. Heller, M. Yan, and P. McConnelee, General Electric Global Research Center, Schenectady, NY ..... 654

Smart Materials Symposium Extended Abstracts Only Sponsored jointly by SVC and Elsevier
Reviewed papers of these abstracts are published by Elsevier in a Special Issue of Materials Science and Engineering-B (MSEB). Go to www.ScienceDirect.com and http://contentsdirect.elsevier.com.

Flexible Foils with Electrochromic Coatings: Science, Technology, and Application [111]
A. Azens, A. Avendaño, J. Backholm, L. Berggren, G. Gustavsson, R. Karmhag, G.A. Niklasson, A. Roos, and C.G. Granqvist, Department of Engineering Sciences, The Ångström Laboratory, Uppsala University, Uppsala, Sweden ..... 663

An Economic Analysis of the Deposition of Electrochromic WO₃ via Sputtering or PECVD [112]
D. Garg and P.B. Henderson, Air Products and Chemicals, Inc., Allentown, PA; and D.G. Jensen and R.E. Hollingsworth, ITN Energy Systems, Inc., Littleton, CO ..... 664

2004 Survey of United States Architects on the Subject of Switchable Glazings [113]
G.M. Sottile, Research Frontiers Incorporated, Woodbury, NY ..... 666

Electrochromic Properties of CVD MoO^₃ and MoO₃-WO₃ Films and Their Application in Electrochromic Cell [114]
T. Ivanova, K.A. Gesheva, G. Popkirov, M. Ganchev, E. Tzvetkova, Central Laboratory of Solar Energy and New Energy Sources, Bulgarian Academy of Sciences, Sofia, Bulgaria ..... 668

Characterization of Magnetron Sputtered ITO and WO₃ Films for Transparent Smart Devices [115]
V. Teixeira and H-N. Cui, University of Minho, Physics Department, Guimarães, Portugal; E. Fortunato and R. Martins, Dep. Ciência dos Materiais, CENIMAT, Caparica, Portugal; and E. Bertran, Universitat de Barcelona, Barcelona, Spain ..... 669

Mirror Fibers: Progress Towards Optically Functional Textile Yarns [116]
Y. Fink, Massachusetts Institute of Technology, Cambridge, MA ..... 671

Packaging Barrier Films Deposited on PET by PECVD Using New High Density Plasma Source [117]
J. Madocks, J. Rewhinkle, and L. Barton, Applied Process Technologies, Inc., Tucson, AZ ..... 672

Progress Report on the Development of a Photolytic Artificial Lung [118]
P.M. Martin, Pacific Northwest National Laboratory, Richland, WA; E.C. Burckle, J.R. Busch, and B.F. Monzyk, Battelle Memorial Institute, Columbus, OH; R.J. Gilbert, Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, MA; and K.A. Dasse, Levitronix Medical, Waltham, MA ..... 674

Surface (OH) Groups Governing Surface Chemical Properties of Metal Oxide Films [119]
S. Takeda and M. Fukawa, Asahi Glass Company, Yokohama, Japan ..... 676

The Concept of Printable Holograms through the Alignment of Diffractive Pigments [120]
A. Argoitia and S. Chu, Flex Products, Inc. - A JDS Uniphase Company, Santa Rosa, CA ..... 677

Smart Switchable Film Technologies for Glass and Plastics [121]
C.M. Lampert, Star Science, Cotati, CA ..... 678

Study of Outgassing Behavior on Glass Surface in Vacuum [122]
T. Minaai, Nippon Sheet Glass Co., Ltd., Kyoto, Japan; M. Kumagai and A. Nara, NSG Techno-Research Co., Ltd., Tsukuba, Japan; and S. Tanemura, Graduate School of Engineering, Nagoya Institute of Technology, Nagoya, Japan ..... 680

Thermal and Optical Evolution of Gas in Vacuum Glazing [123]
N. Ng, R.E. Collins, and L. So, The University of Sydney, Sydney, Australia ..... 682

Poster Session

The Influence of the Deposition Conditions on the Optical and Compositional Characteristics of SiOx Thin Films Deposited by ECR-PECVD [124]
J. Wojcik and P. Mascher, Centre for Electrophotonic Materials and Devices, Department of Engineering Physics, McMaster University, Hamilton, Ontario, Canada ..... 687

Gas Barrier Performance of Surface-Modified Silica Films: Dependencies on Surface Functional Groups of the Films [125]
K. Teshima, Dai Nippon Printing Co., Ltd., Kashiwa, Japan and Nagoya University, Nagoya, Japan; H. Sugimura, Kyoto University, Kyoto, Japan; Y. Inoue and O. Takai, Nagoya University, Nagoya, Japan; and A. Takano, Dai Nippon Printing Co., Ltd., Kashiwa, Japan ..... 691

Deposition Rate of TiO₂ Films Deposited by dc Magnetron Sputtering Using Various TiO_2-X Targets [126]
A. Mitsui, Asahi Glass Co., Ltd., Research Center, Kanagawa, Japan ..... 693

Training Systems for RF Plasma Technology [127]
D.M. Hata, Portland Community College, Portland, OR ..... 696

Thin Film Surface Roughness of Sublimated Aluminum Tris-Hydroquinoline (AlQ₃) versus Growth Rate and Source Configuration via Atomic Force Microscopy [128]
G.L. Smith and T. Dockstader, Kurt J. Lesker Company, Inc., Systems R&D Division, Clairton, PA ..... 699

Nanocomposite TiCxNy/SiCN Superhad Coatings Prepared by PECVD [129]
P. Jedrzejowski, J.E. Klemberg-Sapieha, and L. Martinu, École Polytechnique, Montréal, Canada ..... 704

Using Calibration Tests for Trimming Target Uniformity Masks [130]
L. Pekker, Capital Technology Group, Inc., Washington D.C. ..... 707

Laser-Arc-Module for Deposition of Hard Amorphous Carbon (ta-C) Coatings with Industrial Batch Coaters [131]
H.-J. Scheibe and M. Leonhardt, Fraunhofer USA, Center for Coatings and Laser Applications, Michigan State University, East Lansing, MI; and C.-F. Meyer, B. Schultrich, H. Schulz, and V. Weihnacht, Fraunhofer-Institut für Werkstoff- und Strahltechnik, Dresden, Germany ..... 713

Plasma Characterization of the Variable Magnetron [132]
J.W. Bradley and S. Thompson, Dept. of Physics, UMIST, Manchester, United Kingdom ..... 717

Metrology Tool for Optical Thin Films on Large Area Substrate [133]
Y. Ji and E. Teboul, Jobin Yvon Inc., Edison, NJ; L. Hou and Q. Shang, AKT, Inc., Santa Clara, CA; and P. Amary, T. Labaye, and R. Benferhat, Jobin Yvon SAS, Chilly-Mazarin, France ..... 720

Mechanical Properties of Nanostructured PVD Coatings Using Nanoindentation [134]
J.O. Carneiro, V. Teixeira, and A. Portinha, University of Minho, Physics Department, Guimarães, Portugal; and S.N. Dub and R. Shmegera, Institute for Superhard Materials, Kiev, Ukraine ..... 723

A New Method for Stabilization of Sputtered ZrO₂ Coatings Using Gd₂O₃ [135]
V. Teixeira, A. Portinha, and J. Carneiro, University of Minho, Physics Department, Guimarães, Portugal ..... 728

Innovators Showcase

Industrial Batch Coater with Integrated Laser-Arco^® Technology [136]
H.-J. Scheibe, C.-F. Meyer, M. Leonhardt, T. Schuelke, and J. Asmussen, Fraunhofer USA – Center for Coatings and Laser Applications, East Lansing, MI ..... 735

Alumina-Containing Silica for Durable Coatings on Polycarbonate [137]
F. Koenig and M. Friz, Merck KGaA, Gernsheim, Germany; and K. Lau, U. Schulz, and N. Kaiser, Fraunhofer Institute for Applied Optics and Precision Engineering, Jena, Germany ..... 736

How to Capture the Enormous Value of the Chinese Marketplace [138]
J. Xu, Fortune Consultancy, Beijing, China ..... 737

Next Generation Crystal Microbalances for Thin Film Deposition Monitoring and Control [139]
S. Grimshaw, Tangidyne Corporation, Syracuse, NY ..... 738

Denton Vacuum Discovery^® Multi-Wafer Loading Sputtering System [140]
J. Colbridge, Denton Vacuum, LLC, Moorestown, NJ ..... 739

High Rate and High Target Use Sputter Metallizer Cathode [141]
D. Monaghan and V. Bellido-Gonzalez, Gencoa Ltd., Liverpool, United Kingdom ..... 741

High, Continuous Power Magnetron Sputtering [142]
M. Bernick, R. Belan, and J. Hrebik, Angstrom Sciences, Inc., Duquesne, PA ..... 742

Versatile Sputtering Capability from a Remote, High Intensity, Plasma Source [143]
D. Bingaman, Kurt J. Lesker Company, Clairton, PA; and M. Thwaites and B. Holton, Plasma Quest Ltd., Hook, Hampshire, United Kingdom ..... 743

Cygnus™—Advanced Thin Film Deposition Controller for Organic Vapor Deposition [144]
R. Mueller and C. Cipro, Inficon, Inc., East Syracuse, NY ..... 744

Denton Vacuum’s Glove Box Solutions [145]
J. Crowe, Denton Vacuum LLC, Moorestown, NJ ..... 745

Introducing the Millbrook MiniSIMS—Surface Analysis for Everyone [146]
B. Cliff, N. Long, and A.J. Eccles, Millbrook Instruments, Blackburn, United Kingdoom ..... 746

Uniform 16" Microwave Plasma Sources at High Pressure and Larger Area [147]
H. Sung-Spitzl and R. Spitzl, iplas innovative plasma systems GmbH, Troisdorf, Germany ..... 747

New Technology For Rotary Target Tubes [148]
B.W. Webb and G.M. Wityak, Academy Precision Materials, Division of Academy Corporation, Albuquerque, NM ..... 748

An Integrated Process Control, Trending, and Logging System for a Vacuum Web Coater Running Several Reactive Sputtering Processes [149]
P. Diffendaffer, Venture Technology, Inc., Santa Rosa, CA; and B. Smith, Cal-Bay Systems, San Rafael, CA ..... 750


*SVC Student Presenter
Note: Number in brackets on the top line is the paper number for 2004. *SVC Student Presenter