Meeting Calendar

April 9-13, 2012
Moscone West
- electronics and photonics
- materials science and materials chemistry for energy
- nanostructured materials and devices
- biological, biomedical and bio-inspired materials
- general materials science
Third International Conference on Fundamentals and Industrial Applications of HIPIMSSheffield, United Kingdom
Venue: Cutler's Hall
- promote High Power Impulse Magnetron Sputtering (HIPIMS) as a novel technology for surface modification and coating deposition
- provide a scientific forum for discussion of the fundamentals of plasma science
- exchange ideas for new industrial applications of HIPIMS
- connect the academic research community with the industrial world to foster progress of plasma-based technologies
Tutorial Courses Provided by SVC:
- Monday, June 18: Full Day Tutorial Course C-323 - High Power Impulse Magnetron Sputtering, Arutiun P. Ehiasarian, Sheffield Hallam University, UK and André Anders, Lawrence Berkeley National Laboratory, US
- Thursday, June 21: Half Day Tutorial Course (AM) C-333 - Practice and Applications of High Power Impulse Magnetron Sputtering (HIPIMS), Ralf Bandorf, Fraunhofer IST, Germany and Arutiun P. Ehiasarian, Sheffield Hallam University, UK
Organizers: Sheffield Hallam University, Network of Competence INPLAS, Fraunhofer Institute for Surface Engineering and Thin Films
Promoted and Approved by: European Joint Committee on Plasma and Ion Surface Engineering
Abstract Submission Deadline: March 1, 2012 | Submit Abstracts to: hipims2012@shu.ac.uk
Exhibition and Sponsoring Contact: Papken Eh. Hovsepian, phone: +44 114 225 3500
e-mail: hipims2012@shu.ac.uk
Conference Centre, Chassé Theater
Breda, The Netherlands
Abstracts for poster presentations accepted until: January 31
Website: www.ICCG9.eu | Phone: +31-418 - 637 340 | Fax: +31-418 - 637 341
e-mail: iccg@commgres.com

Thirteeth International Conference on Plasma Surface Engineering
Conference and Exhibition
September 10-14, 2012
Kongresshaus
Garmisch-Partenkirchen (Germany)
Scope of the PSE Conference: Fundamentals and applications of plasma and ion beam techniques in surface engineering. The biennial PSE conference series is organized by the European Joint Committee on Plasma and Ion Surface Engineering. PSE provides an opportunity to present recent progress in research and development and industrial applications. Its topics span a wide range from fundamentals such as e.g. process modelling and simulation of plasmas or thin film physics, through empirical studies which e.g. establish the relationships between process parameters and the structural and functional properties of modified surfaces and/or thin films, towards the application in industrial production.
Abstract Due Date: January 31, 2012
Featuring SVC Tutorial Course:
Thursday, September 13, 2012 - C-332 - Zinc Oxide-Based and Other TCO Alternatives to ITO: Materials, Deposition, Properties and Applications, Clark Bright, 3M Corporation
Submission of Papers and Registration only electronically via the website. Reduced Registration Fee available until July 1, 2012. www.pse-conferences.net/pse2012









