Webinar Tutorial Program
This on-line Webinar format offers an affordable option to individuals and companies seeking to fit meaningful training into a short period of time. SVC offers both Live and On-Demand (recorded) versions of webinars.
| UPCOMING: | TITLE: | REGISTER: |
| June 6, 2013 LIVE! |
W-207 "Production Vacuum Systems: Operation and Maintenance" | click here |
| August 8, 2013 LIVE! |
W-208 "Sputter Deposition" | click here |
| ON-DEMAND: | TITLE: | REGISTER: |
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| Recorded Feb 28, 2013 |
W-105 "Evaporation for Thin Film Deposition" | click here |
| Recorded Jan 31, 2013 |
W-208 "Sputter Deposition" | click here |
| Recorded Dec 11, 2012 |
W-212 "Troubleshooting for Thin Film Deposition Processes" | click here |
| Recorded Oct 16, 2012 |
W-326 "Manufacture of Precision Evaporated Coatings" | click here |
| Recorded Aug 7, 2012 |
W-317 "The Practice of Reactive Sputtering" | click here |
| Recorded Jun 7, 2012 |
W-204 "Basics of Vacuum Web Coating" | click here |
| Recorded Dec 9, 2011 |
W-314 "Practical Aspects of Plasma Modification of Polymer Materials and Plasma Web Treatment" | click here |
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Basic Webinar Information:
Live Webinar: Thursday June 6, 2013 (9-12am Mountain Time, 3 hours) Space is Limited
Click here to pre-register
Title: "Production Vacuum Systems: Operation
and Maintenance"
SVC Course ID: W-207
Instructor: Robert (Bob) A. Langley,
Oak Ridge Scientific Consultants
Pricing: Member: $325 | Non-Member: $400 | Student (Member or Non-Member): $200
More information: Click here or scroll for detailed description, topical outline, and instructor bio
Live Webinar: Thursday August 8, 2013 (9-12am Mountain Time, 3 hours) Space is Limited
Click here to pre-register
Title: "Sputter Deposition"
SVC Course ID: W-208
Instructor: David Glocker, Isoflux Incorporated
Pricing: Member: $325 | Non-Member: $400 | Student (Member or Non-Member): $200
More information: Click here or scroll for detailed description, topical outline, and instructor bio
On-Demand Webinar: Recording of the Live Webinar
Originally Presented February 28, 2013
Register Now!
Title: "Evaporation for Thin Film Deposition"
SVC Course ID: W-105
Instructor: S. Ismat Shah, University of Delaware
Pricing:
Member: $195 | Non-Member: $270 | Student (Member or Non-Member): $135
More information: Click here for detailed description, topical outline, and instructor bio
On-Demand Webinar:Recording of the Live Webinar
Originally Presented January 31, 2013
Register Now!
Title: "Sputter Deposition"
SVC Course ID: W-208
Instructor: David Glocker, Isoflux Incorporated
Pricing: Member: $195 | Non-Member: $270 | Student (Member or Non-Member): $135
More information: Click here for detailed description, topical outline, and instructor bio
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On Demand Webinar: Recording of the Live Webinar Originally Presented December 11, 2012
Register Now!
Title: "Troubleshooting for Thin Film
Deposition Processes"
SVC Course ID: W-212
Instructor: Gary S. Ash, Castle Brook Corporation
Pricing: Member: $195 | Non-Member: $270 | Student (Member or Non-Member): $135
More information: Click here for detailed description, topical outline, and insructor bio
On Demand Webinar: Recording of the Live Webinar Originally Presented October 16, 2012
Register Now!
Title: "Manufacture of Precision Evaporated
Coatings"
SVC Course ID: W-326
Instructor: Jim Oliver, Vacuum Innovations, LLC. and University of Rochester LLE
Pricing: Member: $195 | Non-Member: $270 | Student (Member or Non-Member): $135
More information: Click here for detailed description, topical outline, and insructor bio
On-Demand Webinar: Recording of the Live Webinar Originally Presented August 7, 2012
Register Now!
Title: "The Practice of Reactive Sputtering"
SVC Course ID: W-317
Instructor: Bill Sproul, Reactive Sputtering, Inc.
Pricing: Member: $195 | Non-Member: $270 |
Student (Member or Non-Member): $135
More information:Click here for detailed description, topical outline, and instructor bio
On-Demand Webinar:Recording of the Live Webinar Originally Presented June 7, 2012
Register Now!
Title: "Basics of Vacuum Web Coating"
SVC Course ID: W-204
Instructor: Donald J. McClure, Acuity Consulting
Pricing: Member: $195 | Non-Member: $270 |
Student (Member or Non-Member): $135
More information:Click here for detailed description, topical outline, and instructor bio
On-Demand Webinar: Recording of the Live Webinar Originally Presented December 9, 2011
Register Now!
Title"Practical Aspects of Plasma Modification of Polymer Materials and Plasma Web Treatment"
SVC Course ID: W-314
Instructor: Jeremy Grace, Eastman Kodak
Pricing: Member: $195 | Non-Member: $270 | Student (Member or Non-Member): $135
More information: Click here for detailed description, topical outline, and instructor bio
Webinar Tutorial Program
Course Descriptions, Topical Outlines and Instructor Biographies
Webinar Description:
This webinar emphasizes issues of practical importance to those using sputtering as a manufacturing process. It is intended for engineers, scientists and technicians who would like an understanding of the factors that influence product throughput, coating quality, and process robustness and reliability.
The primary focus will be on the use of planar magnetrons of various shapes, but other sources will be covered as well. The relationships between the sputtering conditions and important film properties - such as microstructure, composition, stress, and adhesion - will be discussed. New developments that are finding their way into practical applications will also be highlighted. No prior formal training in sputtering is required.
- Sputtering plasmas and the nature of the sputtering process
- Film nucleation and growth
- Effects of substrate temperature and energetic bombardment of film structure
- Coating stress and the causes of stress
- Biased sputtering and the use of unbalanced magnetrons
- Sources of substrate heating
- rf, dc, pulsed dc, and ac reactive sputtering
- Process control methods for reactive sputtering of dielectrics
- Arcing, disappearing anodes, and other process stability issues
- High Power Pulsed Magnetron Sputtering (HPPMS or HIPIMS)
Topical Outline:
1 Sputtering plasmas
1.1 Ionization due to electron impact
1.2 Creation of secondary electrons at the target
1.3 Conditions for a self sustaining glow discharge
1.4 The use of magnetic fields and magnetrons to increase ionization
1.5 Typical magnetron plasma properties
1.6 Magnetron cathode configurations
2 Energy and spatial distribution of sputtered material
2.1 The collision cascade in the target
2.2 Sputter yields
2.3 Energy distribution of sputtered atoms
2.4 The cosine spatial distribution of sputtered atoms
3 Deposition rates and substrate heating
3.1 Dependence of rate on voltage and current
3.2 Indirect and direct target cooling
3.3 Major sources of substrate heating
3.4 Estimate of the energy per sputtered atom
4 Film nucleation and growth
4.1 Nucleation and the critical radius
4.2 Effect of temperature on nucleation and growth
4.3 Effect of surface mobility on nucleation and growth
4.4 Relationship between sputtering conditions and surface mobility
4.5 Structure zone models
4.6 Coating stress and stress measurement
4.7 Relationship between sputtering conditions and stress
4.8 Bias sputtering
4.9 Unbalanced magnetron sputtering
5 Reactive sputtering of insulating materials
5.1 Overview of reactive sputtering
5.2 Process control issues in reactive sputtering
5.2.1 Maintaining correct stoichiometry
5.2.2 Target poisoning and hysteresis
5.2.3 Arcing
5.2.4 Hidden anodes
5.3 Partial pressure vs. flow control in reactive sputtering
5.4 Methods of partial pressure control
5.5 Methods of reducing or eliminating arcing
5.5.1 Pulsed dc sputtering
5.5.2 Dual cathode ac sputtering
Instructor Biography:
David Glocker is CEO of Isoflux Incorporated, a manufacturer of magnetron equipment, which he founded in 1993. He has more than 20 years’ experience in thin film research, development, and manufacturing and has taken a number of new processes from laboratory-scale feasibility studies through successful production. He is an inventor or co-inventor of 25 U.S. patents and an author of more than 25 research papers in the areas of sputter source design, plasmas and plasma characteristics, sources of substrate heating in sputtering, and the control of sputtering processes and sputtered film properties. He also is the co-editor of The Handbook of Thin Film Process Technology, a major reference work in the field.
W-314 - Practical Aspects of Plasma Modification of Polymer Materials and Plasma Web Treatment
Webinar Description:
This Webinar emphasizes issues of practical importance for those who use plasma modification techniques to treat polymers in the manufacturing or research environments. It is intended for engineers, scientists, and technicians who would like to gain a better understanding of the influence of plasma process factors on treatment performance, as well as the practical issues related to process robustness, process speed, and ease of scale-up. While much of the focus is on treatment of polymer webs, the key concepts presented are applicable to polymer surfaces in general and plasma treatment of materials in general.
-Industrial Applications of Plasmas for Polymer Surface Modification
-Effects of Plasmas on Polymer Surfaces
-Practical Aspects of Plasma Modification
-Practical Testing of Plasma-Treated Surfaces and Interfaces
Topical Outline:
1. Industrial Applications
• Definitions, applications & themes
• Examples of industrial applications
2. Effects of Plasmas on Polymer Surfaces
• Plasma basics
• Polymer chemistry basics
• Chemical changes in treated surfaces
• Physical changes in treated surfaces
3. Practical Aspects of Plasma Modification
• The concept of treatment dose
• Process factors and their roles
• Treatment process scaling
• Identifying promising treatment chemistries
• Plasma modification examples
- Silver-PET adhesion
- Gelatin-PEN adhesion
- Atomic Layer Deposition on Polymers
• Process verification and stability
4. Practical Testing of Plasma-Treated Surfaces and Interfaces
• Non-linear responses (relevant to surface saturation effects)
• Wetability/coatability
• Adhesion and fracture toughness
• Chemical stability of adhesive joints
Instructor Biography:
Jeremy M. Grace is currently a senior principal scientist at the Eastman Kodak company. At Kodak, he has worked in the areas of plasma surface modification, thin-film adhesion, sputter deposition, and organic vapor deposition. He has written several patents and journal articles in the area of plasma modification of polymers. He is a member of the Society of Vacuum Coaters and the American Vacuum Society, and served as chair of the Upstate New York Chapter of the AVS (UNY-VAC) from 1998 - 2000.
This webinar is intended for roll coater machine operators, maintenance personnel, technicians, engineers, scientists, supervisors, and others who would benefit from an introduction to issues related to roll-to-roll vacuum coating onto polymer substrates. This webinar will emphasize practical aspects of the topics, and the treatment will be descriptive with little mathematics used. The webinar focuses strongly on coatings made by resistance evaporation but touches on e-beam evaporation and sputter coating. If your primary interest is sputtering onto webs, please see our full-day course, “Sputter Deposition onto Flexible Substrates” (C-211).
Donald J. McClure founded Acuity Consulting and Training to continue his love affair with vacuum coating and vacuum web coating in particular. Don retired from 3M's Corporate Research Laboratory after spending twenty five years working on a broad range of products and projects that utilized vacuum roll coating and processing. Don has published his work extensively and is a co-inventor on 19 US patents. He served the Society of Vacuum Coaters in many roles including President and Secretary. He has offered his courses on the "Basics of Vacuum Web Coating" and "Sputter Deposition onto Flexible Substrates" for many years. He was recognized by the SVC with their 2004 Nathaniel Sugerman Award for lifetime achievement.
W-317 - The Practice of Reactive Sputtering
This Webinar tutorial is intended for engineers, technicians, materials scientists, and coating developers, who have a desire and need to understand how the reactive sputter deposition process really works. The goal of the tutorial is to give the student a thorough understanding of the factors that affect the reactive sputtering process in order that the student can apply this knowledge to improve his or her reactive deposition process and achieve both high deposition rates and excellent film properties.
This tutorial starts with the basics of reactive sputtering by reviewing the effects of the reactive gas on a sputtering process. It will be shown that where and how the reactive gas is introduced into the chamber has a significant effect on the sputtering process. Flow control versus partial pressure control of the reactive gas will discussed, and the advantages and disadvantages of each technique will be pointed out. Partial pressure control allows operation in the transition region between the metallic and poisoned states of the target, and films can be deposited at much higher rates with excellent properties using partial pressure control compared to flow control of the reactive gas. It is important to use the right type of power to assure that there is no arcing during a reactive deposition. The different types of power that can be used for reactive sputtering along with the partial pressure sensors will be discussed. The requirements for a partial pressure control system along with commercially available controllers will be presented. Reactive high power pulsed magnetron sputtering (HPPMS) is an emerging area that is advancing the state of the art for sputtering and reactive sputtering. HPPMS will be reviewed with respect to reactive sputtering, and the advantages of this new technology will be shown.
Topical Outline:
• Basics of reactive sputtering
• Flow control versus partial pressure control of the reactive gas
• Power supplies for reactive sputtering
• Reactive gas sensors
• Control systems for reactive sputtering
• Reactive high power pulsed magnetron sputtering
Instructor Biography:
Bill Sproul is the founder and owner of Reactive Sputtering, Inc. Prior to starting his own company, he worked at Advanced Energy Industries, the Borg-Warner Corporation, Northwestern University, and Sputtered Films, Inc. Throughout his career he has been involved with the sputter deposition and reactive sputter deposition of hard materials for wear and corrosion applications. He is the author or co-author of more than 175 technical papers. He has 11 patents to his credit, and he is the inventor of the high rate reactive sputtering process. He is a past president of the American Vacuum Society, and he chaired the International Conference on Metallurgical Coating and Thin Films (ICMCTF) three times. He also served on the SVC Board of Directors. He is an AVS Fellow and Honorary Member, and in 2003 he received the SVC Mentor Award and the AVS Thornton Award. In 2011 he was awarded the SVC Nathaniel H. Sugerman Memorial Award.
W-326 - Manufacture of Precision Evaporated Coatings
This Webinar provides detailed information on how to establish and improve evaporative coating processes for precision optical coatings. Design considerations for coating chambers, such as source placement, substrate fixturing, control of film thickness uniformity, and thickness monitors will be discussed. Trade-offs in the selection of source materials, means of controlling film structure, and the influence on the performance of the coated component will be considered. Process details will be approached with a focus on practicality; film properties must be measurable and system designs must be practical and cost-effective. These process concepts are readily implemented in standard evaporation systems, providing significant improvements in existing coating facilities.
Topical Outline:
• Chamber components for an evaporation system
• Deposition monitoring and control
- Optical monitoring
- Advanced methods for quartz crystal monitoring
• Thin-film uniformity concepts and calculations
- Source placement
- Substrate rotation and fixturing
- Analysis and selection of system gearing
- Design of uniformity masks to correct film thickness variations
• Stress in optical coatings
- Theoretical basis for film stress
- Measurements of stress in thin films
- Process design to minimize stresses in optical coatings
Instructor Biography:
Jim Oliver is founder and owner of Vacuum Innovations, LLC and is a research engineer at the University of Rochester's Laboratory for Laser Energetics. A graduate of the University of Rochester's Institute of Optics, his work has focused on process design and modeling for precision evaporated coatings. Thin-film uniformity control is of particular interest, having developed advanced distribution models and planetary rotation systems. He also teaches optical coating design at the Institute of Optics as well as at the Institute's annual thin flim summer school program.
W-212 - Troubleshooting for Thin Film Deposition Processes
Vacuum deposited thin films are used for optical coatings, electrically-conductive coatings, semiconductor wafer fabrication, and a wide variety of other uses. They may be deposited on glass, plastic, semiconductors, and other materials. Usually, a vacuum deposition process produces durable, adherant films of good quality. But what do you do when things go wrong? Not all films can be deposited on all substrate materials. Sometimes films peel off or crack. Other times they are cloudy, absorbing, scattering, or have other unacceptable properties.
This tutorial will teach you about techniques and tools that can be used to identify the source of the problems, correct the process, and get back into production. It will also help in learning how to develop new processes and products. The tutorial is designed for process engineers and technicians, quality control personnel, thin film designers, and maintenance staff.
Topical Outline:
• Mechanical, electrical, and optical properties of thin films
• Process parameters that affect film properties
• Gauge and instrument calibration
• Properties of substrate surfaces
• Measurement of film stress
• Detection of contamination
• Introduction to surface analysis techniques (Auger, ESCA, SIMS, FTIR)
• Substrate preparation and cleaning
Instructor Biography:
Gary S. Ash is President of Castle Brook Corporation, Dartmouth, MA. The company provides technical and management consulting services for the vacuum and cryogenics industry. He has had more than 35 years of experience in vacuum systems, pumps and other components, deposition processes ranging from evaporation to sputtering to molecular beam epitaxy. Engineering experience includes equipment and process design, manufacturing process development, materials and failure analysis, and applications support. In addition, he has had extensive experience in product strategy, development, and manufacturing planning for industrial products and services. He was previously employed by the CTI-Cryogenics division of Helix Technology Corporation, ASTeX, RIBER division of Instruments SA, Optical Coating Laboratory Inc., Spectrum Systems division of Barnes Engineering Co., AAI Corporation, and American Electronic Laboratories. He holds BS and MS degrees in electrical engineering from Cornell University and a PhD in optical physics from Heriot-Watt University, Edinburgh, Scotland.x
W-105 - Evaporation for Thin Film Deposition
This webinar provides a comprehensive description of the process of evaporation that is utilized for the synthesis of thin films. Starting from the basic physics involved, the webinar will guide the participants through all the three steps required for the thin film formation: evaporation, vapor transport, and condensation. A basic knowledge of vacuum will be provided to help understand these three processes. The webinar includes detailed description of all the major evaporation processes along with the hardware used for each of these processes. A brief introduction of the thin film nucleation and growth processes will also be covered only to the extent that is relevant to evaporation processes.
This Webinar will be equally useful for students, engineers and technicians who are working with any thin film deposition process or are planning to work in related areas.
Topical Outline:
- Description of processes involved in evaporation, including the basic physical ideas.
- Evaporation mechanisms, including basic chemistry behind these mechanisms.
- Vacuum, concepts of mean free path, line of sight, etc.
- Description of evaporation hardware
- Evaporation Processes, resistive evaporation, e-beam evaporation, pulsed laser deposition, arc evaporation, etc.
- Issues in evaporation: thickness uniformity, compositional homogeneity, impurities, etc.
- Thin film nucleation and growth during evaporation
- Process variables and the effect of these variables on film properties
S. Ismat Shah graduated from the University of Illinois at Urbana-Champaign in 1986 from the Department of Materials Science and Engineering. He worked for the DuPont Company as senior Staff Scientist for 12 years before joining the University of Delaware in 1999, where he has a joint appointment in the Department of Materials Science and Engineering and the Department of Physics and Astronomy. He has been involved in the field of thin films and nanostructured materials for 22 years. He has over 174 publications in the field and six patents awarded. He is the Chair of the SVC Education Committee. He teaches the first on-line course offered by the SVC, in collaboration with the University of Delaware, on Vapor Deposition Processes.
W-207 - Production Vacuum Systems: Operation and Maintenance
This tutorial is designed to teach the basic fundamentals of vacuum technology to technicians, equipment operators, line process operators, and maintenance personnel. This tutorial will address how to use and maintain an existing vacuum effectively, not how to design a system. The introduction will consist of a very basic explanation of what a vacuum is and how it is attained and proceeds to an explanation of the three gas flow regimes (i.e., viscous, transition, and molecular flow). Various types of pumps are described to demonstrate principles of vacuum technology and to familiarize the student with the major types of pumps for both the viscous and molecular flow conditions. Presented next is a guide for selecting an appropriate pressure gauge for most applications. This includes a description of various types of gauges and details their useful pressure range and measurement precision.The next section deals with the care and maintenance of pumps and vacuum systems, including both compressible "rubber" gasket and metal gasket systems. The unique role that water plays in both pumpdown from atmosphere and in outgassing is addressed, and techniques to ameliorate its harmful effects are presented. The effects of other unique "bad actors" are also discussed. Many useful charts and tables will be presented and explained as well as examples of actual vacuum processing systems.
Topical Outline:
- Introduction to vacuum
- Explanation of the three gas flow regimes
- Viscous flow pumps
- High vacuum (molecular flow) pumps
- Guide for selecting a pressure gauge
- Care and maintenance of pumps and vacuum systems, including both compressible "rubber" gasket and metal gasket systems
- Evaluating system performance: pumpdown rate and leak-up rate
- Cleaning and conditioning of vacuum components and system
- Operation of vacuum systems: crossover pressure, interlocks, and safety
- Pumpdown and outgassing
Robert (Bob) A. Langley retired from Oak Ridge National Laboratory in 1994 and Sandia National Laboratories in 1999. He has performed research in the fields of atomic and molecular physics, solid state physics, material science, vacuum science and technology, upper atmospheric phenomena, fusion power research, and high-energy accelerators, published over 130 scientific papers and is a Fellow of the American Vacuum Society. He obtained his BS, MS and PhD in physics at Georgia Tech and accepted visiting academic positions at Princeton University and University of New Castle, Australia. He is associate editor of Vacuum Technology and Coating magazine, teaches vacuum related courses for the American Vacuum Society and the Society of Vacuum Coaters, served on the Board of Directors of the AVS, and at present consults on vacuum science and technology, and microwave material processing.
